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Equipment Information
º¸È£¸·¿ë ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD) for Passivation)
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Equip. Info.
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10122537
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Plasma Enhanced Chemical Vapor Deposition (PE-CVD) for Passivation
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TES
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TELIA200
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Standard process : SiO2, SiN
Process Temperature : 250 ~ 400¡É
Base Presuure : under 5mTorr
Wafer size : up to 8inch wafer
Gases : SiH4, N2O, O2, NH3, N2, NF3, Ar
Ȱ¿ëºÐ¾ß
SiO2 :high depositon rate at relatively low temperatures excellent breakdown characteristics.
hard mask, insulator, final passivation
SiN : high dielectric constant(as compared to that of silicn dioxide) imperviousness to water vapor and ion diffusion radiation shielding
etch stop materials, spacers for the suicide materials, dielectric layer
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SurForce LLC
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SFA 2000
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Áö°î¿¬±¸µ¿ 230È£
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SurForce LLC
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SFA 2000
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Áö°î¿¬±¸µ¿ 230È£
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À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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iCAP 6500 DUO
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ö°­´ëÇпø 176È£
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TEM¿ë À̿¹иµ½Ã½ºÅÛ(Ion Milling System for Transmission Electron Microscope (TEM))
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Gatan model 691
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ö°­´ëÇпø 284È£
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±Ý¼Ó ÆÇÀç ÀÎÀå¾ÐÃà½ÃÇè±â(Sheet Metal Deformation Simulator)
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RB319
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ö°­´ëÇпø 312-4È£
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±ÝÇüÅ×½ºÅͱâ(U Draw Test Mold for Servo Press)
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R&B
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ö°­´ëÇпø 584È£
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VERTEX 80v with HYPERION 2000
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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Model 161
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Àü±âÈ­ÇÐ ºÐ¼®±â(Electrochemical Analyzer System)
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Advanced Measurement Technology
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2101A
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Nu Instruments Ltd
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Plasma 3
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Thermo Scientific
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Agilent Technologies
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1260 Infinity
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Thermo Scientific
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Nicolet iS50
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Waters
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Thermo Scientific
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Thermo Scientific
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Nicolet iS50
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Thermo Scientific
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Nicolet iS20
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