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10138891 |
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Àú¿Â¿ë Àü±â/¿Àû ¼ö¼ÛƯ¼º ÃøÁ¤ Àåºñ
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Àåºñ¸í(¿µ¹®) |
A Customized Liquid Nitrogen Cryostat Sytem |
Á¦ÀÛ»ç |
Lakeshore and Janis |
¸ðµ¨¸í |
Lakeshore 643/Janis ST-300T |
»ó¼¼Á¤º¸ |
Àåºñ»ç¾ç |
Custom system for extensive thermal & electrical transport properties measurements
- Temperature: 15 K - 420 K
- Magnetic field: up to 1.2 Tesla
- High vacuum up to 10-6 torr
- Electronics: Nanovoltmeter, current source, temperature controller, electromagnet power supply, Gauss meter, AC resistance bridge, etc. |
Ȱ¿ëºÐ¾ß |
¼ö¼ÛƯ¼ººÐ¼® |
Àåºñ¿î¿µÀη |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 304È£
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¼Ò¼Ó |
±â°è°øÇаú |
¼º¸í |
ÁøÇö±Ô |
ÀüÈ |
054-279-2180 |
À̸ÞÀÏ |
hgjin@postech.ac.kr |
µ¿ÀÏ/À¯»çÀåºñÁ¤º¸ |
Àåºñ¸í |
Ãʰí¼Ó ¿ø½ÉºÐ¸®±â(Ultracentrifuge Optima XE-100) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima XE-100 |
¼³Ä¡Àå¼Ò |
129È£
|
|
Àåºñ¸í |
À¯¼¼Æ÷ ºÐ¼®±â(Accuri C6 plus System) |
Á¦ÀÛ»ç |
BD Biosciences |
¸ðµ¨¸í |
BD Accuri¢â C6 Plus |
¼³Ä¡Àå¼Ò |
202-1È£
|
|
Àåºñ¸í |
À¯¼¼Æ÷ ºÐ¼®±â(High-end performance Flow Cytometer) |
Á¦ÀÛ»ç |
BD Biosciences |
¸ðµ¨¸í |
LSR Foretessa 4Laser |
¼³Ä¡Àå¼Ò |
202-1È£
|
|
Àåºñ¸í |
À¯¼¼Æ÷ ºÐ¼®±â(FACS SONY-SH800S) |
Á¦ÀÛ»ç |
SONY |
¸ðµ¨¸í |
SONY SH800S |
¼³Ä¡Àå¼Ò |
202-1È£
|
|
Àåºñ¸í |
(GLOCAL)°íÇØ»óµµ ½ºÆåÆ®·³ À¯¼¼Æ÷ ºÐ¼®±â(High parameter Flow Cytometer) |
Á¦ÀÛ»ç |
BD Biosciences |
¸ðµ¨¸í |
BD FACS Symphony A5 SE |
¼³Ä¡Àå¼Ò |
202-1È£
|
|
Àåºñ¸í |
NanoDrop ¹Ì·® ºÐ±¤±¤µµ°è(NanoDrop Spectrophotometer) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
NanoDrop ND-2000 |
¼³Ä¡Àå¼Ò |
202È£
|
|
Àåºñ¸í |
ȸéÇü ¾ÆÀÌÆ®·¡Ä¿ Tobii Pro Spectrum HW + SW ÆÐŰÁö(Screen-based Eye Tracker: Tobii Pro Spectrum HW + SW) |
Á¦ÀÛ»ç |
ÅäºñÅ×Å©³î·ÎÁöÄÚ¸®¾Æ(ÁÖ) |
¸ðµ¨¸í |
Tobii Pro Spectrum 600Hz |
¼³Ä¡Àå¼Ò |
206È£
|
|
Àåºñ¸í |
[±Û·ÎÄÃ] ÆÄ¿ö·¦¾¾ µðÁöÅÐ µ¥ÀÌÅÍ ¼öÁý ½Ã½ºÅÛ([Glocal] PowerLab C Digital Data Collection System) |
Á¦ÀÛ»ç |
(ÁÖ)¶óÀÌÇÁÅØ |
¸ðµ¨¸í |
PowerLab C |
¼³Ä¡Àå¼Ò |
206È£
|
|
Àåºñ¸í |
ÁøÅÁ ¹è¾ç±â (SHAKING INCUBATOR) |
Á¦ÀÛ»ç |
ºñÀü°úÇÐ |
¸ðµ¨¸í |
VS-8480SR |
¼³Ä¡Àå¼Ò |
239È£
|
|
Àåºñ¸í |
°í¾Ð½ºÆÀ¸ê±Õ±â(Autoclave ES-315) |
Á¦ÀÛ»ç |
TOMY |
¸ðµ¨¸í |
ES-315 |
¼³Ä¡Àå¼Ò |
239È£
|
|
Àåºñ¸í |
¸¶ÀÌÅ©·ÎÇ÷¹ÀÌÆ® ¸®´õ(Microplate Reader Infinite M200 NanoQuan) |
Á¦ÀÛ»ç |
Tecan |
¸ðµ¨¸í |
NanoQuant infinite M200 Pro |
¼³Ä¡Àå¼Ò |
281È£
|
|
Àåºñ¸í |
½Ç¸®ÄÜ Ä«¹ÙÀÌµå ¹Ú½º °¡¿·Î(SiC Box Furnace) |
Á¦ÀÛ»ç |
(ÁÖ)¾ÆÀü°¡¿»ê¾÷ |
¸ðµ¨¸í |
AJ-SB1 |
¼³Ä¡Àå¼Ò |
302È£
|
|
Àåºñ¸í |
´ÙÀ̾Ƹóµå ºí·¹ÀÌµå ½î¿ì(Diamond Blade Saw) |
Á¦ÀÛ»ç |
TOP TECH MACHINES CO., LTD. |
¸ðµ¨¸í |
CL40 |
¼³Ä¡Àå¼Ò |
302È£
|
|
Àåºñ¸í |
(GLOCAL)¾×üũ·Î¸¶Åä±×·¡ÇÇ »ï´Ü»çÁß±ØÀÚ Áú·®ºÐ¼®±â(Liquid Chromatography-Triple Quadrupole Mass Spectrometry) |
Á¦ÀÛ»ç |
Waters |
¸ðµ¨¸í |
Xevo Absolute system |
¼³Ä¡Àå¼Ò |
3308È£
|
|
Àåºñ¸í |
Ãʰí¼Ó ¿ø½ÉºÐ¸®±â(Ultracentrifuge Optima XE-100) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima XE-100 |
¼³Ä¡Àå¼Ò |
332È£
|
|
Àåºñ¸í |
ÀüÀÚ½ºÇɰø¸í ºÐ±¤±¤µµ°è(Electron Spin Resonance Spectrometer (ESR)) |
Á¦ÀÛ»ç |
Bruker Biospin GmbH |
¸ðµ¨¸í |
A200 |
¼³Ä¡Àå¼Ò |
3352/3354È£
|
|
Àåºñ¸í |
ÀÚµ¿ ¼¼Æ÷ Ä«¿îÅÍ(Automated Cell Counter) |
Á¦ÀÛ»ç |
Logos Biosystems(logosbi) |
¸ðµ¨¸í |
LUNA-II¢â |
¼³Ä¡Àå¼Ò |
363È£
|
|
Àåºñ¸í |
¿¬±¸¿ë »ï¾È Çö¹Ì°æ(Reseach Trinocular Microscope) |
Á¦ÀÛ»ç |
OLYMPUS |
¸ðµ¨¸í |
BX43 |
¼³Ä¡Àå¼Ò |
383È£
|
|
Àåºñ¸í |
Á¦ºù±â(ICE-Maker) |
Á¦ÀÛ»ç |
ºñÀü°úÇÐ |
¸ðµ¨¸í |
VS-625 |
¼³Ä¡Àå¼Ò |
405È£
|
|
Àåºñ¸í |
ÃÊÀ½ÆÄ ÆÄ¼â±â(ULTRASONIC PROCESSOR) |
Á¦ÀÛ»ç |
SONICS |
¸ðµ¨¸í |
Vibra-cell VCX-500 |
¼³Ä¡Àå¼Ò |
410È£
|
|
Àåºñ¸í |
PCR ½Ã½ºÅÛ(GeneAmp PCR System 9700) |
Á¦ÀÛ»ç |
Thermo Fisher Scientific |
¸ðµ¨¸í |
GeneAmp PCR System 9700 |
¼³Ä¡Àå¼Ò |
410È£
|
|
Àåºñ¸í |
°í¼Ó¿ø½ÉºÐ¸®±â(High Speed Refrigerated Centrifuge) |
Á¦ÀÛ»ç |
Hanil |
¸ðµ¨¸í |
Supra 22K |
¼³Ä¡Àå¼Ò |
410È£
|
|
Àåºñ¸í |
NanoDrop ¹Ì·® ºÐ±¤±¤µµ°è(NanoDrop Spectrophotometer) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
NanoDrop2000 |
¼³Ä¡Àå¼Ò |
410È£
|
|
Àåºñ¸í |
Ãʰí¼Ó ¿ø½ÉºÐ¸®±â(Ultracentrifuge Optima XE-100) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima XE-100 |
¼³Ä¡Àå¼Ò |
410È£
|
|
Àåºñ¸í |
ÃÊ°í¼º´É ÀÚµ¿ ¼¼Æ÷ºÐ¼®±â(Ultra High-End Performance Flow Cytometry System) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
cyotoFLEX LX |
¼³Ä¡Àå¼Ò |
729È£
|
|
Àåºñ¸í |
Á¶Á÷Åõ¸íȽýºÅÛ(CLARITY-Tissue Clearing system) |
Á¦ÀÛ»ç |
·Î°í¹ÙÀÌ¿À½Ã½ºÅÛ |
¸ðµ¨¸í |
X-clarity |
¼³Ä¡Àå¼Ò |
BOIC 4210È£
|
|
Àåºñ¸í |
Áú·®ºÐ¼®±â°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¿ÀºñÆ®·¦Áú·®ºÐ¼®±â(High-performance Liquid Chromatography – Mass) |
Á¦ÀÛ»ç |
Perkin Elmer |
¸ðµ¨¸í |
Qsight220 |
¼³Ä¡Àå¼Ò |
BOIC 4307È£
|
|
Àåºñ¸í |
ȸÀü½Ä ¸¶ÀÌÅ©·ÎÅè(ROTARY MICROTOME) |
Á¦ÀÛ»ç |
LEICA |
¸ðµ¨¸í |
Leica CM 1850 |
¼³Ä¡Àå¼Ò |
BOIC [3207È£]
|
|
Àåºñ¸í |
Á¦ºù±â(Ice maker) |
Á¦ÀÛ»ç |
ºñÀü°úÇÐ |
¸ðµ¨¸í |
VS-625 |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
ÃÊÀ½ÆÄ ÆÄ¼â±â(Sonicator) |
Á¦ÀÛ»ç |
BRANSON |
¸ðµ¨¸í |
Branson Sonifier SFX550 |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷)) |
Á¦ÀÛ»ç |
Merck Millipore |
¸ðµ¨¸í |
Milli-Q¢ç IQ 7015 |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
´ë¿ë·® ¿ø½ÉºÐ¸®±â(Large Capacity Centrifuge) |
Á¦ÀÛ»ç |
Hanil |
¸ðµ¨¸í |
Component wR |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
°í¾Ð½ºÆÀ¸ê±Õ±â(Autoclave) |
Á¦ÀÛ»ç |
Áö½ÃÄÚ(ÁÖ) |
¸ðµ¨¸í |
J-NAS103 |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
°í¼Ó ¿ø½ÉºÐ¸®±â(High Centrifuge Avanti J-E) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Avanti J-E |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
Ź»ó¿ë Ãʰí¼Ó ¿ø½ÉºÐ¸®(Table-top Centrifuge(Optima MAX-XP)) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima MAX-XP |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
Ãʰí¼Ó ¿ø½ÉºÐ¸®±â(Ultracentrifuge Optima XE-100) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima XE-100 |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
µðÁöÅÐ ÃÊÀ½ÆÄ ÆÄ¼â±â(Digital Sonifier ) |
Á¦ÀÛ»ç |
BRANSON |
¸ðµ¨¸í |
SFX550 |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
°í¼Ó ¿ø½ÉºÐ¸®±â(High Centrifuge Avanti J-E) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Avanti J-E |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
(GLOCAL)°ø°£ Àü»çü Žħ À̵¿ ÀåÄ¡(in situ probe transfer for Spantial transcriptome analysis ) |
Á¦ÀÛ»ç |
10xGENOMICS |
¸ðµ¨¸í |
Visium CytAssist |
¼³Ä¡Àå¼Ò |
BOIC [3311È£]
|
|
Àåºñ¸í |
(GLOCAL)´ÜÀϼ¼Æ÷ °ø°£À¯Àüü ºÐ¼®ÀåÄ¡(Single-cell spatial genomics analyzer) |
Á¦ÀÛ»ç |
10xGENOMICS |
¸ðµ¨¸í |
Xenium analyzer |
¼³Ä¡Àå¼Ò |
BOIC [3311È£]
|
|
Àåºñ¸í |
Á¦ºù±â(Ice maker) |
Á¦ÀÛ»ç |
ºñÀü°úÇÐ |
¸ðµ¨¸í |
VS-625 |
¼³Ä¡Àå¼Ò |
BOIC [3313È£]
|
|
Àåºñ¸í |
°í¾Ð½ºÆÀ¸ê±Õ±â(Autoclave) |
Á¦ÀÛ»ç |
Áö½ÃÄÚ(ÁÖ) |
¸ðµ¨¸í |
J-NAS103 |
¼³Ä¡Àå¼Ò |
BOIC [3313È£]
|
|
Àåºñ¸í |
³ÃÀå ¿ø½ÉºÐ¸®±â(Refrigerated Centrifuge) |
Á¦ÀÛ»ç |
Eppendorf |
¸ðµ¨¸í |
Centrifuge 5920R |
¼³Ä¡Àå¼Ò |
BOIC [3313È£]
|
|
Àåºñ¸í |
°í¼Ó ¿ø½ÉºÐ¸®±â(High Centrifuge Avanti J-E) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Avanti J-E |
¼³Ä¡Àå¼Ò |
BOIC [4307È£]
|
|
Àåºñ¸í |
¹ÙÀÌ¿ÀºÐÀÚ À̹Ì¡ ½Ã½ºÅÛ(Biomolecular Imaging System) |
Á¦ÀÛ»ç |
GE Healthcare(Çö Cytiva) |
¸ðµ¨¸í |
Amersham Imager 600 |
¼³Ä¡Àå¼Ò |
BOIC [4307È£]
|
|
Àåºñ¸í |
°í¾Ð½ºÆÀ¸ê±Õ±â(Autoclave) |
Á¦ÀÛ»ç |
Áö½ÃÄÚ(ÁÖ) |
¸ðµ¨¸í |
J-NAS103 |
¼³Ä¡Àå¼Ò |
BOIC [4307È£]
|
|
Àåºñ¸í |
Á¦ºù±â(Ice maker) |
Á¦ÀÛ»ç |
ºñÀü°úÇÐ |
¸ðµ¨¸í |
VS-625 |
¼³Ä¡Àå¼Ò |
BOIC [4307È£]
|
|
Àåºñ¸í |
(GLOCAL)´ÜÀϼ¼Æ÷ À̹Ì¡ °ø°£ ºÐ¼® ½Ã½ºÅÛ(Ultra high-multiplexed single cell spatial analysis system) |
Á¦ÀÛ»ç |
Akoya Biosciences |
¸ðµ¨¸í |
Phenocycler-Fusion 2.0 |
¼³Ä¡Àå¼Ò |
BOIC [4308È£]
|
|
Àåºñ¸í |
³Ãµ¿ Á¶Á÷ ÀýÆí±â(Cryostat) |
Á¦ÀÛ»ç |
Leica |
¸ðµ¨¸í |
Leica CM3050 S |
¼³Ä¡Àå¼Ò |
BOIC [4311È£]
|
|
Àåºñ¸í |
Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷)) |
Á¦ÀÛ»ç |
Merck Millipore |
¸ðµ¨¸í |
Milli-Q¢ç Q-POD¢ç |
¼³Ä¡Àå¼Ò |
BOIC [4313È£]
|
|
Àåºñ¸í |
³ÃÀå ¿ø½ÉºÐ¸®±â(Refrigerated Centrifuge) |
Á¦ÀÛ»ç |
Eppendorf |
¸ðµ¨¸í |
Centrifuge 5920R |
¼³Ä¡Àå¼Ò |
BOIC [4313È£]
|
|
Àåºñ¸í |
°í¾Ð½ºÆÀ¸ê±Õ±â(Autoclave) |
Á¦ÀÛ»ç |
Áö½ÃÄÚ(ÁÖ) |
¸ðµ¨¸í |
J-NAS103 |
¼³Ä¡Àå¼Ò |
BOIC [4314È£]
|
|
Àåºñ¸í |
ÁøÅÁ ¹è¾ç±â(Shaking Incubator) |
Á¦ÀÛ»ç |
ºñÀü°úÇÐ |
¸ðµ¨¸í |
VS-8480SR |
¼³Ä¡Àå¼Ò |
BOIC [4314È£]
|
|
Àåºñ¸í |
Á¦ºù±â(Ice maker) |
Á¦ÀÛ»ç |
ºñÀü°úÇÐ |
¸ðµ¨¸í |
VS-625 |
¼³Ä¡Àå¼Ò |
BOIC [4314È£]
|
|
Àåºñ¸í |
³Ãµ¿ÀýÆí±â (Cryostat ) |
Á¦ÀÛ»ç |
Leica |
¸ðµ¨¸í |
CM1860 |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
256ä³Î ÃÊÀ½ÆÄÀåºñ (Vantage NXT 256 ) |
Á¦ÀÛ»ç |
Verasonics |
¸ðµ¨¸í |
Vantage NXT 256 |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
°í¼Ó ó¸®Çü±¤ ³ª³ëÀε§Å×ÀÌ¼Ç (Nanoindentation ) |
Á¦ÀÛ»ç |
OPTIC11 LIFE |
¸ðµ¨¸í |
Pavone |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
´Ù±â´É ¸¶ÀÌÅ©·ÎÇ÷¹ÀÌÆ® ¸®´õ(Microplate Reader) |
Á¦ÀÛ»ç |
Molecular Device |
¸ðµ¨¸í |
Microplate Reader/SpectraMax iD3 +SpectraDrop |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
Áøµ¿ÀýÆí±â(Vibrating blade microtome) |
Á¦ÀÛ»ç |
Leica |
¸ðµ¨¸í |
VT1200S |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
ÈÇй߱¤ À̹ÌÁö ÃøÁ¤ÀåÄ¡(Western Blot Imaging System) |
Á¦ÀÛ»ç |
Cytiva |
¸ðµ¨¸í |
Amersham Image Quant IQ800 |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
´ë¿ë·® Â÷¼¼´ë¿°±â¼¿ºÐ¼® ½Ã½ºÅÛ(Next-Generation Sequencing system) |
Á¦ÀÛ»ç |
Illumina |
¸ðµ¨¸í |
NextSeq1000 |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
·¹ÀÌÀú ½Ã½ºÅÛ(Tunable Laser System) |
Á¦ÀÛ»ç |
Amplitude |
¸ðµ¨¸í |
Surelite OPO |
¼³Ä¡Àå¼Ò |
C5 228È£
|
|
Àåºñ¸í |
¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM)) |
Á¦ÀÛ»ç |
Park Systems |
¸ðµ¨¸í |
XE7 |
¼³Ä¡Àå¼Ò |
C5 228È£
|
|
Àåºñ¸í |
¿¬±¸¿ë ÃÊÀ½ÆÄ ½Ã½ºÅÛ(Research Ultrasound System) |
Á¦ÀÛ»ç |
Verasonics |
¸ðµ¨¸í |
VANTAGE 256 |
¼³Ä¡Àå¼Ò |
C5 228È£
|
|
Àåºñ¸í |
·¡ÇÎ&Æú¸®½Ì ½Ã½ºÅÛ(Lapping & Polishing System) |
Á¦ÀÛ»ç |
LOGITECH |
¸ðµ¨¸í |
PM6 |
¼³Ä¡Àå¼Ò |
C5 228È£
|
|
Àåºñ¸í |
ÀÓÇÇ´ø½º ÃøÁ¤Àåºñ(Impedance Analyzer System) |
Á¦ÀÛ»ç |
Keysight Technologies |
¸ðµ¨¸í |
E4990A |
¼³Ä¡Àå¼Ò |
C5 232È£
|
|
Àåºñ¸í |
ü¿Ü »ýü Á¶Á÷ Èû ÃøÁ¤ ÀåÄ¡(Isolated Muscle System) |
Á¦ÀÛ»ç |
Aurora Scientific |
¸ðµ¨¸í |
1500A |
¼³Ä¡Àå¼Ò |
C5 232È£
|
|
Àåºñ¸í |
Áø°ø ¿ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System) |
Á¦ÀÛ»ç |
´ëµ¿ÇÏÀÌÅØ |
¸ðµ¨¸í |
DD-GT103R |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System) |
Á¦ÀÛ»ç |
¿À¹æÅ×Å©³î·ÎÁö |
¸ðµ¨¸í |
OBT-PC300 |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
Á¦ÀÛ»ç |
ÇѺû·¹ÀÌÀú |
¸ðµ¨¸í |
GPPA-A377 |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System) |
Á¦ÀÛ»ç |
MUSASHI ENGINEERING, INC. |
¸ðµ¨¸í |
IMAGE MASTER 350PC SMART/SHOTMASTER 300QX |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
¿ø·á ÁõÂø ½Ã½ºÅÛ(Materials Deposition System with Piezoelectric Inkjet Catridge) |
Á¦ÀÛ»ç |
FUJIFILM |
¸ðµ¨¸í |
Dimatix DMP-2850 |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
Áø°øÇÁ·Îºê½ºÅ×À̼Ç(Vacuum Chamber Probe Station) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
M6VC |
¼³Ä¡Àå¼Ò |
C5 330È£
|
|
Àåºñ¸í |
¿þÀÌÆÛºÐ¼® ÇÁ·Îºê ½ºÅ×À̼Ç(Wafer Prober) |
Á¦ÀÛ»ç |
Cascade Microtech |
¸ðµ¨¸í |
Summit 11000 |
¼³Ä¡Àå¼Ò |
C5 330È£
|
|
Àåºñ¸í |
ÀúÁÖÆÄ ÀâÀ½ Ư¼º ºÐ¼®±â(Noise Analyzer) |
Á¦ÀÛ»ç |
PROPLUS |
¸ðµ¨¸í |
9812B |
¼³Ä¡Àå¼Ò |
C5 330È£
|
|
Àåºñ¸í |
ÀΰøÅ¾籤 ½Ã¹Ä·¹ÀÌÅÍ(Solar Simulator) |
Á¦ÀÛ»ç |
NEWPORT |
¸ðµ¨¸í |
Oriel Sol3A |
¼³Ä¡Àå¼Ò |
C5 332È£
|
|
Àåºñ¸í |
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
MST8000 |
¼³Ä¡Àå¼Ò |
C5 332È£
|
|
Àåºñ¸í |
ÇöóÁ ó¸® ½Ã½ºÅÛ(Plasma Treatment Machine) |
Á¦ÀÛ»ç |
Nordson |
¸ðµ¨¸í |
AP-300 Plasma System |
¼³Ä¡Àå¼Ò |
C5 720-1È£
|
|
Àåºñ¸í |
´ÙÀÌ½Ì Àý»è±â(Automatic Dicing Saw) |
Á¦ÀÛ»ç |
DISCO |
¸ðµ¨¸í |
DAD3240 |
¼³Ä¡Àå¼Ò |
C5 720-1È£
|
|
Àåºñ¸í |
ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System) |
Á¦ÀÛ»ç |
Specialty Coating Systems (SCS) - A KISCO Company |
¸ðµ¨¸í |
PDS Labcoter 2 (PDS 2010 LABCOTER) |
¼³Ä¡Àå¼Ò |
C5 720-1È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ¿ëÁ¢ ½Ã½ºÅÛ(Laser Mould Welder) |
Á¦ÀÛ»ç |
È¿¼º·¹ÀÌÀú |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
C5 MAKER SPACE 3(ÁöÇÏ)
|
|
Àåºñ¸í |
¿öÅÍÁ¬ Àý»è±â(Abrasive Water Jet Cutter Machine) |
Á¦ÀÛ»ç |
OMAX |
¸ðµ¨¸í |
MAXIEM 1530 |
¼³Ä¡Àå¼Ò |
C5 MAKER SPACE 3(ÁöÇÏ)
|
|
Àåºñ¸í |
5Ãà CNC(5-axis Computerized Numerical Control (CNC)) |
Á¦ÀÛ»ç |
ShopBot |
¸ðµ¨¸í |
PRSalpha |
¼³Ä¡Àå¼Ò |
C5 MAKER SPACE 4(ÁöÇÏ)
|
|
Àåºñ¸í |
3Ãà CNC(3-axis Computerized Numerical Control (CNC)) |
Á¦ÀÛ»ç |
ShopBot |
¸ðµ¨¸í |
PRSalpha |
¼³Ä¡Àå¼Ò |
C5 MAKER SPACE 4(ÁöÇÏ)
|
|
Àåºñ¸í |
Áß Àû¿Ü¼± ·¹ÀÌÀú(Mid-infrared laser) |
Á¦ÀÛ»ç |
Daylight Solutions |
¸ðµ¨¸í |
MIRCcat-QT-2100 |
¼³Ä¡Àå¼Ò |
C5 [232È£]½ÇÇè½Ç
|
|
Àåºñ¸í |
¹Ý±¸Çü ÃÊÀ½ÆÄ Æ®·£½ºµà¼(Hemispherical ultrasonic transducer) |
Á¦ÀÛ»ç |
ÁÖ½Äȸ»ç ÀÌÄıâ¼ú |
¸ðµ¨¸í |
4K-512CH-D73.61 SR40 |
¼³Ä¡Àå¼Ò |
C5 [232È£]½ÇÇè½Ç
|
|
Àåºñ¸í |
3D ÇÁ¸°ÅÍ(Standalone 3D printer system) |
Á¦ÀÛ»ç |
3D Systems |
¸ðµ¨¸í |
Figure 4 Standalone 3D Printer |
¼³Ä¡Àå¼Ò |
C5, 722È£(¹ÙÀÌ¿ÀÇコÄɾÅÍ)
|
|
Àåºñ¸í |
3D ±¼ÀýÇö¹Ì°æ(Low coherence holotomography systems) |
Á¦ÀÛ»ç |
Tomocube |
¸ðµ¨¸í |
HT-X1 |
¼³Ä¡Àå¼Ò |
C5, 722È£(¹ÙÀÌ¿ÀÇコÄɾÅÍ)
|
|
Àåºñ¸í |
À¯¼¼Æ÷ ºÐ¼®±â (FACS ) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
CytoFLEX SRT Cell Sorter |
¼³Ä¡Àå¼Ò |
C5, 722È£(¹ÙÀÌ¿ÀÇコÄɾÅÍ)
|
|
Àåºñ¸í |
°øÃÊÁ¡ ·¹ÀÌÀú ÁÖ»ç Çö¹Ì°æ (Confocal Laser Scanning Microscope ) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
LSM 900 with Airyscan 2 |
¼³Ä¡Àå¼Ò |
C5, 722È£(¹ÙÀÌ¿ÀÇコÄɾÅÍ)
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
TEMESCAL/BOC COATING TECH |
¸ðµ¨¸í |
BDJ 1800 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 110È£
|
|
Àåºñ¸í |
ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station) |
Á¦ÀÛ»ç |
The Micromanipulator Company |
¸ðµ¨¸í |
No. 6000 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 110È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ µð¹ÙÀ̽º ºÐ¼®±â(Semiconductor Device Analyzer) |
Á¦ÀÛ»ç |
Keysight Technologies |
¸ðµ¨¸í |
B1500A |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 110È£
|
|
Àåºñ¸í |
¸¶±×³×Æ®·Ð ½ºÆÛÅ͸µ Àåºñ(Magnetron Sputtering System) |
Á¦ÀÛ»ç |
SNTEK |
¸ðµ¨¸í |
SPR-5006 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 110È£
|
|
Àåºñ¸í |
ȸ·Î¸Á ºÐ¼®±â(Network Analyzer) |
Á¦ÀÛ»ç |
HP |
¸ðµ¨¸í |
8753ES |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 202È£
|
|
Àåºñ¸í |
·ÎÁ÷ ºÐ¼® ½Ã½ºÅÛ(Logic Analyzer) |
Á¦ÀÛ»ç |
HP |
¸ðµ¨¸í |
16500B |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 202È£
|
|
Àåºñ¸í |
ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station) |
Á¦ÀÛ»ç |
The Micromanipulator Company |
¸ðµ¨¸í |
No. 7100 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 202È£
|
|
Àåºñ¸í |
½ÅÈ£¿ø ºÐ¼®±â(Signal Source Analyzer) |
Á¦ÀÛ»ç |
Ű»çÀÌÆ®Å×Å©³î·ÎÁö½ºÄÚ¸®¾Æ(ÁÖ) |
¸ðµ¨¸í |
E5052B |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 202È£
|
|
Àåºñ¸í |
½ÅÈ£ ¹ß»ý±â(Signal Generator) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
E4433B |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 208È£
|
|
Àåºñ¸í |
º¤ÅÍ È¸·Î¸Á ºÐ¼®±â(Vector Network Analyzer) |
Á¦ÀÛ»ç |
HP |
¸ðµ¨¸í |
HP8510C |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 208È£
|
|
Àåºñ¸í |
ESG º¤ÅÍ ½ÅÈ£ ¹ß»ý±â(ESG Signal Generator) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
E4438C |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 208È£
|
|
Àåºñ¸í |
ºÐ¼®±â ¼¼Æ®(ȸ·Î¸Á ºÐ¼®±â, ½ÅÈ£ ºÐ¼®±â)(Analyzer Set (Network, UXA Signal)) |
Á¦ÀÛ»ç |
Keysight Technologies |
¸ðµ¨¸í |
N5247A/N9040B |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 208È£
|
|
Àåºñ¸í |
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station) |
Á¦ÀÛ»ç |
UNITEK CORPORATION |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 212È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ µð¹ÙÀ̽º ºÐ¼®±â(Semiconductor Device Analyzer) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
B1500A |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 212È£
|
|
Àåºñ¸í |
´ÙÃþ±âÆÇ ÀûÃþ±â(Multi-layder Press) |
Á¦ÀÛ»ç |
LPKF Laser & Electronics AG |
¸ðµ¨¸í |
Multi Press II |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 420È£
|
|
Àåºñ¸í |
Àç»ý ¹èÅ͸® ÆÑ Å×½ºÆ® ½Ã½ºÅÛ(Regenerative Battery Pack Test System) |
Á¦ÀÛ»ç |
Chroma |
¸ðµ¨¸í |
Model 17020 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 420È£
|
|
Àåºñ¸í |
¹èÅ͸® ¼¿ Ãæ¹æÀü Àåºñ(Battery Cell Charge/Discharge Test System) |
Á¦ÀÛ»ç |
Chroma |
¸ðµ¨¸í |
Model 17011 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 420È£
|
|
Àåºñ¸í |
PXA ½ÅÈ£ºÐ¼®±â(PXA Signal Analyzer) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
N9030A |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 421È£
|
|
Àåºñ¸í |
´ë±âÁ¶Àý¹è¾çÀÛ¾÷´ë(Modular Atmosphere Control Workstation System) |
Á¦ÀÛ»ç |
Don Whitley Scientific |
¸ðµ¨¸í |
Don Whitley Scientific A55 |
¼³Ä¡Àå¼Ò |
PBC 362È£
|
|
Àåºñ¸í |
µ¿Àû±¤»ê¶õºÐ±¤±â(Dynamic Light Scattering Spectroscopy) |
Á¦ÀÛ»ç |
Á¦À̺ñ»çÀ̾ðƼÇÈ |
¸ðµ¨¸í |
Zetasizer Pro |
¼³Ä¡Àå¼Ò |
RIST 3161È£
|
|
Àåºñ¸í |
°í°¨µµ PDL Ȧ ÃøÁ¤ ½Ã½ºÅÛ (High Sensitivity Parallel Dipole Line Hall System ) |
Á¦ÀÛ»ç |
Semilab |
¸ðµ¨¸í |
PDL 1000 |
¼³Ä¡Àå¼Ò |
RIST 3µ¿ 3116/3118È£
|
|
Àåºñ¸í |
¹Ð¸µ ½Ã½ºÅÛ(Milling Machine) |
Á¦ÀÛ»ç |
HWACHEON |
¸ðµ¨¸í |
KANDAN-2 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1009È£
|
|
Àåºñ¸í |
Çï·ý °¡½º ȸ¼ö¿ë ÄÄÇÁ·¹¼(Helium Compressor and Filtering System) |
Á¦ÀÛ»ç |
Bumhan |
¸ðµ¨¸í |
BH-AL7B |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1018È£
|
|
Àåºñ¸í |
ÇÚµå ÆßÇÁ(Two Speed Lightweight Hand Pump) |
Á¦ÀÛ»ç |
Enerpac |
¸ðµ¨¸í |
P392 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1104È£
|
|
Àåºñ¸í |
¹°¸®Àû Ư¼º ÃøÁ¤ ½Ã½ºÅÛ(Physical Property Measurement System) |
Á¦ÀÛ»ç |
Quantum Design |
¸ðµ¨¸í |
Quantum Design PPMS |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1104È£
|
|
Àåºñ¸í |
Àڱ⹰¼ºÃøÁ¤ÀåÄ¡(MAGNETIC PROPERTY MEASUREMENT SYSTEM) |
Á¦ÀÛ»ç |
QUANTUM DESIGN |
¸ðµ¨¸í |
XL5 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1104È£
|
|
Àåºñ¸í |
¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM)) |
Á¦ÀÛ»ç |
Park Systems |
¸ðµ¨¸í |
XE7 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1139È£
|
|
Àåºñ¸í |
¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD)) |
Á¦ÀÛ»ç |
CN1 |
¸ðµ¨¸í |
Atomic-Basic |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1139È£
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Telemark |
¸ðµ¨¸í |
246-28 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1145È£
|
|
Àåºñ¸í |
¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM)) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
Dimension Icon with ScanAsyst |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1152È£
|
|
Àåºñ¸í |
X-¼± ±¤ÀüÀÚ ºÐ±¤±â(X-ray Photoelectron Spectrometer (XPS) Microprobe) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
ESCALAB 250 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1153È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
GeminiSEM 500 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1153È£
|
|
Àåºñ¸í |
À̿ ¹Ð¸µ ½Ã½ºÅÛ(Cross Section Planar Ion Milling System) |
Á¦ÀÛ»ç |
GATAN |
¸ðµ¨¸í |
Ilion+II Model 697 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1162È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
AURIGA |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1163È£
|
|
Àåºñ¸í |
ÁÖ»çÇü ¿ÀÁ¦ ÀüÀÚÇö¹Ì°æ(Scanning Auger Electron Spectroscopy (AES) Nanoprobe) |
Á¦ÀÛ»ç |
ULVAC-PHI |
¸ðµ¨¸í |
PHI 700 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1163È£
|
|
Àåºñ¸í |
Áý¼Ó À̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
SII |
¸ðµ¨¸í |
SMI3050SE |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1169È£
|
|
Àåºñ¸í |
¼öÂ÷º¸Á¤ ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs-Corrected Scanning Transmission Electron Microscope (Cs-STEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-ARM200F |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1176È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
D/MAX-2500V |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1177È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
D/MAX-2500V |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1179È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
SmartLab |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1181È£
|
|
Àåºñ¸í |
±Û·Î¿ì ¹æÀü ºÐ±¤ ºÐ¼®±â(Glow Discharge Spectrometer) |
Á¦ÀÛ»ç |
LECO |
¸ðµ¨¸í |
GDS850A |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1183È£
|
|
Àåºñ¸í |
±Û·Î¿ì ¹æÀü ºÐ±¤ ºÐ¼®±â(Glow Discharge Spectrometer) |
Á¦ÀÛ»ç |
LECO |
¸ðµ¨¸í |
GDS850A |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1185È£
|
|
Àåºñ¸í |
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JSM-6480LV |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1187È£
|
|
Àåºñ¸í |
Rockwell °æµµ±â(Rockwell Hardness Testing Machine) |
Á¦ÀÛ»ç |
Akashi |
¸ðµ¨¸í |
Wizhard |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1188È£
|
|
Àåºñ¸í |
½ÃÂ÷¿ºÐ¼®/½ÃÂ÷Áֻ翷®ºÐ¼®±â(Differential Thermal Analysis (DTA)/Differential Scanning Calorimeter (DSC)) |
Á¦ÀÛ»ç |
SETARAM Instrumentation |
¸ðµ¨¸í |
Labsys DTA/DSC |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1188È£
|
|
Àåºñ¸í |
Vickers °æµµ±â(Vickers Hardness Testing Machine) |
Á¦ÀÛ»ç |
Mitutoyo |
¸ðµ¨¸í |
HV-114 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1188È£
|
|
Àåºñ¸í |
Ç¥¸é´ÜÂ÷ÃøÁ¤±â(Surface Profiler) |
Á¦ÀÛ»ç |
Veeco |
¸ðµ¨¸í |
Dektak 150 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1188È£
|
|
Àåºñ¸í |
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM)) |
Á¦ÀÛ»ç |
HITACHI |
¸ðµ¨¸í |
S-3400N |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1190È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JSM-7600F |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1192È£
|
|
Àåºñ¸í |
ÀüÀÚ¼± ¹Ì¼ÒºÎ ºÐ¼®±â(Electron Probe Microanalyzer (EPMA)) |
Á¦ÀÛ»ç |
SHIMADZU |
¸ðµ¨¸í |
EPMA-1600 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1194È£
|
|
Àåºñ¸í |
À̿ ºö ¹Ð¸µ ½Ã½ºÅÛ(Triple Ion Beam Miller) |
Á¦ÀÛ»ç |
Leica Microsystems |
¸ðµ¨¸í |
EM TIC020 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1196È£
|
|
Àåºñ¸í |
°íÁø°ø Ä«º» ÁõÂø±â(High Vacuum Carbon Coater) |
Á¦ÀÛ»ç |
Cressington |
¸ðµ¨¸í |
208carbon |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1198È£
|
|
Àåºñ¸í |
°¡½ººÎ½Ä½ÃÇè±â(Gas Corrosion Test Instrument) |
Á¦ÀÛ»ç |
SUGA |
¸ðµ¨¸í |
GT-100 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1272È£
|
|
Àåºñ¸í |
±Û·Î¿ì ¹æÀü Áú·®ºÐ¼®±â(Glow Discharge Mass Spectrometry (GD-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
ELEMENT GD |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1302È£
|
|
Àåºñ¸í |
°íºÐÇØ´É À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(High Resolution Inductively Coupled Plasma Mass Spectrometer (HR-ICP-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
ELEMENT XR |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1304È£
|
|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
VERTEX 70 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1306È£
|
|
Àåºñ¸í |
·¹ÀÌÀú À¯µµ ÇöóÁ ºÐ±¤ºÐ¼®±â(Tandem Laser-ablation Laser-induced Breakdown Spectrometer (LA-LIBS)) |
Á¦ÀÛ»ç |
Applied Spectra |
¸ðµ¨¸í |
J200 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1306È£
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|
Àåºñ¸í |
»ïÁß »ç±ØÀÚ À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(Triple Quadrupole Inductively Coupled Plasma Mass Spectrometer (TQ-ICP-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP TQ |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1306È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÁ Áú·®ºÐ¼®±â(Gas Chromatograph-Mass Spectrometer (GC-MS)) |
Á¦ÀÛ»ç |
SHIMADZU |
¸ðµ¨¸í |
GCMS-QP2010 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1308È£
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|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
AMETEK |
¸ðµ¨¸í |
Spectro Arcos |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1309È£
|
|
Àåºñ¸í |
¿øÀÚ Èí¼ö ºÐ±¤±â(Atomic Absorption Spectrometer (AAS)) |
Á¦ÀÛ»ç |
Analytik Jena |
¸ðµ¨¸í |
contrAA 800 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1309È£
|
|
Àåºñ¸í |
ºñµå »ùÇ÷¯(Automatic Electric Bead Sampler) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
Claisse TheOX |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1310È£
|
|
Àåºñ¸í |
¼øÂ÷ ºÐ¼®Çü Çü±¤ X-¼± ºÐ¼®ÀåÄ¡(»ó¸éÁ¶»çÇü)(Tube-above Sequential Wavelength Dispersive X-ray Fluorescence (WDXRF) Spectrometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
ZSX Primus II |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1310È£
|
|
Àåºñ¸í |
¼øÂ÷ ºÐ¼®Çü Çü±¤ X-¼± ºÐ¼®ÀåÄ¡(Sequential Wavelength Dispersive X-ray Fluorescence (WDXRF) Spectrometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
ZSX Primus |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1310È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Optima 8300 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1311È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP 7000 Series |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1311È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
AMETEK |
¸ðµ¨¸í |
Spectro Arcos |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1311È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890B/5977A |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1314È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890B/5977B |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1314È£
|
|
Àåºñ¸í |
¿·®ÃøÁ¤±â(Automatic Isoperibol Calorimeter) |
Á¦ÀÛ»ç |
Parr Instrument Company |
¸ðµ¨¸í |
6400 Calorimeter |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1316È£
|
|
Àåºñ¸í |
»ïÁß »ç±ØÀÚ LC/MS/MS ½Ã½ºÅÛ(Triple Quadrupole LC/MS/MS System) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
TSQ Quantum Ultra |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1316È£
|
|
Àåºñ¸í |
°í¼º´É ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ(Ultra High Performance Liquid Chromatograph (UHPLC)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
DIONEX UltiMate 3000 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1316È£
|
|
Àåºñ¸í |
°í¼º´É ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ(Ultra High Performance Liquid Chromatograph (UHPLC)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
DIONEX UltiMate 3000 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1316È£
|
|
Àåºñ¸í |
¿Å»Âø ÃøÁ¤ ½Ã½ºÅÛ(Thermal Desorption System) |
Á¦ÀÛ»ç |
Markes International |
¸ðµ¨¸í |
UNITY2 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1317È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Nittoseiko Analytech |
¸ðµ¨¸í |
AQF-2100H |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1318È£
|
|
Àåºñ¸í |
ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Dionex ICS-5000 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1320È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
MASTERSIZER 2000 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1320È£
|
|
Àåºñ¸í |
¼öÀº ºÐ¼®±â(Mercury Analyzer) |
Á¦ÀÛ»ç |
PS Analytical |
¸ðµ¨¸í |
Millennium System |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1328È£
|
|
Àåºñ¸í |
¼öÀº ºÐ¼®±â(Mercury Analyzer) |
Á¦ÀÛ»ç |
NIC |
¸ðµ¨¸í |
MA-2 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1328È£
|
|
Àåºñ¸í |
¸¶ÀÌÅ©·ÎÆÄ ½Ã·á ºÐÇØ ½Ã½ºÅÛ(Advanced Microwave Digestion System) |
Á¦ÀÛ»ç |
Milestone |
¸ðµ¨¸í |
ETHOS 1 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1334È£
|
|
Àåºñ¸í |
ÀÔµµ ºÐ¼®±â(Particle Analyzer) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
MASTERSIZER |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1334È£
|
|
Àåºñ¸í |
Áøµ¿Çü ÄŹÐ(Vibrating Cup Mill) |
Á¦ÀÛ»ç |
FRITSCH |
¸ðµ¨¸í |
Pulverisette 9 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1338È£
|
|
Àåºñ¸í |
HPT-E-CAPº¹ÇÕÇÁ·¹½º(HPT-E-CAP Compound Press System) |
Á¦ÀÛ»ç |
(ÁÖ)¸ðÀνýº |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 2022È£
|
|
Àåºñ¸í |
Ź»óÇü Àý´Ü±â(Tabletop Cut-off Machine) |
Á¦ÀÛ»ç |
Struers |
¸ðµ¨¸í |
Discotom-100 |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2177È£
|
|
Àåºñ¸í |
Àüµ¿ µðÁöÅÐ Çö¹Ì°æ(Opto-digital Motorizing Microscope) |
Á¦ÀÛ»ç |
OLYMPUS |
¸ðµ¨¸í |
DSX100 |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2179È£
|
|
Àåºñ¸í |
°øÃÊÁ¡ ·¹ÀÌÀú ÁÖ»ç Çö¹Ì°æ(Confocal Laser Scanning Microscope) |
Á¦ÀÛ»ç |
OLYMPUS |
¸ðµ¨¸í |
OLS3000 |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2179È£
|
|
Àåºñ¸í |
ÇǷνÃÇè±â(Fatigue Testing Machine) |
Á¦ÀÛ»ç |
MTS |
¸ðµ¨¸í |
MTS Landmark Servohydraulic Test System |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2180È£
|
|
Àåºñ¸í |
ÀÚµ¿ ¿¬¸¶±â(Auto Polisher) |
Á¦ÀÛ»ç |
Struers |
¸ðµ¨¸í |
Tegramin-30 |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2185È£
|
|
Àåºñ¸í |
ÇǷνÃÇè±â(Fatigue Testing Machine) |
Á¦ÀÛ»ç |
MTS |
¸ðµ¨¸í |
MTS Landmark Servohydraulic Test System |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2187È£
|
|
Àåºñ¸í |
ÇǷμö¸í½ÃÇè±â(Material Test System) |
Á¦ÀÛ»ç |
MTS |
¸ðµ¨¸í |
810 Material Test System |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2193È£
|
|
Àåºñ¸í |
ÇǷνÃÇè±â(Fatigue Testing Machine) |
Á¦ÀÛ»ç |
MTS |
¸ðµ¨¸í |
MTS Landmark Servohydraulic Test System |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2195È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÇ(Gas Chromatograph (GC)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Trace GC Ultra |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2362È£
|
|
Àåºñ¸í |
ÇǷμö¸í½ÃÇè±â(Material Test System) |
Á¦ÀÛ»ç |
MTS |
¸ðµ¨¸í |
810 Material Test System |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3003È£
|
|
Àåºñ¸í |
°¡¿/³Ã°¢ è¹ö(Heating/Cooling Chamber) |
Á¦ÀÛ»ç |
JEIO TECH |
¸ðµ¨¸í |
K-Series ID CHAMBER |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3009È£
|
|
Àåºñ¸í |
CASS ½ÃÇè±â(CASS Test Instrument) |
Á¦ÀÛ»ç |
SUGA |
¸ðµ¨¸í |
CAP-90V-5 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3010È£
|
|
Àåºñ¸í |
º¹ÇÕ »çÀÌŬ ½ÃÇè±â(Cyclic Corrosion Test Chamber) |
Á¦ÀÛ»ç |
Ascott Analytical |
¸ðµ¨¸í |
CC1000iP |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3016È£
|
|
Àåºñ¸í |
QUVÃËÁø ³»Èļº ½ÃÇè±â(QUV Accelerated Weathering Tester) |
Á¦ÀÛ»ç |
Q-LAB |
¸ðµ¨¸í |
QUV/spray |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3018È£
|
|
Àåºñ¸í |
Áø°ø è¹ö Á¤¹Ð ºÐ¼® Àåºñ(Vacuum Chamber I-V Probing System) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
MST5000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3102È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ ºÐ¼®±â(Semiconductor Analyzer) |
Á¦ÀÛ»ç |
KEITHLEY Instruments |
¸ðµ¨¸í |
4220-PGU |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3104È£
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Selcos |
¸ðµ¨¸í |
Cetus-E |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3104È£
|
|
Àåºñ¸í |
¿ ÈÇÐ ±â»ó ÁõÂø ÀåÄ¡(Thermal Chemical Vapor Deposition (CVD) System) |
Á¦ÀÛ»ç |
SNTEK |
¸ðµ¨¸í |
TCS5000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3104È£
|
|
Àåºñ¸í |
Á¤¹ÐÀÚµ¿Àý´Ü±â(Linear Precision Saw) |
Á¦ÀÛ»ç |
BUEHLER |
¸ðµ¨¸í |
ISOMET4000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3132È£
|
|
Àåºñ¸í |
Áø°ø ¿ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System) |
Á¦ÀÛ»ç |
TERALEADER |
¸ðµ¨¸í |
TLP1001 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3139È£
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
iNFOVION |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3147È£
|
|
Àåºñ¸í |
Áø°ø¹è¾ç±â(Vacuum Chamber & Frame) |
Á¦ÀÛ»ç |
SNTEK |
¸ðµ¨¸í |
SPR-5004 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3147È£
|
|
Àåºñ¸í |
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System) |
Á¦ÀÛ»ç |
Roche |
¸ðµ¨¸í |
LightCycler96 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3153È£
|
|
Àåºñ¸í |
¸¶ÀÌÅ©·ÎÇ÷¹ÀÌÆ® ¸®´õ(Multimode Microplate Reader) |
Á¦ÀÛ»ç |
TECAN |
¸ðµ¨¸í |
SPARK 10M |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3153È£
|
|
Àåºñ¸í |
ÀÚ¼ºÀ» ÀÌ¿ëÇÑ ¼¼Æ÷ºÐ¸®±â(Magnetic Cell Sorter) |
Á¦ÀÛ»ç |
BIO-RAD |
¸ðµ¨¸í |
S3e Cell Sorter |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3153È£
|
|
Àåºñ¸í |
Çü±¤/Àα¤ ÃøÁ¤ ½Ã½ºÅÛ(Fluoroscence/Luminescence Measuring System) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Fluoroskan Ascent FL |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3161È£
|
|
Àåºñ¸í |
PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System) |
Á¦ÀÛ»ç |
MUSASHI ENGINEERING, INC. |
¸ðµ¨¸í |
IMAGE MASTER 350PC SMART/SHOTMASTER 300DS-S |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3170È£
|
|
Àåºñ¸í |
¹ü¿ë ÇÁ·Îºê ½Ã½ºÅÛ(Universal Measurement Probe System) |
Á¦ÀÛ»ç |
TERALEADER |
¸ðµ¨¸í |
UMP100 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3170È£
|
|
Àåºñ¸í |
3D º¯ÇüÃøÁ¤½Ã½ºÅÛ(3D Deformation Analysis System) |
Á¦ÀÛ»ç |
GOM international AG |
¸ðµ¨¸í |
ARAMIS 12M |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3188È£
|
|
Àåºñ¸í |
ÁÖ»ç Åõ°ú ÀüÀÚÇö¹Ì°æ(Scanning Transmission Electron Microscope (STEM)) |
Á¦ÀÛ»ç |
COXEM |
¸ðµ¨¸í |
CX-200 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3188È£
|
|
Àåºñ¸í |
¸¸´É ½ÃÇè±â(Micro Universal Testing Machine (UTM)) |
Á¦ÀÛ»ç |
R&B |
¸ðµ¨¸í |
RB 302 ML |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3188È£
|
|
Àåºñ¸í |
Àڿܼ± ÆòÇ౤ Á¶»ç ½Ã½ºÅÛ(Mask Aligner and Exposure System) |
Á¦ÀÛ»ç |
MIDAS SYSTEM |
¸ðµ¨¸í |
MDA-400M |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3212È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ µð¹ÙÀ̽º ºÐ¼®±â(Semiconductor Device Analyzer) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
B1500A |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3219È£
|
|
Àåºñ¸í |
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System) |
Á¦ÀÛ»ç |
SNTEK |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3219È£
|
|
Àåºñ¸í |
ÇöóÁ ¿øÀÚÃþ ÁõÂø ½Ã½ºÅÛ(Plasma Enhanced Atomic Layer Deposition (PE-ALD) System) |
Á¦ÀÛ»ç |
ForALL |
¸ðµ¨¸í |
OZONE |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3223È£
|
|
Àåºñ¸í |
Àú¿Â ÃÊ¹ÚÆí¹Ì¼¼Àý´Ü±â(Cryoultramicrotome) |
Á¦ÀÛ»ç |
Leica Microsystems |
¸ðµ¨¸í |
MZ6 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3226È£
|
|
Àåºñ¸í |
¹Ú¸·ÃøÁ¤±â(Thin Film Measurement System) |
Á¦ÀÛ»ç |
KSV INSTRUMENTS |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3229È£
|
|
Àåºñ¸í |
ÀΰøÅ¾籤 ½Ã¹Ä·¹ÀÌÅÍ(Solar Simulator) |
Á¦ÀÛ»ç |
ABET Technologies |
¸ðµ¨¸í |
Sun 3000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3233È£
|
|
Àåºñ¸í |
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
COMPex 201 F |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3263È£
|
|
Àåºñ¸í |
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
Á¦ÀÛ»ç |
HIGGSLAB |
¸ðµ¨¸í |
PLD SYSTEM |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3263È£
|
|
Àåºñ¸í |
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System) |
Á¦ÀÛ»ç |
Photron Ltd. |
¸ðµ¨¸í |
FASTCAM SA1 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3267È£
|
|
Àåºñ¸í |
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System) |
Á¦ÀÛ»ç |
Photron Ltd. |
¸ðµ¨¸í |
FASTCAM SA2 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3267È£
|
|
Àåºñ¸í |
ÀüÁö ¼º´É ½ÃÇè±â(Multi-cycling Battery Test System) |
Á¦ÀÛ»ç |
Korea Thermo-Tech |
¸ðµ¨¸í |
SERIES 4000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3278È£
|
|
Àåºñ¸í |
´Ùä³Î Potentiostat(Multi-channel Potentiostat) |
Á¦ÀÛ»ç |
HS Technologies |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3278È£
|
|
Àåºñ¸í |
¿Áß·®-½ÃÂ÷Áֻ翷®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC)) |
Á¦ÀÛ»ç |
TA Instruments |
¸ðµ¨¸í |
SDT Q600 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3278È£
|
|
Àåºñ¸í |
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
COMPex Pro 102 F |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3282È£
|
|
Àåºñ¸í |
Àú¿ÂÀ¯ÁöÀåÄ¡(Cryostat System) |
Á¦ÀÛ»ç |
Oxford Instruments |
¸ðµ¨¸í |
CCC1104 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3289È£
|
|
Àåºñ¸í |
»ö¼Ò ·¹ÀÌÀú(Dye Laser) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
899 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3289È£
|
|
Àåºñ¸í |
±¤»ê¶õ °ËÃâ±â(Light Scattering Detector) |
Á¦ÀÛ»ç |
Precision Detectors |
¸ðµ¨¸í |
PD2020 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3306È£
|
|
Àåºñ¸í |
GPC ½Ã½ºÅÛ(Gel Permeation Chromatography (GPC) System) |
Á¦ÀÛ»ç |
Waters |
¸ðµ¨¸í |
1525/2414/410 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3312È£
|
|
Àåºñ¸í |
½ÃÂ÷ ÁÖ»ç ¿·®ÃøÁ¤±â(Differential Scanning Calorimeter (DSC)) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
DSC 4000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3312È£
|
|
Àåºñ¸í |
¼öÁ÷ Àü±â·Î(Vertical Tube Furnace) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
LTF 14/-/450 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3316È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System) |
Á¦ÀÛ»ç |
KEITHLEY Instruments |
¸ðµ¨¸í |
4200 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3340È£
|
|
Àåºñ¸í |
QE ÃøÁ¤±â(External and Internal Quantum Efficiency (EQE and IQE) Measurement System) |
Á¦ÀÛ»ç |
NEWPORT |
¸ðµ¨¸í |
Oriel IQE-200 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3340È£
|
|
Àåºñ¸í |
´Ü°áÁ¤ ¿¢½º·¹ÀÌ È¸ÀýÀåÄ¡(Single Crystal X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
APEXII Quazar |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3352/3354È£
|
|
Àåºñ¸í |
ºÐ¸»½Ã·á ¿¢½º·¹ÀÌ È¸ÀýÀåÄ¡(Powder X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Advance |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3352/3354È£
|
|
Àåºñ¸í |
X-¼±±¤ÀüÀںб¤ºÐ¼®±â(XPS xonnectable Deposition system) |
Á¦ÀÛ»ç |
ULVAC-PHI, Inc. |
¸ðµ¨¸í |
PHI GENESIS Multi-tech Scanning XPS |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3360/3362È£
|
|
Àåºñ¸í |
Áø°ø ¿ÁõÂø ½Ã½ºÅÛ(Vacuum Thermal Evaporating System) |
Á¦ÀÛ»ç |
WOOSUNG HI-VAC |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3363È£
|
|
Àåºñ¸í |
400 MHz ÇÙÀÚ±â°ø¸íºÐ±¤ºÐ¼®±â(400 MHz Nuclear Magnetic Resonance (NMR) Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
Avance 400 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3391È£
|
|
Àåºñ¸í |
Æí±¤ Çö¹Ì°æ(Polarized Stereo Microscope) |
Á¦ÀÛ»ç |
Leica Microsystems |
¸ðµ¨¸í |
Z16 APO |
¼³Ä¡Àå¼Ò |
°¡¼Ó±â ÀúÀ帵µ¿ 106È£
|
|
Àåºñ¸í |
°í¼º´É À¯¼¼Æ÷ºÐ¼®±â(High Performance Flow Cytometer) |
Á¦ÀÛ»ç |
Becton Dickinson And Company |
¸ðµ¨¸í |
FACS Canto II |
¼³Ä¡Àå¼Ò |
°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
|
|
Àåºñ¸í |
¿µ»óºÐ¼® ½Ã½ºÅÛ(Luminescent Image Analyzer) |
Á¦ÀÛ»ç |
FUJIFILM |
¸ðµ¨¸í |
LAS-4000 |
¼³Ä¡Àå¼Ò |
°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
|
|
Àåºñ¸í |
¸é¿ªÈ¿¼Ò ºÐ¼®±â(ElisSpot Reader) |
Á¦ÀÛ»ç |
Cellular Technology |
¸ðµ¨¸í |
ImmunoSpot S5UV |
¼³Ä¡Àå¼Ò |
°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
|
|
Àåºñ¸í |
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System) |
Á¦ÀÛ»ç |
Roche |
¸ðµ¨¸í |
LightCycler480 |
¼³Ä¡Àå¼Ò |
°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
|
|
Àåºñ¸í |
»ýü³» Çü±¤ºÐ±¤ ºÐ¼®±â(Automatic Multispectral In vivo Imaging) |
Á¦ÀÛ»ç |
CRI, INC |
¸ðµ¨¸í |
Maestro II |
¼³Ä¡Àå¼Ò |
°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
|
|
Àåºñ¸í |
°í¼Ó ´Ü¹éÁú ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ (FPLC)(Fast Protein Liquid Chromatography (FPLC)) |
Á¦ÀÛ»ç |
GE Healthcare |
¸ðµ¨¸í |
AKTA purifier |
¼³Ä¡Àå¼Ò |
°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
|
|
Àåºñ¸í |
ÀÚµ¿ ¸é¿ª ºÐ¼®±â(Automatic Immunology Analyzer) |
Á¦ÀÛ»ç |
(ÁÖ)»ç°·¡ºêÅØ |
¸ðµ¨¸í |
cobas e411 |
¼³Ä¡Àå¼Ò |
°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
|
|
Àåºñ¸í |
°í¼Ó ±¤ÇØ»óµµ ¹× À½ÆÄÇØ»óµµ ±¤ÃÊÀ½ÆÄ Çö¹Ì°æ(High speed Photoacoustic Microscopy ) |
Á¦ÀÛ»ç |
¿ÉƼÄÚ |
¸ðµ¨¸í |
Opticho M¡¡ |
¼³Ä¡Àå¼Ò |
°¡Å縯´ëÀÇ»ý¸í°øÇבּ¸¼Ò
|
|
Àåºñ¸í |
5Ãà º¹ÇÕ °¡°ø±â(5-axis Computerized Numerical Control (CNC) Turning Center) |
Á¦ÀÛ»ç |
DMG |
¸ðµ¨¸í |
CTX Beta 1250 TC |
¼³Ä¡Àå¼Ò |
±â°è°øÀÛµ¿ 100È£
|
|
Àåºñ¸í |
¹ü¿ë ¹Ð¸µ ¸Ó½Å´×¼¾ÅÍ(Universal Milling Machining Center) |
Á¦ÀÛ»ç |
±âÈï±â°è |
¸ðµ¨¸í |
KMB-U5 |
¼³Ä¡Àå¼Ò |
±â°è°øÀÛµ¿ 100È£
|
|
Àåºñ¸í |
¼öÁ÷Çü ¸Ó½Ã´×¼¾ÅÍ(Vertical Machining Center) |
Á¦ÀÛ»ç |
µÎ»ê°øÀÛ±â°è |
¸ðµ¨¸í |
DNM 750¥± |
¼³Ä¡Àå¼Ò |
±â°è°øÀÛµ¿ 100È£
|
|
Àåºñ¸í |
CNC ¼öÆòÇü ¸Ó½Å´×¼¾ÅÍ(Computerized Numerical Control (CNC) Machining Center) |
Á¦ÀÛ»ç |
´ë¿ìÁß°ø¾÷ |
¸ðµ¨¸í |
ACE-H50 |
¼³Ä¡Àå¼Ò |
±â°è°øÀÛµ¿ 101È£
|
|
Àåºñ¸í |
CNC ¿ÍÀ̾î ÄÆÆÃ ¸Ó½Å´×¼¾ÅÍ(Computerized Numerical Control (CNC) Wire Cut Machining Center) |
Á¦ÀÛ»ç |
SODICK |
¸ðµ¨¸í |
AL600G |
¼³Ä¡Àå¼Ò |
±â°è°øÀÛµ¿ 101È£
|
|
Àåºñ¸í |
±Ý¼Ó ºÐ¸» 3Â÷¿ø Á¶Çü Àåºñ(Metal Additive Manufacturing Machine) |
Á¦ÀÛ»ç |
Concept Laser GmbH |
¸ðµ¨¸í |
M2 cusing SL400W |
¼³Ä¡Àå¼Ò |
±â°è°øÀÛµ¿ 202È£
|
|
Àåºñ¸í |
ÁÖ»çÀüÀÚÇö¹Ì°æ(S.E.M(SCANNING ELECTRON MICROSCOPE)) |
Á¦ÀÛ»ç |
JEOL LTD |
¸ðµ¨¸í |
JSM-6390LV |
¼³Ä¡Àå¼Ò |
±â°è½ÇÇ赿 106È£
|
|
Àåºñ¸í |
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System) |
Á¦ÀÛ»ç |
Photron Ltd. |
¸ðµ¨¸í |
FASTCAM Mini UX100 |
¼³Ä¡Àå¼Ò |
±â°è½ÇÇ赿 108È£
|
|
Àåºñ¸í |
´ÙÀÌ¿Àµå ·¹ÀÌÁ® ½Ã½ºÅÛ(Diode Laser System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
Chameleon Vision 2 |
¼³Ä¡Àå¼Ò |
±â°è½ÇÇ赿 206È£
|
|
Àåºñ¸í |
±¤ ÆÄ¶ó¸ÞÆ®¸¯ ¹ßÁø±â(Optical Parametric Oscillator) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
Chameleon OPO |
¼³Ä¡Àå¼Ò |
±â°è½ÇÇ赿 206È£
|
|
Àåºñ¸í |
ÆèÅäÃÊ ÆÞ½º ·¹ÀÌÀú ½Ã½ºÅÛ(Femtosecond Pulse Laser System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
Chameleon |
¼³Ä¡Àå¼Ò |
±â°è½ÇÇ赿 206È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ±¸µ¿ ±¤¿ø(Laser-driven Light Source (LSDS)) |
Á¦ÀÛ»ç |
ENERGETIQ TECHNOLOGY |
¸ðµ¨¸í |
EQ-1500 |
¼³Ä¡Àå¼Ò |
±â°è½ÇÇ赿 206È£
|
|
Àåºñ¸í |
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JSM-7401F |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 103È£
|
|
Àåºñ¸í |
3D ¿øÀÚÇö¹Ì°æ(3D Atom Probe) |
Á¦ÀÛ»ç |
CAMECA Instruments |
¸ðµ¨¸í |
LA-WATAP |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-2È£
|
|
Àåºñ¸í |
±¹¼Ò ·¹ÀÌÁ® Àü°èÇü ¿øÀÚ´ÜÃþÇö¹Ì°æ(Local Electrode Atom Probe) |
Á¦ÀÛ»ç |
CAMECA Instruments |
¸ðµ¨¸í |
LEAP 4000X HR |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-3È£
|
|
Àåºñ¸í |
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Nanolab G3 CX |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-4È£
|
|
Àåºñ¸í |
ÀÌÂ÷ÀÌ¿ÂÁú·®ºÐ¼®±â(Secondary Ion Mass Spectrometry (SIMS)) |
Á¦ÀÛ»ç |
CAMECA Instruments |
¸ðµ¨¸í |
IMS 6F |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105È£
|
|
Àåºñ¸í |
¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM)) |
Á¦ÀÛ»ç |
Veeco |
¸ðµ¨¸í |
Dimension 3100 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 101È£
|
|
Àåºñ¸í |
ÃʰíÁø°øÀú¿Â ÁÖ»çÅͳθµÇö¹Ì°æ(Ultra High Vacuum Low Temperature Scanning Tunneling Microscopy (STM)) |
Á¦ÀÛ»ç |
Unisoku |
¸ðµ¨¸í |
USM 1200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 101È£
|
|
Àåºñ¸í |
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Helios 600 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
|
|
Àåºñ¸í |
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Helios 650 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
|
|
Àåºñ¸í |
3D Ç¥¸éÃøÁ¤ ½Ã½ºÅÛ(3D Optical Surface Metrology System) |
Á¦ÀÛ»ç |
Leica Microsystems |
¸ðµ¨¸í |
DCM 3D |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 216È£
|
|
Àåºñ¸í |
°í¿Â ¿Ã³¸®·Î(High Temperature Anneal Furnace) |
Á¦ÀÛ»ç |
ULVAC |
¸ðµ¨¸í |
PFS-6000-25 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 216È£
|
|
Àåºñ¸í |
Á¢ÃË½Ä Ç¥¸é ´ÜÂ÷ÃøÁ¤±â(Contact Surface Profiler) |
Á¦ÀÛ»ç |
KLA Tencor |
¸ðµ¨¸í |
D-600 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 216È£
|
|
Àåºñ¸í |
°í¿Â ¿Ã³¸®·Î(High Temperature Anneal Furnace) |
Á¦ÀÛ»ç |
ULVAC |
¸ðµ¨¸í |
PFS-6000-25 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 216È£
|
|
Àåºñ¸í |
¸¶½ºÅ©¸®½º ·¹ÀÌÀú ¸®¼Ò±×·¡ÇÇ(Maskless Laser Lithography, MLA150) |
Á¦ÀÛ»ç |
ÁÖ½Äȸ»ç³ª¿ì |
¸ðµ¨¸í |
MLA150 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 2Ãþ 216È£
|
|
Àåºñ¸í |
Áø°ø ¿ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System) |
Á¦ÀÛ»ç |
DDONG High Technologies |
¸ðµ¨¸í |
Thermal Evaporator System |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
|
|
Àåºñ¸í |
°¡½º Èñ¼® ½Ã½ºÅÛ(Computerized Gas Dilution System) |
Á¦ÀÛ»ç |
Environics |
¸ðµ¨¸í |
Series 4040 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
|
|
Àåºñ¸í |
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2100F(with STEM Cs corrector) |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø TEM ½Ç
|
|
Àåºñ¸í |
±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope
(Cs-corrected HR-STEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2200FS |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø TEM-2200FS½Ç
|
|
Àåºñ¸í |
Àý´Ü¿¬¸¶±â(Polishing Machine) |
Á¦ÀÛ»ç |
Allied |
¸ðµ¨¸í |
Multiprep |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
LEO Elektronrnmikroskopie GmbH |
¸ðµ¨¸í |
FE-SEM |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVE-C300160 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
À¯±â¹° ÁõÂø±â(Organic Molecular Beam Deposition (OMBD) & Thermal Evaporator) |
Á¦ÀÛ»ç |
alpha-plus |
¸ðµ¨¸í |
OMBD & Thermal |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas)) |
Á¦ÀÛ»ç |
ATIS |
¸ðµ¨¸í |
Manual Wet Station |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas)) |
Á¦ÀÛ»ç |
ATIS |
¸ðµ¨¸í |
Manual Wet Station |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
Á֯ļöÃøÁ¤±â(Universal Probe Holder) |
Á¦ÀÛ»ç |
MBRAUN |
¸ðµ¨¸í |
MB6000 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
±Ý¼Ó À¯±â¹° ÈÇбâ»óÁõÂø ½Ã½ºÅÛ(Metalorganic Chemical Vapor Deposition (MOVCD) System) |
Á¦ÀÛ»ç |
Jusung Eng. |
¸ðµ¨¸í |
Eureka 2000 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD)) |
Á¦ÀÛ»ç |
QUROS |
¸ðµ¨¸í |
Plus 200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
°íºÐÀÚ À¯±â ¹ÝµµÃ¼ ¹°Áú µµÆ÷ ÀåÄ¡(Spin Coater with Glove Box) |
Á¦ÀÛ»ç |
¼¼¸í¿¡¹ö¿¡³ÊÁö(ÁÖ) |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
Àڿܼ± ÆòÇ౤ Á¶»ç ½Ã½ºÅÛ(Mask Aligner) |
Á¦ÀÛ»ç |
(ÁÖ)½ÅÄÚ |
¸ðµ¨¸í |
MA6 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVE-4000 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¸®¼Ò±×·¡ÇÇ(Lithography) |
Á¦ÀÛ»ç |
¿¤¸®¿À´Ð½º |
¸ðµ¨¸í |
ELS-7000 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
·¹ÀÌÀú ¸®¼Ò±×·¡ÇÇ ½Ã½ºÅÛ(Laser Lithography system) |
Á¦ÀÛ»ç |
Heidelberg Instruments |
¸ðµ¨¸í |
DWL-200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½ºÆ®·¹½º ÃøÁ¤ ½Ã½ºÅÛ(Stress Measurement System) |
Á¦ÀÛ»ç |
FSM |
¸ðµ¨¸í |
500TC |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÀÓ°èÄ¡¼ö ÃøÁ¤ ÁÖ»çÀüÀÚÇö¹Ì°æ(Critical Dimension Scanning Electron Microscope (CD-SEM)) |
Á¦ÀÛ»ç |
HITACHI |
¸ðµ¨¸í |
S-9380 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½À½Ä ¼¼Á¤ÀåÄ¡(Wet Station (Acid)) |
Á¦ÀÛ»ç |
High Integrated Technology (HIT) |
¸ðµ¨¸í |
HWC-MCP |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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Àåºñ¸í |
±ØÀڿܼ± ûÁ¤ÀåÄ¡(Extreme Ultraviolet (EUV) Lithography) |
Á¦ÀÛ»ç |
(ÁÖ)¾¾¿£µðÇ÷¯½º |
¸ðµ¨¸í |
Track |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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Àåºñ¸í |
°¨±¤Á¦ ȸÀü µµÆ÷±â(Photoresist (PR) Spin Coater) |
Á¦ÀÛ»ç |
SAWATEC Solutions AG |
¸ðµ¨¸í |
LSM 250 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
Àú¾Ð ÈÇÐÁõÂøÀåÄ¡(ÆÛ´Ï½º ŸÀÔ)(Low Pressure Chemical Vapor Deposition (LP-CVD; Furnace Type)) |
Á¦ÀÛ»ç |
(ÁÖ)À¯ÁøÅ×Å© |
¸ðµ¨¸í |
BJM100 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
Á¦ÀÛ»ç |
¾ÆÅؽýºÅÛ |
¸ðµ¨¸í |
UF-CVD 200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
À¯µµ°áÇÕ ÇöóÁ ½Ä°¢ ÀåÄ¡(Inductively Coupled Plasma (ICP) Etcher) |
Á¦ÀÛ»ç |
(ÁÖ)µð¿¥¿¡½º |
¸ðµ¨¸í |
ICP Etcher |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
°íÀü·ù ÀÓÇöõÅÍ(High-Current Implantor) |
Á¦ÀÛ»ç |
Applied Materials |
¸ðµ¨¸í |
VIISion200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
»ó¾Ð ÈÇбâ»óÁõÂø¹ý(Atmosphere Pressure Chemical Vapor Deposition (APCVD)) |
Á¦ÀÛ»ç |
Watkins Johnson |
¸ðµ¨¸í |
WJ-1000T |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
°í¿Â¿Ã³¸®¿ë V-ÆÛ´Ï½º(High Temperature Process V-Furnace) |
Á¦ÀÛ»ç |
TEL |
¸ðµ¨¸í |
Alpha-808SD |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½À½Ä»êÈ¿ë V-ÆÛ´Ï½º(Wet Oxidation V-Furnace) |
Á¦ÀÛ»ç |
TEL |
¸ðµ¨¸í |
Alpha-808SD |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
°Ç½Ä»êÈ¿ë V-ÆÛ´Ï½º(Dry Oxidation V-Furnace) |
Á¦ÀÛ»ç |
TEL |
¸ðµ¨¸í |
Alpha-808DN |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¸¶½ºÅ© Á¤·Ä±â(Mask Aligner) |
Á¦ÀÛ»ç |
SUSS MICROTEC LITHOFAOPHY GMBH |
¸ðµ¨¸í |
MA8 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ź¼Ò³ª³ëÆ©ºê ÇÕ¼º CVD(Carbon Nanotube (CNT) Synthesis Chemical Vapor Deposition (CVD)) |
Á¦ÀÛ»ç |
¾ÆÅؽýºÅÛ |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÁßÀü·ù ÀÌ¿ÂÁÖÀÔÀåÄ¡(Medium Current Implanter) |
Á¦ÀÛ»ç |
Varian |
¸ðµ¨¸í |
E220HP |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
Á¦ÀÛ»ç |
BMR Technology Co. |
¸ðµ¨¸í |
HiDep-SC |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
°¨±¤Á¦ Á¦°Å ÀåÄ¡(Photoresist (PR) Asher) |
Á¦ÀÛ»ç |
PSK |
¸ðµ¨¸í |
DAS-2000 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVE-C300160 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¾ç¸é Á¤·Ä ³ë±¤±â(Double Side Alignment Stepper) |
Á¦ÀÛ»ç |
ASML |
¸ðµ¨¸í |
PAS550 200B |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½Ç¸®ÄÜ °íÁ¾È¾ºñ ½Ä°¢ÀåÄ¡(Deep Reactive Ion Etcher (DRIE)) |
Á¦ÀÛ»ç |
SPTS |
¸ðµ¨¸í |
Pegasus |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
±Ý¼Ó¸· ½Ä°¢ ÀåÄ¡(Special Metal Dry Etcher) |
Á¦ÀÛ»ç |
ULVAC |
¸ðµ¨¸í |
NE 7800 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
º¸È£¸·¿ë ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD) for Passivation) |
Á¦ÀÛ»ç |
TES |
¸ðµ¨¸í |
TELIA200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
´ÙÀÌ½Ì ½î¿ì(Dicing Saw) |
Á¦ÀÛ»ç |
DISCO |
¸ðµ¨¸í |
DFD 6340 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¼öÁ÷È®»êÀü±â·Î(Vertical Pyro Furnace) |
Á¦ÀÛ»ç |
(ÁÖ)¸®µå¿£Áö´Ï¾î¸µ |
¸ðµ¨¸í |
VULCAN-V81RD |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
(GLOCAL)ü¼ººÐºÐ¼®±â(Whole Body Composition Analyzer) |
Á¦ÀÛ»ç |
EchoMRI LLC |
¸ðµ¨¸í |
EchoMRI-100H Analyzer |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇе¿ A210È£
|
|
Àåºñ¸í |
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-1011 |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 156È£
|
|
Àåºñ¸í |
°í¼Ó ´Ü¹éÁú ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ (FPLC)(Fast Protein Liquid Chromatography (FPLC)) |
Á¦ÀÛ»ç |
GE Healthcare |
¸ðµ¨¸í |
AKTA FPLC |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 229È£
|
|
Àåºñ¸í |
ÃʰíÇØ»óµµ smFRET STORM À̹Ì¡ Àåºñ(Super-resolution smFRET STORM imaging system) |
Á¦ÀÛ»ç |
ONI |
¸ðµ¨¸í |
Oxford Nanoimager S |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 253È£
|
|
Àåºñ¸í |
Çü±¤ À̹ÌÁö ºÐ¼®±â(Fluorescent Image Analyzer) |
Á¦ÀÛ»ç |
GE Healthcare |
¸ðµ¨¸í |
Amersham Typhoon |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 281È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ¹Ì¼¼ ÇØºÎ ½Ã½ºÅÛ(Laser Microdissection Microscope System) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
PALM MicroBeam |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 341È£
|
|
Àåºñ¸í |
¸¶ÀÌÅ©·ÎÇ÷¹ÀÌÆ® ¸®´õ(Multimode Plate Reader) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
EnSpire Alpha |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 378È£
|
|
Àåºñ¸í |
ÀÚµ¿ Á¶Á÷ 󸮱â(Automatic Tissue Processor) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Shandon Citadel 1000 |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 402È£
|
|
Àåºñ¸í |
Ź»óÇü ¸¶ÀÌÅ©·Î¾î·¹ÀÌ ½Ã½ºÅÛ(Benchtop Microarray System) |
Á¦ÀÛ»ç |
GENETIX |
¸ðµ¨¸í |
QArray mini |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 458È£
|
|
Àåºñ¸í |
µå¶ø¼¼ÅÍ(Drop Setter for Protein Crystallization) |
Á¦ÀÛ»ç |
FORMULATRIX |
¸ðµ¨¸í |
NT8 |
¼³Ä¡Àå¼Ò |
»ý¸í°úÇаü 204È£
|
|
Àåºñ¸í |
Ãʰí¼Ó¿ø½ÉºÐ¸®±â(Ultracentrifuge) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima XE-100 |
¼³Ä¡Àå¼Ò |
¼¼Æ÷¸·´Ü¹éÁú¿¬±¸¼Ò 310È£ °øµ¿±â±â½Ç
|
|
Àåºñ¸í |
Ź»óÇüÃʰí¼Ó¿ø½ÉºÐ¸®±â(Table-Top Ultracentrifuge) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima MAX-XP |
¼³Ä¡Àå¼Ò |
¼¼Æ÷¸·´Ü¹éÁú¿¬±¸¼Ò 310È£ °øµ¿±â±â½Ç
|
|
Àåºñ¸í |
[±Û·ÎÄÃ] 3D·¹Áø ÇÁ¸°ÅÍ +¼¼Ã´±â ¼¼Æ®([Glocal] 3D Resin Printer + Washing Machine Set) |
Á¦ÀÛ»ç |
¿¡ÀÌÆå½º¾²¸®µð(APEX3D) |
¸ðµ¨¸í |
Form 4L Complete Package |
¼³Ä¡Àå¼Ò |
ÀΰøÁö´É¿¬±¸¿ø 142È£
|
|
Àåºñ¸í |
[±Û·ÎÄÃ]¸ð¹ÙÀÏ ·Îº¿([Glocal]Mobile robot) |
Á¦ÀÛ»ç |
À§°í·Îº¸Æ½½º ÁÖ½Äȸ»ç |
¸ðµ¨¸í |
RANGER MINI 3.0 |
¼³Ä¡Àå¼Ò |
ÀΰøÁö´É¿¬±¸¿ø 142È£
|
|
Àåºñ¸í |
[±Û·ÎÄÃ]¸ð¹ÙÀÏ ·Îº¿([Glocal]Mobile robot) |
Á¦ÀÛ»ç |
À§°í·Îº¸Æ½½º ÁÖ½Äȸ»ç |
¸ðµ¨¸í |
RANGER MINI 3.0 |
¼³Ä¡Àå¼Ò |
ÀΰøÁö´É¿¬±¸¿ø 142È£
|
|
Àåºñ¸í |
ÇÁ·£Ä« ¸®¼Ä¡ 3 ·Îº¿ ½Ã½ºÅÛ(FRANKA RESEARCH 3 robot system) |
Á¦ÀÛ»ç |
Franka Robotics |
¸ðµ¨¸í |
Franka Research 3 |
¼³Ä¡Àå¼Ò |
ÀΰøÁö´É¿¬±¸¿ø 142È£
|
|
Àåºñ¸í |
¸ð¼Çĸó ½Ã½ºÅÛ(Motion Capture System) |
Á¦ÀÛ»ç |
Optitrack |
¸ðµ¨¸í |
OptiTrack Motion Tracking System |
¼³Ä¡Àå¼Ò |
ÀΰøÁö´É¿¬±¸¿ø 142È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2100 (HR) |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 105È£
|
|
Àåºñ¸í |
±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope(Cs-corrected HR-STEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2200FS (UHR) |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 109È£
|
|
Àåºñ¸í |
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
HITACHI |
¸ðµ¨¸í |
7600H |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 111È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 DISCOVERY |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 111È£
|
|
Àåºñ¸í |
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM)) |
Á¦ÀÛ»ç |
HITACHI |
¸ðµ¨¸í |
S-3400N |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 111È£
|
|
Àåºñ¸í |
½ÃÂ÷ ÁÖ»ç ¿·®ÃøÁ¤±â(Differential Scanning Calorimeter (DSC)) |
Á¦ÀÛ»ç |
SETARAM Instrumentation |
¸ðµ¨¸í |
Labsys Evo |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 112È£
|
|
Àåºñ¸í |
Àú¿Â±¤ÇÐÃøÁ¤Àåºñ(Optical Cryostat) |
Á¦ÀÛ»ç |
MONTANA INSTRUMENTS |
¸ðµ¨¸í |
CRYOSTATION C2 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 113È£
|
|
Àåºñ¸í |
Àڿܼ± ÆòÇ౤ Á¶»ç ½Ã½ºÅÛ(Mask Aligner) |
Á¦ÀÛ»ç |
KARL SUSS KG-GMBH |
¸ðµ¨¸í |
MJB 3 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 206È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ½Ã½ºÅÛ(Laser System) |
Á¦ÀÛ»ç |
KIMMON KOHA |
¸ðµ¨¸í |
IK3301R-G |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 206È£
|
|
Àåºñ¸í |
½ºÅ©·¡Ä¡ ½ÃÇè±â(Scratch Tester) |
Á¦ÀÛ»ç |
R&B |
¸ðµ¨¸í |
RB 311 Sketch |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 206È£
|
|
Àåºñ¸í |
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System) |
Á¦ÀÛ»ç |
LAMBDA PHYSIK AG |
¸ðµ¨¸í |
Compex 205 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
Ç¥¸é´ÜÂ÷ÃøÁ¤±â(Alpha Step Surface Profiler) |
Á¦ÀÛ»ç |
KLA TENCOR CORP. |
¸ðµ¨¸í |
Alpha-step 500 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
ÁÖ»ç ÇÁ·Îºê Çö¹Ì°æ(Scanning Probe Microscope (SPM)) |
Á¦ÀÛ»ç |
Veeco |
¸ðµ¨¸í |
Dimension 3100 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
LED ÃøÁ¤ ½Ã½ºÅÛ(Wafer-level LED Measurement System) |
Á¦ÀÛ»ç |
WithLight |
¸ðµ¨¸í |
OPI-170 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System) |
Á¦ÀÛ»ç |
KEITHLEY Instruments |
¸ðµ¨¸í |
4200-SCS |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
±âü ºÐ¼®±â(Gas Analyzer) |
Á¦ÀÛ»ç |
INFICON |
¸ðµ¨¸í |
3000 Micro GC |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVPED-T0583 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 210È£
|
|
Àåºñ¸í |
°Ç½Ä½Ä°¢ÀåÄ¡(Inductively Coupled Plasma (ICP) Etcher) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVICP-T406530 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 210È£
|
|
Àåºñ¸í |
¿þÀÌÆÛ Á¢ÇÕ±â(Wafer Bonder) |
Á¦ÀÛ»ç |
Nano Sol Tech |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 210È£
|
|
Àåºñ¸í |
Áø°ø ¿ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System) |
Á¦ÀÛ»ç |
GD-Tech |
¸ðµ¨¸í |
KVT-2008L |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 210È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
D/MAX-2500-PC |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 304-1È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚ Çö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
PHILIPS ELECTRON OPTICS B.V. |
¸ðµ¨¸í |
XL30S FEG |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 306-1È£
|
|
Àåºñ¸í |
¿¢½º¼± ¶ó¿ì¿¡ ȸÀýÆÐÅÏ ÃøÁ¤ÀåÄ¡(X-ray Diffractometer) |
Á¦ÀÛ»ç |
RES-Lab Co.,Ltd. |
¸ðµ¨¸í |
XRD mate IPX-LC/B |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 406È£
|
|
Àåºñ¸í |
850 MHz ÇÙÀÚ±â°ø¸íºÐ±¤ºÐ¼®±â(850 MHz Nuclear Magnetic Resonance (NMR) Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
|
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 108È£
|
|
Àåºñ¸í |
500 MHz ÇÙÀÚ±â°ø¸íºÐ±¤ºÐ¼®±â[500 MHz NMR (#2)](500 MHz Nuclear Magnetic Resonance (NMR) Spectrometer [500 MHz NMR (#2)]) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
AVANCE III HD |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 110È£
|
|
Àåºñ¸í |
500 MHz ÇÙÀÚ±â°ø¸íºÐ±¤ºÐ¼®±â[500 MHz NMR (#1)](500 MHz Nuclear Magnetic Resonance (NMR) Spectrometer [500 MHz NMR (#1)]) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
AVANCE III 500 |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 110È£
|
|
Àåºñ¸í |
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System) |
Á¦ÀÛ»ç |
(ÁÖ)¾ÅÅ©·Ð |
¸ðµ¨¸í |
MotionPro Y7S1 |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 314È£
|
|
Àåºñ¸í |
ÀÔÀÚ ¿µ»ó À¯¼Ó°è(Particle Image Velocimetry (PIV) System) |
Á¦ÀÛ»ç |
TSI |
¸ðµ¨¸í |
MODULE4G-2DPIV |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 316È£
|
|
Àåºñ¸í |
ź¼Ò ºÐ¼® Àåºñ(Carbon Analyzer) |
Á¦ÀÛ»ç |
UIC INC. |
¸ðµ¨¸í |
CM135 |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
DIONEX ICS-2100 |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
¼Õ¹ß ¸ð´ÏÅÍ(Hand Foot Monitor) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
FHT65LLX |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(Inductively Coupled Plasma Mass Spectrometer (ICP-MS)) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
NexION-300D |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
¹æ»ç¼± µ¿À§¿ø¼Ò ¾×ü ¼¶±¤ °è¼ö±â(Liquid Scintillation Analyzer) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Tri-carb 2910TR |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
MiniFlex 600 |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
ÀúÁØÀ§ ¾×ü¼¶±¤ºÐ¼®±â(Low Activity Liquid Scintillation Analyzer) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Tri-Carb 5110 TR |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
¿¬±¸¿ë ·Îº¿(Research Robot) |
Á¦ÀÛ»ç |
rethink robotics |
¸ðµ¨¸í |
Baxter |
¼³Ä¡Àå¼Ò |
Á¦2°øÇаü 115È£
|
|
Àåºñ¸í |
±¤ÇÐ½Ä 3Â÷¿ø ºñÁ¢ÃË ½ºÄ³³Ê(Optical 3D Scanner) |
Á¦ÀÛ»ç |
FARO |
¸ðµ¨¸í |
Focus 3D S120 |
¼³Ä¡Àå¼Ò |
Á¦2°øÇаü 206È£
|
|
Àåºñ¸í |
ºñÁ¢ÃË½Ä 3Â÷¿ø ½ºÄ³³Ê(Structured-light 3D Scanner) |
Á¦ÀÛ»ç |
Breuckmann |
¸ðµ¨¸í |
SmartSCAN3D-HE |
¼³Ä¡Àå¼Ò |
Á¦2°øÇаü 206È£
|
|
Àåºñ¸í |
DPSS ·¹ÀÌÀú(Diode-pumped Solid-state (DPSS) Laser) |
Á¦ÀÛ»ç |
LIGHTHOUSE PHOTONICS |
¸ðµ¨¸í |
Sprout-G-12W |
¼³Ä¡Àå¼Ò |
Á¦2°øÇаü 504È£
|
|
Àåºñ¸í |
Àç»ý ÁõÆø±â(Regenerative Amplifier System) |
Á¦ÀÛ»ç |
Spectra-Physics |
¸ðµ¨¸í |
Spitfire Ace |
¼³Ä¡Àå¼Ò |
Á¦2°øÇаü 504È£
|
|
Àåºñ¸í |
°íºÐÇØ´É 8ä³Î ·¹ÀÌÀú ÆÄÀå ºÐ¼®±â(Wavelength Analyzer(8ch)) |
Á¦ÀÛ»ç |
ž·¹ÀÌÀúÅ×Å© |
¸ðµ¨¸í |
WS8-10 |
¼³Ä¡Àå¼Ò |
Á¦2°øÇаü 506È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ ·¹ÀÌÀú(Tunable Semiconductor Laser) |
Á¦ÀÛ»ç |
Santec |
¸ðµ¨¸í |
TSL-550 |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 308È£
|
|
Àåºñ¸í |
¹ÝÀÚµ¿ ¿ÍÀÌ¾î º»´õ(Semi Automatic Wire Bonder) |
Á¦ÀÛ»ç |
TPT |
¸ðµ¨¸í |
HB16 |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 308È£
|
|
Àåºñ¸í |
°íÈ¿À² À̹Ì¡ ½Ã½ºÅÛ(Electron Multiplying Charge-Coupled Device (EMCCD)) |
Á¦ÀÛ»ç |
Andor |
¸ðµ¨¸í |
iXon DU-897 |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 006È£
|
|
Àåºñ¸í |
Çö¹Ì°æ Stage ¹× Á¶Àý ½Ã½ºÅÛ(Microscope Stage and Controller System) |
Á¦ÀÛ»ç |
Applied Scientific Instrumentation (ASI) |
¸ðµ¨¸í |
MS-2000 |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 006È£
|
|
Àåºñ¸í |
¹ü¿ë ¹Ð¸µ ¸Ó½Å´×¼¾ÅÍ(Universal Milling Machining Center) |
Á¦ÀÛ»ç |
±âÈï±â°è |
¸ðµ¨¸í |
KMB-U3 |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 007È£
|
|
Àåºñ¸í |
°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(High Frequency Induction Heater) |
Á¦ÀÛ»ç |
EMWise Communications |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 105È£
|
|
Àåºñ¸í |
Á֯ļö ºÐ¼®±â(Spectrum Analyzer) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
E4402B |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 105È£
|
|
Àåºñ¸í |
BWO ¹Ð¸®¹ÌÅÍÆÄ ¹ß»ý±â(Backward Wave Oscillator (BWO) Sweep Controller) |
Á¦ÀÛ»ç |
ELVA-1 Microwave |
¸ðµ¨¸í |
G4-143f |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 105È£
|
|
Àåºñ¸í |
½ÅÈ£ ¹ß»ý±â(Signal Generator) |
Á¦ÀÛ»ç |
Rohde&Schwarz |
¸ðµ¨¸í |
SMF100A |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 105È£
|
|
Àåºñ¸í |
±Ø¹Ì±¤ °ËÃâ Ä«¸Þ¶ó(Intensified Charged Coupled Device (ICCD)) |
Á¦ÀÛ»ç |
Princeton Instruments |
¸ðµ¨¸í |
PI-MAX4-1024i |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 105È£
|
|
Àåºñ¸í |
´õºí ¸ð³ë Å©·Î ¸ÞÀÌÅÍ(Double monochromator) |
Á¦ÀÛ»ç |
Teledyne Princeton Instruments |
¸ðµ¨¸í |
HRS-300 |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 105È£
|
|
Àåºñ¸í |
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
COMPex Pro |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 206È£
|
|
Àåºñ¸í |
´ÙÀÌ¿Àµå ·¹ÀÌÀú Á¶Àý±â(Digital Controller for Diode Lasers) |
Á¦ÀÛ»ç |
Toptica Photonics |
¸ðµ¨¸í |
DLC pro |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 402È£
|
|
Àåºñ¸í |
ÆèÅäÃÊ ÆÞ½º ·¹ÀÌÀú ½Ã½ºÅÛ(Femtosecond Pulse Laser System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
Chameleon |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 502AÈ£
|
|
Àåºñ¸í |
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
COMPex Pro 199F |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 508È£
|
|
Àåºñ¸í |
´Ù¸ñÀû ¹Ú¸· Ç¥¸é±¸Á¶ ºÐ¼® ¿øÀÚ Çö¹Ì°æ Àåºñ(Muti-purpose Atomic Force Microscope (AFM) System) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
MultiMode 8 |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 529È£
|
|
Àåºñ¸í |
32ä³Î ³úÆÄ ÃøÁ¤ ½Ã½ºÅÛ(32-Channel Electroencephalogram (EEG) Measurement System) |
Á¦ÀÛ»ç |
LAXTHA |
¸ðµ¨¸í |
LXE3232-RF |
¼³Ä¡Àå¼Ò |
Á¦4°øÇаü 005È£
|
|
Àåºñ¸í |
¹«¼± ±ÙÀüµµ ½Ã½ºÅÛ(Electromyographic (EMG) and Sensor System) |
Á¦ÀÛ»ç |
NORAXON |
¸ðµ¨¸í |
TELEMYO 2400R G2 |
¼³Ä¡Àå¼Ò |
Á¦4°øÇаü 005È£
|
|
Àåºñ¸í |
¼ºÇü»çÃâ±â(Injection Machine) |
Á¦ÀÛ»ç |
Battenfeld Kunststoffmaschinen |
¸ðµ¨¸í |
Microsystem 50 |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 006È£
|
|
Àåºñ¸í |
¼ºÇü»çÃâ±â(Injection Machine) |
Á¦ÀÛ»ç |
SUMITOMO HEAVY INDUSTRIES, LTD |
¸ðµ¨¸í |
SE50D |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 006È£
|
|
Àåºñ¸í |
³ª³ë½Ã½º SPM Á¶Àý ½Ã½ºÅÛ(Nanonis Scanning Probe Microscopy (SPM) Control System) |
Á¦ÀÛ»ç |
SPECS |
¸ðµ¨¸í |
SPECS Nanonis Controller |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 008È£
|
|
Àåºñ¸í |
³ª³ë Ç¥¸é ÇÁ·ÎÆÄÀÏ·¯(Nano Surface Profiler) |
Á¦ÀÛ»ç |
³ª³ë½Ã½ºÅÛ¢ß |
¸ðµ¨¸í |
NanoScan-E1000(P) |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 206-1È£
|
|
Àåºñ¸í |
Àç·á½ÃÇè±â(Nano Testing System) |
Á¦ÀÛ»ç |
MTS |
¸ðµ¨¸í |
Nano UTM Testing System |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 206-1È£
|
|
Àåºñ¸í |
¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM)) |
Á¦ÀÛ»ç |
SEIKO INSTRUMENTS INC. |
¸ðµ¨¸í |
SPI3800N Pro |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 206-1È£
|
|
Àåºñ¸í |
ÆØÃ¢°è¼ö ÃøÁ¤±â(Dilatometer System) |
Á¦ÀÛ»ç |
ERICH NETZSCH GmbH & Co. Holdi |
¸ðµ¨¸í |
DIL 402C Dilatometer |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 206È£
|
|
Àåºñ¸í |
Á¡µµ°è(Modular Compact Rheometer) |
Á¦ÀÛ»ç |
Anton Paar Germany GmbH |
¸ðµ¨¸í |
MCR 101 |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 206È£
|
|
Àåºñ¸í |
¿Áß·®-½ÃÂ÷Áֻ翷®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC)) |
Á¦ÀÛ»ç |
Mettler Toledo |
¸ðµ¨¸í |
Mettler Toledo AG |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 206È£
|
|
Àåºñ¸í |
¸ð¼¼°üÇü°¡¿·Î(Capillary Furnace System) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
Rosand RH7 |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 206È£
|
|
Àåºñ¸í |
»ó¿Â¿È®»êµµÃøÁ¤Àåºñ(Flash Diffusivity Testing Apparatus) |
Á¦ÀÛ»ç |
ERICH NETZSCH GmbH & Co. Holdi |
¸ðµ¨¸í |
LFA 467 |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 304È£
|
|
Àåºñ¸í |
ÆèÅäÃÊ ·¹ÀÌÀú ½Ã½ºÅÛ(Femtosecond Laser System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
Libra |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 406È£
|
|
Àåºñ¸í |
ÆÄÀå °¡º¯Çü ³ª³ëÃÊ ·¹ÀÌÀú(Tunable Wavelength Nanosecond Lasers) |
Á¦ÀÛ»ç |
EKSPLA |
¸ðµ¨¸í |
NT352 |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 406È£
|
|
Àåºñ¸í |
·¹ÀÌÀú À¯µµºØ±« ºÐ±¤±â(Laser-induced Breakdown Spectroscopy (LIBS)) |
Á¦ÀÛ»ç |
Applied Spectra |
¸ðµ¨¸í |
Aurora LIBS module |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 423È£
|
|
Àåºñ¸í |
µ¿Àû±¤»ê¶õ ºÐ±¤±â(Dynamic Light Scattering Spectroscopy) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
Nano ZS90 |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 423È£
|
|
Àåºñ¸í |
»çÁß±ØÀÚ Áú·®ºÐ¼®±â(Quadrupole Mass Spectrometer) |
Á¦ÀÛ»ç |
HIDEN ANALYTICAL |
¸ðµ¨¸í |
HPR-20 |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 226È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
(ÁÖ)¼¼´ÏÁ¨ |
¸ðµ¨¸í |
Dionex Aquion IC system |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 228È£
|
|
Àåºñ¸í |
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM)) |
Á¦ÀÛ»ç |
Bio-logic SAS |
¸ðµ¨¸í |
M470 |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 228È£
|
|
Àåºñ¸í |
Ç¥¸éÈûÃøÁ¤±â(Surface Force Apparatus (SFA)) |
Á¦ÀÛ»ç |
SurForce LLC |
¸ðµ¨¸í |
SFA 2000 |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 230È£
|
|
Àåºñ¸í |
Ç¥¸éÈûÃøÁ¤±â(Surface Force Apparatus (SFA)) |
Á¦ÀÛ»ç |
SurForce LLC |
¸ðµ¨¸í |
SFA 2000 |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 230È£
|
|
Àåºñ¸í |
¼±Çü À̿ Ʈ·¦ Áú·®ºÐ¼®±â(Linear Ion Trap Mass Spectrometry) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
VELOS PRO |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 232È£
|
|
Àåºñ¸í |
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JSM-6010LV |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 232È£
|
|
Àåºñ¸í |
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System) |
Á¦ÀÛ»ç |
Dynamic Systems |
¸ðµ¨¸í |
GLEEBLE 3500 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 142-4È£
|
|
Àåºñ¸í |
´ëÇüÀý´Ü±â(Large Automatic Cut-off Machine) |
Á¦ÀÛ»ç |
Struers |
¸ðµ¨¸í |
Axitom-5 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 146-8È£
|
|
Àåºñ¸í |
¿¬¸¶±â(Grinding/Polishing Machine) |
Á¦ÀÛ»ç |
Struers |
¸ðµ¨¸í |
Abrapol-20 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 146-8È£
|
|
Àåºñ¸í |
Áý¼Ó À̿ºö(3Â÷¿ø-EBSD)(Focused Ion Beam (FIB; 3D-EBSD)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Quanta 3D FEG |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 150-2È£
|
|
Àåºñ¸í |
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
Ultra-55 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 154-6È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JSM-7100F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 154-6È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2100F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 161È£
|
|
Àåºñ¸í |
¸ÖƼ ½ºÄÉÀÏ ¹Ì¼¼±¸Á¶ ºÐ¼® ½Ã½ºÅÛ(Multi-scale Microstructure Analysis System) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
Neo-ARM |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 161È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JXA-8530F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 163È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-7900F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 163È£
|
|
Àåºñ¸í |
¹ß±¤ºÐ±¤ºÐ¼®±â(Optical Emission Spectrometer) |
Á¦ÀÛ»ç |
OBLF gmbh |
¸ðµ¨¸í |
OBLF QSN 750 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 171-3È£
|
|
Àåºñ¸í |
X-¼± Çü±¤ºÐ¼®±â(X-ray Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
S4 Pioneer |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 175-7È£
|
|
Àåºñ¸í |
X-¼± Çü±¤ºÐ¼®±â(X-ray Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
S8 Tiger |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 175-7È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP 6500 DUO |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 176È£
|
|
Àåºñ¸í |
¿Áß·®/¿·® µ¿½Ã ºÐ¼®±â(Thermal Analyzer System) |
Á¦ÀÛ»ç |
netzsch geraetebau gmbh |
¸ðµ¨¸í |
STA 449C |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 178-9È£
|
|
Àåºñ¸í |
ź¼Ò/Ȳ ºÐ¼® Àåºñ(Carbon/sulfur Analyzer) |
Á¦ÀÛ»ç |
LECO |
¸ðµ¨¸í |
CS 844 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 178-9È£
|
|
Àåºñ¸í |
Áú¼Ò/»ê¼Ò µ¿½Ã ºÐ¼®±â(Oxygen/nitrogen Analyzer) |
Á¦ÀÛ»ç |
LECO |
¸ðµ¨¸í |
ON 836 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 178-9È£
|
|
Àåºñ¸í |
Àü±â·Î ÀÚµ¿ ¿ëÇØ Àåºñ(Bead Sampler) |
Á¦ÀÛ»ç |
±Û·Î¹ú·¦½º |
¸ðµ¨¸í |
X-600 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 178È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Advance |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 180-2È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Advance - A25 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 180-2È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Advance |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 180-8È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Discover |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 184-8È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÇ(Gas Chromatograph (GC)) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890A |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 231È£
|
|
Àåºñ¸í |
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System) |
Á¦ÀÛ»ç |
Dynamic Systems |
¸ðµ¨¸í |
GLEEBLE 3500 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 242-4È£
|
|
Àåºñ¸í |
ÆØÃ¢°è¼ö ÃøÁ¤±â(Dilatometer System) |
Á¦ÀÛ»ç |
bahr-thermoanalyse gmbh |
¸ðµ¨¸í |
DIL805A/D |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 242-4È£
|
|
Àåºñ¸í |
Ç¥¸é󸮽ýºÅÛ(Target Surfacing System) |
Á¦ÀÛ»ç |
Leica Microsystems |
¸ðµ¨¸í |
EM TXP |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 250È£
|
|
Àåºñ¸í |
Áø°øÁÖÁ¶±â(Vacuum Casting Machine) |
Á¦ÀÛ»ç |
¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ |
¸ðµ¨¸í |
MC100V |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 272È£
|
|
Àåºñ¸í |
Áø°ø-°¡¾Ð ¿ëÇØ ¹× ¿¬¼ÓÁÖÁ¶ÀåÄ¡(Vacuum-over Pressure Continuous Casting Machine) |
Á¦ÀÛ»ç |
¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ |
¸ðµ¨¸í |
VCC 1000 (indutherm) |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 272È£
|
|
Àåºñ¸í |
³ª³ë Àε§ÅÍ(Nano Indenter) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
Nano Indenter G200 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 284È£
|
|
Àåºñ¸í |
TEM¿ë À̿¹иµ½Ã½ºÅÛ(Ion Milling System for Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
¢ßÁö¿¤ÄÚÆÛ·¹ÀÌ¼Ç |
¸ðµ¨¸í |
Gatan model 691 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 284È£
|
|
Àåºñ¸í |
Àç·á½ÃÇè±â(Advanced Indentation System) |
Á¦ÀÛ»ç |
(ÁÖ)ÇÁ·Ðƽ½º |
¸ðµ¨¸í |
AIS2000 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 312-4È£
|
|
Àåºñ¸í |
±Ý¼Ó ÆÇÀç ÀÎÀå¾ÐÃà½ÃÇè±â(Sheet Metal Deformation Simulator) |
Á¦ÀÛ»ç |
¢ß¾Ë¾Øºñ |
¸ðµ¨¸í |
RB319 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 312-4È£
|
|
Àåºñ¸í |
¹ü¿ë ½ÃÇè±â(Universal Sheet Metal Testing Machine) |
Á¦ÀÛ»ç |
ERICHSEN |
¸ðµ¨¸í |
145-60 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 331-3È£
|
|
Àåºñ¸í |
°í¼ÓÀÎÀåÃæ°Ý½ÃÇè±â(High Strain Tensile Impact Tester) |
Á¦ÀÛ»ç |
´ëµ¿Á¤¹Ð |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 331-3È£
|
|
Àåºñ¸í |
±ÝÇüÅ×½ºÅͱâ(U Draw Test Mold for Servo Press) |
Á¦ÀÛ»ç |
R&B |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 331-3È£
|
|
Àåºñ¸í |
ö¼ÕÃøÁ¤ÀåÄ¡(Electrical Steel Tester) |
Á¦ÀÛ»ç |
Dr. brockhaus messtechnik gmbh |
¸ðµ¨¸í |
MPG 100 D measuring Unit |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
¿¿ªÇнùķ¹ÀÌÅÍ(Caster&Thermo-mechanical Simulator) |
Á¦ÀÛ»ç |
Fuji electronic Industrial |
¸ðµ¨¸í |
FTX-103HC-01 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
±¤ ÀÚ±â Ä¿ Çö¹Ì°æ(Magneto-Optical Kerr-Microscope) |
Á¦ÀÛ»ç |
Evico magnetics GmbH |
¸ðµ¨¸í |
Axio Imager D1m |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
¾ÆÅ©¿ëÇØ·Î(Arc Melting Furnace) |
Á¦ÀÛ»ç |
¾ÆÀ̾¾Æ¼ |
¸ðµ¨¸í |
KHAM-500 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
Áø°ø ¿ëÇØÀåÄ¡(Vaccum Chamber) |
Á¦ÀÛ»ç |
¿¡À̽ºÀ̾ؾ¾ ÁÖ½Äȸ»ç |
¸ðµ¨¸í |
Ace-VIM-001 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
½ºÆÛÅÍ / Áø°øÁõÂø ÀåÄ¡(Sputtering / Vacuum Deposition System) |
Á¦ÀÛ»ç |
¾ÆÀ̾¾Æ¼ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
°í¿Â¿Ã³¸® Àü±â·Î(Tube Furnace) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
Lenton 1500 PTF-15/100/610 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 380È£
|
|
Àåºñ¸í |
°íÁø°ø·Î(High Vacuum Furnace) |
Á¦ÀÛ»ç |
¿¡ÀÌÆ¼¿¡ÇÁ(ATF) |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 380È£
|
|
Àåºñ¸í |
°í¼Ó°¡¿·Î(High Temperature Rate Furnace) |
Á¦ÀÛ»ç |
¾ÆÀ̾¾Æ¼ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 380È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
Miniflex ¥± |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 380È£
|
|
Àåºñ¸í |
±Ý¼Ó Żź ¿Ã³¸® ½Ã½ºÅÛ(Tube Type Furnace System) |
Á¦ÀÛ»ç |
¢ßº£½º |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 380È£
|
|
Àåºñ¸í |
Áø°ø/ºÐÀ§±â ¿Ã³¸® ÀåÄ¡(Vacuum Chamber) |
Á¦ÀÛ»ç |
¢ßÁö´Ï¾ÆÅØ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 380È£
|
|
Àåºñ¸í |
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System) |
Á¦ÀÛ»ç |
INSTRON |
¸ðµ¨¸í |
INSTRON 8801 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 416-8È£
|
|
Àåºñ¸í |
ÇǷνÃÇè±â(Fatigue Testing Machine) |
Á¦ÀÛ»ç |
INSTRON |
¸ðµ¨¸í |
INSTRON 8801 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 416-8È£
|
|
Àåºñ¸í |
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System) |
Á¦ÀÛ»ç |
INSTRON |
¸ðµ¨¸í |
INSTRON 8801 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 416È£
|
|
Àåºñ¸í |
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System) |
Á¦ÀÛ»ç |
INSTRON |
¸ðµ¨¸í |
INSTRON 8501 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 431-3È£
|
|
Àåºñ¸í |
Àç·á½ÃÇè±â(Material Testing Machine) |
Á¦ÀÛ»ç |
INSTRON |
¸ðµ¨¸í |
INSTRON 8862 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 431-3È£
|
|
Àåºñ¸í |
¹ü¿ë Àç·á ½ÃÇè±â(Universal Testing System) |
Á¦ÀÛ»ç |
INSTRON |
¸ðµ¨¸í |
INSTRON 3382 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 431-3È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÇ(Gas Chromatograph (GC)) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890A |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 435-7È£
|
|
Àåºñ¸í |
¼ö¼Ò·® ºÐ¼® ½Ã½ºÅÛ(Total Dissolved Solids (TDS) System for Hydrogen Analysis) |
Á¦ÀÛ»ç |
R-Dec |
¸ðµ¨¸í |
HTDS-003 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 435-7È£
|
|
Àåºñ¸í |
¼ö¿ÇÕ¼ºÀåºñ(500 mL Stirred Autoclave System) |
Á¦ÀÛ»ç |
¢ßÀϽſÀÅäŬ·¹À̺ê |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 472È£
|
|
Àåºñ¸í |
µ¿Àû±¤»ê¶õ ºÐ±¤±â(Dynamic Light Scattering Spectroscopy) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
Nano ZS |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 476È£
|
|
Àåºñ¸í |
SOFC ´ÜÀüÁö Àå±â¼º´É Æò°¡ÀåÄ¡(Solid Oxide Fuel Cell (SOFC) Test Station) |
Á¦ÀÛ»ç |
³ª¶ó¼¿ÅØ(ÁÖ) |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
3D Àç·á ºÐ¼®(3D Materials Analysis) |
Á¦ÀÛ»ç |
UES, INC |
¸ðµ¨¸í |
Robo-Met. 3D Version 2 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
°í¼ÓÁÖÁ¶ ÁÖÆí ³Ã°¢ ¹× ÀÀ°í simulator(Simulator for Solidification and Cooling of a Slab during High Speed Continuous Casting) |
Á¦ÀÛ»ç |
¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
°í¿Â½ÃÂ÷Áֻ翷®°è(High Temperature Differential Scanning Calorimeter) |
Á¦ÀÛ»ç |
¢ß½ÅÄÚ¿¥¾ØÆ¼ |
¸ðµ¨¸í |
Labsys Evo DSC |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
IET ¸ôµåÇ÷°½º ½Ã·á Á¦Á¶ ÀåÄ¡(High Frequency Induction Furnacer) |
Á¦ÀÛ»ç |
¿¤ÅØ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
½½·¡±×¿ëÇØ ¹× ³Ã°¢ÀåÄ¡(Slag Dissolution and Cooling System) |
Á¦ÀÛ»ç |
¸°Å×Å© |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
¿Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA)) |
Á¦ÀÛ»ç |
RUBOTHERM |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
°¡½ººÐ¼®¿ë Áú·®ºÐ¼®±â(Residual Gas Analyser) |
Á¦ÀÛ»ç |
ÅäÅ»¼Ö·ç¼Ç°úÇÐ |
¸ðµ¨¸í |
BGM-201R |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
MASTERSIZER 2000 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
°øÃÊÁ¡ ·¹ÀÌÀú ÁÖ»ç Çö¹Ì°æ(Confocal Laser Scanning Microscope) |
Á¦ÀÛ»ç |
Lasertec Corporation |
¸ðµ¨¸í |
VL2000DX |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
°í¿Â°¡¿·Î(Image Furnace System) |
Á¦ÀÛ»ç |
ULVAC |
¸ðµ¨¸í |
MR-39H/D |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
¾ÐÃà ¹× ÀÎÀå½ÃÇè±â(Tensile Compress Test Machine) |
Á¦ÀÛ»ç |
INSTRON |
¸ðµ¨¸í |
INSTRON 5848 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
¿Áß·®ºÐ¼®±â(Thermogravimetric Analyzer) |
Á¦ÀÛ»ç |
RUBOTHERM |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
¿Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA)) |
Á¦ÀÛ»ç |
RUBOTHERM |
¸ðµ¨¸í |
High Pressure TGA |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
À̵¿½Ä Áú·® ºÐ¼®±â(Mobile Bench-top Mass Spectrometer) |
Á¦ÀÛ»ç |
InProcess Instruments GmbH |
¸ðµ¨¸í |
GAM 400 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
¿Áß·®-½ÃÂ÷Áֻ翷®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC)) |
Á¦ÀÛ»ç |
Mettler Toledo |
¸ðµ¨¸í |
TGA/DSC1 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
µµ°¡´Ï ºÎÇÏ ½Ã½ºÅÛ(1600 ¡ÆC Furnace Crucible Leading System) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
LTF-16/75/610 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
°í¿Â¼öÆò ¿Áß·® ºÐ¼®±â(Thermo Gravimetric Analyzer) |
Á¦ÀÛ»ç |
ÅäÅ»¼Ö·ç¼Ç°úÇÐ |
¸ðµ¨¸í |
TSS2016-T1 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
±Þ¼Ó°¡¿ÀåÄ¡(Infrared Gold Image Furnace) |
Á¦ÀÛ»ç |
ÅäÅ»¼Ö·ç¼Ç°úÇÐ |
¸ðµ¨¸í |
VHT-E44 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
¿ëÀ¶Á¡/Á¢Ã˰¢ ½Ã½ºÅÛ(Heating Microscope) |
Á¦ÀÛ»ç |
export system solutions s.r.i |
¸ðµ¨¸í |
misura hsm |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 572È£
|
|
Àåºñ¸í |
À̹ÌÁö½Ã½ºÅÛ(Imaging System) |
Á¦ÀÛ»ç |
Dantec Dynamics A/S |
¸ðµ¨¸í |
Advanced Imaging System |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 572È£
|
|
Àåºñ¸í |
Àú¿ÂȸȷÎ(Low Temperature Furnace) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
LTF-175/80/350 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 576È£
|
|
Àåºñ¸í |
°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(High Frequency Induction Heater) |
Á¦ÀÛ»ç |
¿¤ÅØ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 580È£
|
|
Àåºñ¸í |
¼öÁ÷ȸȷÎ(Vertical Furnace) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
LTF 17/75/30 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 584È£
|
|
Àåºñ¸í |
Àú¿ÂȸȷÎ(Low Temperature Furnace) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
LTF-17/75/300 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 584È£
|
|
Àåºñ¸í |
°í¿Â ¼öÁ÷ Àü±â·Î(Vertical Tube Furnace) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
Lenton LTF-175/80/350 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 584È£
|
|
Àåºñ¸í |
°í¿Â ¼öÁ÷ Àü±â·Î(Vertical Tube Furnace) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
Lenton LTF-175/80/350 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 584È£
|
|
Àåºñ¸í |
¿ëÇØ¿ë À¯µµ°¡¿ ÀåÄ¡(Induction Heating System for Melting) |
Á¦ÀÛ»ç |
PSTEK |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 584È£
|
|
Àåºñ¸í |
Å©¸®ÇÁ ½ÃÇè±â(Lever Arm Type Creep Tester System) |
Á¦ÀÛ»ç |
ats technology, Inc |
¸ðµ¨¸í |
Series 2320 Lever Arm Tester |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø B106È£
|
|
Àåºñ¸í |
Àç·á½ÃÇè±â(Universal Materials Testing Machine) |
Á¦ÀÛ»ç |
zwick gmbh & co. kg |
¸ðµ¨¸í |
ZWICK 100KN |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
Ãæ°Ý½ÃÇè±â(Charpy Impact Tester) |
Á¦ÀÛ»ç |
zwick gmbh & co. kg |
¸ðµ¨¸í |
PSW 750 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
¿ø½ÉÁÖÁ¶±â(Sample Preparation Equipment) |
Á¦ÀÛ»ç |
linn high term gmbh |
¸ðµ¨¸í |
Lifumat-M-2000-7.7-VAC |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
ÇǷνÃÇè±â(Fatigue Testing Machine) |
Á¦ÀÛ»ç |
INSTRON |
¸ðµ¨¸í |
MicroTester5848 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
¾ÐÃà ¹× ÀÎÀå½ÃÇè±â(Tensile Compress Test Machine) |
Á¦ÀÛ»ç |
INSTRON |
¸ðµ¨¸í |
INSTRON 4482 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
¿°¿å·Î(Furnace Salt Bath) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
LSBF-10/45 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
ÀÌ¼Ó ¾Ð¿¬Àåºñ(Differential Speed Rolling Machine) |
Á¦ÀÛ»ç |
¢ß¸ðÀνýº |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(Vacuum Induction Melting and Casting Furnace) |
Á¦ÀÛ»ç |
ALD Vacuum Technologies |
¸ðµ¨¸í |
VIM4 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
Áø°øºÐ±¤°è(Fourier Transform Infrared) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
VERTEX 80v with HYPERION 2000 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
¼ÒÇü ¾Ð¿¬½ÇÇè±â(Small Scale Calliber Rolling Machine) |
Á¦ÀÛ»ç |
ÇØÁø»ê¾÷±â¼ú |
¸ðµ¨¸í |
caliber rolling machine |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
ÀÌÃàÀÎÀå ½ÃÇè±â(Biaxial Tensile Testing machine) |
Á¦ÀÛ»ç |
Kokusai Co. Ltd |
¸ðµ¨¸í |
KBAT-100 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
50Åæ ÇÁ·¹½º(Direct Drive Digital Servo-Press) |
Á¦ÀÛ»ç |
Hoden seimitsu kako kenkyusho |
¸ðµ¨¸í |
MPS8300DS |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
ºñÇ¥¸éÀû ºÐ¼®±â(Automated Surface Area&Pore Size Analyzer) |
Á¦ÀÛ»ç |
Chunwoo America, Inc |
¸ðµ¨¸í |
NOVA 1000e |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
¼öÀº ±â°ø·ü ÃøÁ¤ÀåÄ¡(Automated Mercury Porosimeter) |
Á¦ÀÛ»ç |
Chunwoo America, Inc |
¸ðµ¨¸í |
PM-33-15 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
½Ç½Ã°£ X-¼± °Ë»ç±â(Realtime X-ray Inspection System) |
Á¦ÀÛ»ç |
¢ßÀÚºñ½º |
¸ðµ¨¸í |
X-Scan 7950 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
º¥µù ±â°è(Bending Machine) |
Á¦ÀÛ»ç |
¢ß·ºÅͽ¼ |
¸ðµ¨¸í |
UTM-B10T |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
1400 ¡ÆC ¼öÁ÷ Æ©ºê ¿Ã³¸® Àåºñ(1400 ¡ÆC Tube furnace) |
Á¦ÀÛ»ç |
Lenton |
¸ðµ¨¸í |
LTF-14/75/610 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
Carbon Steel ¹ÚÆÇ¿ë ¾Ð¿¬±â Á¦ÀÛ(Carbon Steel Sheet Mill) |
Á¦ÀÛ»ç |
PTW sreel solution |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
µî¿Â¹Ì¼¼¿·®°è(IMC (Isothermal Microcalorimetry)) |
Á¦ÀÛ»ç |
TA Instruments Korea Unit of waters korea, Ltd |
¸ðµ¨¸í |
TAM IV XL |
¼³Ä¡Àå¼Ò |
ģȯ°æ¼ÒÀç´ëÇпø 184, 186È£
|
|
Àåºñ¸í |
°¡¼ÓÀ²¿·®°è(ARC (Accelerating Rate Calorimeter)) |
Á¦ÀÛ»ç |
Thermal Hazard Technology (THT) |
¸ðµ¨¸í |
ES-ARC_ ARCSYS-001, ARCSYS-SBK |
¼³Ä¡Àå¼Ò |
ģȯ°æ¼ÒÀç´ëÇпø 184, 186È£
|
|
Àåºñ¸í |
¿ Áß·® ºÐ¼®±â+½ÃÂ÷ ÁÖ»ç ¿·®°è-Áú·® ºÐ¼®±â(TGA-DSC-MS SDT(Simultaneous DSC/TGA)-MS) |
Á¦ÀÛ»ç |
TA Instruments Korea |
¸ðµ¨¸í |
Discovery SDT 650 – Simultaneous DSC-TGA, Pfeiffer ThermoStar Quadrupole Mass Spectrometer |
¼³Ä¡Àå¼Ò |
ģȯ°æ¼ÒÀç´ëÇпø 184, 186È£
|
|
Àåºñ¸í |
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System) |
Á¦ÀÛ»ç |
(ÁÖ)¿ïÅØ |
¸ðµ¨¸í |
URS-100 |
¼³Ä¡Àå¼Ò |
Æ÷Ç×°¡¼Ó±â¿¬±¸¼Ò ÀúÀ帵µ¿ 118È£
|
|
Àåºñ¸í |
³Ãµ¿ÀýÆí±â(Cryostat Microtome) |
Á¦ÀÛ»ç |
Leica |
¸ðµ¨¸í |
CM3050S |
¼³Ä¡Àå¼Ò |
Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
|
|
Àåºñ¸í |
ÀüÀÚµ¿ÇÙ»êÃßÃâÀåÄ¡(Automated DNA/RNA Extractor) |
Á¦ÀÛ»ç |
QIAGEN |
¸ðµ¨¸í |
QIAcube-HT |
¼³Ä¡Àå¼Ò |
Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
|
|
Àåºñ¸í |
¸¶ÀÌÅ©·Î¹°¼º½ÃÇè±â(Micro-scale mechanical test system) |
Á¦ÀÛ»ç |
CellScale |
¸ðµ¨¸í |
MicrotesterG2 |
¼³Ä¡Àå¼Ò |
Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
|
|
Àåºñ¸í |
½Ç½Ã°£À¯ÀüÀÚÁõÆø±â PCR(Real-time PCR) |
Á¦ÀÛ»ç |
Thermo Fisher Scientific |
¸ðµ¨¸í |
QuantStudio5 |
¼³Ä¡Àå¼Ò |
Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
|
|
Àåºñ¸í |
ÀÚµ¿½½¶óÀ̵彺ij³Ê(Auto slide scanner) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
AxioScan 7 |
¼³Ä¡Àå¼Ò |
Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
|
|
Àåºñ¸í |
3D ¹ÙÀÌ¿ÀÇÁ¸°ÅÍ(Extrusion-based 3D Bioprinter) |
Á¦ÀÛ»ç |
CELLINK |
¸ðµ¨¸í |
BIO X |
¼³Ä¡Àå¼Ò |
Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
|
|
Àåºñ¸í |
ȸ·ù¼öÁ¶(Circulating Water Channel) |
Á¦ÀÛ»ç |
¼ÀϺ»À¯Ã¼±â¼ú¿¬±¸¼Ò |
¸ðµ¨¸í |
V2-30B |
¼³Ä¡Àå¼Ò |
dzµ¿µ¿ 107È£
|
|
Àåºñ¸í |
½ºÆÃ ¹ë·±½º(Sting Balance) |
Á¦ÀÛ»ç |
AEROLAB |
¸ðµ¨¸í |
1/2 A |
¼³Ä¡Àå¼Ò |
dzµ¿µ¿ 107È£
|
|
Àåºñ¸í |
Slit jet ³Ã°¢Çì´õ ¸ðÇü ¹× ºÎ°¡ÀåÄ¡(Slit Jet Cooling Header Model) |
Á¦ÀÛ»ç |
Å¿µ»ê¾÷ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
dzµ¿µ¿ 107È£
|
|
Àåºñ¸í |
X-ray ÃøÁ¤½Ã½ºÅÛ(X-ray Measurement System) |
Á¦ÀÛ»ç |
¸ðµÎÅ×Å©³î·¯Áö, ¿ìÁ¤ÀÇ·á±â±â |
¸ðµ¨¸í |
Varian A272 |
¼³Ä¡Àå¼Ò |
dzµ¿µ¿ 108È£
|
|
Àåºñ¸í |
Àü±âÈÇÐ ºÐ¼®±â(Electrochemical Analyzer System) |
Á¦ÀÛ»ç |
Advanced Measurement Technology |
¸ðµ¨¸í |
2101A |
¼³Ä¡Àå¼Ò |
Çѱ¹·Îº¿À¶ÇÕ¿¬±¸¿ø 313È£
|
|
Àåºñ¸í |
Àü±âºÐ¹« ÀÌ¿ÂÀ̵¿µµ ºÐ¼® - Áú·® ºÐ¼®±â(Electrospray ionization Ion mobility - Mass spectrometry) |
Á¦ÀÛ»ç |
AGILENT |
¸ðµ¨¸í |
Agilent 6560 |
¼³Ä¡Àå¼Ò |
ÈÇаü 112È£
|
|
Àåºñ¸í |
¸ÅÆ®¸¯½º º¸Á¶ ·¹ÀÌÀú Å»Âø ÀÌ¿ÂÈ Áú·®ºÐ¼®±â(Matrix Assisted Laser Desorption/Ionization Time-of-Flight (MALDI-TOF) Mass Spectrometer) |
Á¦ÀÛ»ç |
BRUKER |
¸ðµ¨¸í |
Autoflex Speed LRF |
¼³Ä¡Àå¼Ò |
ÈÇаü 112È£
|
|
Àåºñ¸í |
°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¼±Çü À̿ Ʈ·¦ Áú·® ºÐ¼®±â(HPLC dual-cell linear ion trap mass spectrometer (HPLC-ESI-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
LTQ Velos Pro |
¼³Ä¡Àå¼Ò |
ÈÇаü 112È£
|
|
Àåºñ¸í |
¿¡¾îµå¶óÀ̾î(Air Dryer) |
Á¦ÀÛ»ç |
|
¸ðµ¨¸í |
K-MT4 |
¼³Ä¡Àå¼Ò |
ÈÇаü 122È£
|
|
Àåºñ¸í |
300 MHz ÇÙÀÚ±â°ø¸íºÐ±¤ºÐ¼®±â(300 MHz Nuclear Magnetic Resonance (NMR) Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
AVANCE III 300 |
¼³Ä¡Àå¼Ò |
ÈÇаü 122È£
|
|
Àåºñ¸í |
600 MHz ÇÙÀÚ±â°ø¸íºÐ±¤ºÐ¼®±â(600 MHz Nuclear Magnetic Resonance (NMR) Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
AVANCE III 600 |
¼³Ä¡Àå¼Ò |
ÈÇаü 122È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
-/5975C |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 103/104È£
|
|
Àåºñ¸í |
´ÙÁß°ËÃâ À¯µµ°áÇÕÇöóÁ Áú·®ºÐ¼®±â(Multi-Collector Inductively Coupled Plasma Mass Spectrometer (MC-ICP-MS)) |
Á¦ÀÛ»ç |
Nu Instruments Ltd |
¸ðµ¨¸í |
Plasma 3 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 105È£
|
|
Àåºñ¸í |
Áú·®ºÐ¼®±â(Mass Spectrometer) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JMS-800D |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 106È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP 7400 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 106È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
PANalytical B.V. |
¸ðµ¨¸í |
X¢¥Pert PRO MPO |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 109È£
|
|
Àåºñ¸í |
ÈÇÐÈíÂø·®ºÐ¼®±â(Chemisorption Analyzer) |
Á¦ÀÛ»ç |
micromeritics |
¸ðµ¨¸í |
Autochem II 2920 chemisorption analyzer |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 110È£
|
|
Àåºñ¸í |
³ª³ë¼¼°ø Ư¼º ¹× BET Ç¥¸éÀû ÃøÁ¤Àåºñ(Nanoporosity & Surface Area Analyzer) |
Á¦ÀÛ»ç |
(ÁÖ)¹Ì·¡¿¡½º¾ÆÀÌ |
¸ðµ¨¸í |
nanoPOROSITY (BET) |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 110È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÇ(Gas Chromatograph (GC)) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890A |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 110È£
|
|
Àåºñ¸í |
°í¾Ð¿ë ºÎÇÇ½Ä ÈíÂøÀåºñ ¼ö¼Ò¿¡³ÊÁö ÀúÀå·® ÃøÁ¤ ÀÚµ¿È Àåºñ(Volumetric Sorption Measurement System) |
Á¦ÀÛ»ç |
Setaram |
¸ðµ¨¸í |
PCT Pro |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 110È£
|
|
Àåºñ¸í |
¿°±â¼¿ºÐ¼®±â(Ion Personal Genome Machine) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Ion Personal Genome Machine (PGM) System |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 206-1È£
|
|
Àåºñ¸í |
¾ÈÁ¤ µ¿À§¿ø¼Ò ºñÀ² Áú·® ºÐ¼®±â(Stable Isotope Ratio Mass Spectrometer) |
Á¦ÀÛ»ç |
Isoprime |
¸ðµ¨¸í |
IsoPrime 100 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 206-2È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÇ(Gas Chromatograph (GC)) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890A |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 206-2È£
|
|
Àåºñ¸í |
¹Ì·® Ȳ °ËÃâ±â(Trace Sulfur Analyzer) |
Á¦ÀÛ»ç |
Mitsubishi Chemical Analytech |
¸ðµ¨¸í |
NSX-2100V |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 206-2È£
|
|
Àåºñ¸í |
¿ø¼ÒºÐ¼®±â(Elemental Analyzer (EA)) |
Á¦ÀÛ»ç |
Elementar |
¸ðµ¨¸í |
Vario MICRO cube |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 206-2È£
|
|
Àåºñ¸í |
¿ø¼ÒºÐ¼®±â(Elemental Analyzer (EA)) |
Á¦ÀÛ»ç |
Elementar |
¸ðµ¨¸í |
Vario MICRO |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 206-2È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890B/- |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 207È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÇ(Gas Chromatograph (GC)) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
6890A |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 217È£
|
|
Àåºñ¸í |
¾ÆÅ© Á¦³í ·¥ÇÁ(Xenon Arc Lamp Solar Simulator) |
Á¦ÀÛ»ç |
¿¡ÀÌÄ¡¿¡½ºÅ×Å©³î·¯Áö |
¸ðµ¨¸í |
Oriel |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 224È£
|
|
Àåºñ¸í |
±â»ó¹°Áú ³óµµÃøÁ¤ºÐ¼®±â(Photoacoustic Multi Gas Monitor) |
Á¦ÀÛ»ç |
½Ã¿¥½Ã¿£Áö´Ï¾î¸µ |
¸ðµ¨¸í |
INNOVA 1412i |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 224È£
|
|
Àåºñ¸í |
Áú¼Ò ¹× ´Ü¹éÁú ºÐ¼®ÀåÄ¡(Automatic Nitrogen and Protein Analyzer) |
Á¦ÀÛ»ç |
Foss |
¸ðµ¨¸í |
Kjeltec 2300 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 230È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Metrohm |
¸ðµ¨¸í |
790 Personal IC |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 230È£
|
|
Àåºñ¸í |
°í¼º´É ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ(High Performance Liquid Chromatograph (HPLC)) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
1260 Infinity |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 302È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Dionex |
¸ðµ¨¸í |
ICS-2100 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 302È£
|
|
Àåºñ¸í |
±âÆÇ ±â¹Ý ¹°Áú Á¦ÀÛ¿ë ¾Æ³ë´ÙÀÌÁî(Anodizer for AAO) |
Á¦ÀÛ»ç |
TERALEADER |
¸ðµ¨¸í |
TAD-001-2CH |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 302È£
|
|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Nicolet iS50 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 302È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÇ(Gas Chromatograph (GC)) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Clarus 680 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 305È£
|
|
Àåºñ¸í |
¹«±âź¼ÒºÐ¼®±â(Total Inorganic Carbon Analyzer) |
Á¦ÀÛ»ç |
UIC INC. |
¸ðµ¨¸í |
CM5017 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 312È£
|
|
Àåºñ¸í |
Áß°£¹°Áú ÈÇÐÁ¾ ºÐ¼®±â(Reactive Intermediate Species Analyzer) |
Á¦ÀÛ»ç |
Global Fia |
¸ðµ¨¸í |
PC-25232/Flame-T/NEOFOX-KIT-PATCH |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 312È£
|
|
Àåºñ¸í |
¹ÙÀÌ¿ÀºÐ¼®±â(Bioanalyzer) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
2100 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 317È£
|
|
Àåºñ¸í |
¸ÅÆ®¸¯½º º¸Á¶ ·¹ÀÌÀú Å»Âø ÀÌ¿ÂÈ Áú·®ºÐ¼®±â(Matrix Assisted Laser Desorption/Ionization Time-of-Flight (MALDI-TOF) Mass Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
Autoflex Max LRF |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 320È£
|
|
Àåºñ¸í |
Ź»óÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Mini Scanning Electron Microscope (SEM)) |
Á¦ÀÛ»ç |
SEC |
¸ðµ¨¸í |
SNE4500M |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 322È£
|
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Àåºñ¸í |
¿Áß·®-½ÃÂ÷Áֻ翷®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC)) |
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TA Instruments |
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SDT Q600 |
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ȯ°æ°øÇе¿ 322È£
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Àåºñ¸í |
¸¶ÀÌÅ©·ÎÇ÷¹ÀÌÆ® ¸®´õ(Multi-detection Microplate Reader) |
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Hidex Oy |
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Hidex Sense |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 327È£
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Àåºñ¸í |
°í¼Ó ¿ø½ÉºÐ¸®±â(High Speed Centrifugal Separator) |
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GOSGO |
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GK-8 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 331È£
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|
Àåºñ¸í |
°í¼Ó ´Ü¹éÁú ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ (FPLC)(Fast Protein Liquid Chromatography (FPLC)) |
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GE Healthcare |
¸ðµ¨¸í |
AKTA FPLC |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 331È£
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|
Àåºñ¸í |
°í¼Ó ´Ü¹éÁú ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ (FPLC)(Fast Protein Liquid Chromatography (FPLC)) |
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GE Healthcare |
¸ðµ¨¸í |
AKTApilot |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 331È£
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Àåºñ¸í |
TFF ½Ã½ºÅÛ(Tangential Flow Filtration (TFF) System) |
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MERCK |
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Cogent M1 TFF System |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 331È£
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Àåºñ¸í |
ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System) |
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Thermo Scientific |
¸ðµ¨¸í |
Dionex ICS-5000 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 331È£
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Àåºñ¸í |
Çü±¤ ±Ý¼Ó Çö¹Ì°æ(Fluorescence Metallurgical Microscope) |
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OLYMPUS |
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BX60 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 333È£
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Àåºñ¸í |
°øÃÊÁ¡ ·¹ÀÌÀú ÁÖ»ç Çö¹Ì°æ(Confocal Laser Scanning Microscope) |
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OLYMPUS |
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FV3000 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 333È£
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Àåºñ¸í |
¾Æ¹Ì³ë»ê Á¶¼ººÐ¼®±â(Auto Amino Acid Analyzer) |
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¾ÆÁÖ°úÇÐ |
¸ðµ¨¸í |
Automatic amino acid analyzer S433 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 334È£
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Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
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PerkinElmer |
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Spectrum Two |
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ȯ°æ°øÇе¿ 403È£
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Àåºñ¸í |
Ź»óÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Mini Scanning Electron Microscope (SEM)) |
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SEC |
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SNE4000M |
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ȯ°æ°øÇе¿ 410È£
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Àåºñ¸í |
Àڿܼ± ÆòÇ౤ Á¶»ç ½Ã½ºÅÛ(Mask Aligner and Exposure System) |
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PROWIN |
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M150P |
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ȯ°æ°øÇе¿ 410È£
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Àåºñ¸í |
ÀÓÇÇ´ø½º ÃøÁ¤Àåºñ(Impedance Analyzer System) |
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BioLogic |
¸ðµ¨¸í |
VSP-300 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 412È£
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|
Àåºñ¸í |
±â°øµµ ºÐ¼®±â(Brunauer-Emmett-Teller (BET) & Pore Analyzer) |
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micromeritics |
¸ðµ¨¸í |
ASAP 2020 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 412È£
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Àåºñ¸í |
ÈÇÐÈíÂøºÐ¼®±â(Temperature Programed Reduction/Desorption (TPR/TPD) Chemisorption Analyzer) |
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micromeritics |
¸ðµ¨¸í |
AutoChem II |
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ȯ°æ°øÇе¿ 412È£
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Àåºñ¸í |
¸¶ÀÌÅ©·ÎÀú¿ï(Microbalance) |
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RUBOTHERM |
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DynTHERM LP ST |
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ȯ°æ°øÇе¿ 412È£
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Àåºñ¸í |
ÀÓÇÇ´ø½º ÃøÁ¤Àåºñ(Impedance Analyzer System) |
Á¦ÀÛ»ç |
BioLogic |
¸ðµ¨¸í |
VSP-300 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 412È£
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Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
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Agilent Techonologies |
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7890B/5977B |
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ȯ°æ°øÇе¿ 412È£
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Àåºñ¸í |
Á¤Àü¾Ð/Á¤Àü·ù ÃøÁ¤Àåºñ(Potentiostat/Galvanostat) |
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WonATech |
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MP2 |
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ȯ°æ°øÇе¿ 412È£
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Àåºñ¸í |
°í¼º´É ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ(High Performance Liquid Chromatograph (HPLC)) |
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Waters |
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e2695 |
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ȯ°æ°øÇе¿ 412È£
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Àåºñ¸í |
°øÃÊÁ¡ ·¹ÀÌÀú ÁÖ»ç Çö¹Ì°æ(Confocal Laser Scanning Microscope) |
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Carl Zeiss |
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LSM 5 |
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ȯ°æ°øÇе¿ 414È£
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Àåºñ¸í |
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM)) |
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JEOL |
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JSM-6510 |
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ȯ°æ°øÇе¿ 414È£
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Àåºñ¸í |
ÇÙ»ê ÃßÃâ±â(Auto Nucleic Acid Preparation System) |
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Precision System Science |
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Magtration System 12GC |
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ȯ°æ°øÇе¿ 414È£
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Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÇ(Gas Chromatograph (GC)) |
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Agilent Technologies |
¸ðµ¨¸í |
6890N |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 417È£
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Àåºñ¸í |
TOC ºÐ¼®±â(Total Organic Carbon (TOC) Analyzer) |
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SHIMADZU |
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TOC-V CSH |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 417È£
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Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
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Thermo Scientific |
¸ðµ¨¸í |
Nicolet 6700 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 417È£
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|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
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Dionex |
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ICS-1100 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 417È£
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Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
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Rigaku |
¸ðµ¨¸í |
Ultima IV |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 420È£
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|
Àåºñ¸í |
ºñÇ¥¸éÀû ºÐ¼®±â(Surface Area Analyzer) |
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micromeritics |
¸ðµ¨¸í |
ASAP 2010 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
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Àåºñ¸í |
»çÁß±ØÀÚ Áú·®ºÐ¼®±â(Quadrupole Mass Spectrometer) |
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HIDEN ANALYTICAL |
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HPR-20 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
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|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÇ(Gas Chromatograph (GC)) |
Á¦ÀÛ»ç |
YL Instrument |
¸ðµ¨¸í |
YL6500GC |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
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|
Àåºñ¸í |
ÈÇÐÈíÂø·®ºÐ¼®±â(Chemisorption Analyzer) |
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MicrotracBEL Corp. |
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BELCAT ¥± |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
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|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
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Thermo Scientific |
¸ðµ¨¸í |
Nicolet iS50 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
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|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Nicolet iS20 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
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Àåºñ¸í |
»ê¼ººñ ÀÚµ¿Ã¤Ãë±â(Automatic Acid Rain Sampler) |
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Eigenbrodt GmbH & Co. KG |
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NSA 181 / KE |
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ȯ°æ°øÇе¿ ¿Á»ó
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