±âº»Á¤º¸ |
¼³ºñ¹øÈ£ |
10145736 |
Àåºñ¸í(ÇѱÛ) |
Àü±âºÐ¹« ÀÌ¿ÂÀ̵¿µµ ºÐ¼® - Áú·® ºÐ¼®±â
|
Àåºñ¸í(¿µ¹®) |
Electrospray ionization Ion mobility - Mass spectrometry |
Á¦ÀÛ»ç |
AGILENT |
¸ðµ¨¸í |
Agilent 6560 |
»ó¼¼Á¤º¸ |
Àåºñ»ç¾ç |
******[Àåºñ »ç¿ë ¹× ¿¹¾à ¹®ÀÇ]****** ´ã´çÀÚ : ³ëµ¿¿¬
¿¬¶ôó : nodongyeon@postech.ac.kr ´ã´çÀÚ : ÀÓ´ÙÇý ¿¬¶ôó : imdahye@postech.ac.kr *******************************
Q-TOF Mode Specifications - Mass resolving power : > 42,000 at 2722 m/z - Mass accuracy : <1 ppm RMS - Mass range : 100-10,000 m/z extended mass range, 50-1,700 or 100-3,200 m/z for both high resolution and extended dynamic range modes, quadrupole up to 4,000 m/z
* Ion Mobility Q-TOF Mode Specifications - Drift resolution : Greater than 50 - Collisional cross section accuracy < 2% |
Ȱ¿ëºÐ¾ß |
The Agilent IM-QTOF LC/MS system is a major advance in the commercial development of analytical ion mobility‑mass spectrometry. Optimized development of a uniform drift field mobility cell and interface to a high resolution Q-TOF instrument gives a
significant gain in ion mobility performance. The use of ion funnel technology pioneered by Agilent for both triple quadrupole and Q-TOF instruments over the past
three years has been incorporated into the new IM-QTOF system. This has resulted in
combined ion mobility separation and mass resolution with high sensitivity.
Recent work with several collaborators has confirmed that the instrument delivers:
• Greater separation of lipids and glycopeptides • More accurate collision cross section measurements enabling more confident
characterization of structural conformations and isomeric compounds • Greater numbers of trace level peptides in complex matrices • Preservation of structural fidelity of metallo-proteins in liquid phase solutions
|
Àåºñ¿î¿µÀη |
¼³Ä¡Àå¼Ò |
ÈÇаü 112È£
|
¼Ò¼Ó |
ÈÇаú |
¼º¸í |
³ëµ¿¿¬ |
ÀüÈ |
|
À̸ÞÀÏ |
nodongyeon@postech.ac.kr |
µ¿ÀÏ/À¯»çÀåºñÁ¤º¸ |
Àåºñ¸í |
Ãʰí¼Ó ¿ø½ÉºÐ¸®±â(Ultracentrifuge Optima XE-100) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima XE-100 |
¼³Ä¡Àå¼Ò |
129È£
|
|
Àåºñ¸í |
À¯¼¼Æ÷ ºÐ¼®±â(High-end performance Flow Cytometer) |
Á¦ÀÛ»ç |
BD Biosciences |
¸ðµ¨¸í |
LSR Foretessa 4Laser |
¼³Ä¡Àå¼Ò |
202-1È£
|
|
Àåºñ¸í |
À¯¼¼Æ÷ ºÐ¼®±â(FACS SONY-SH800S) |
Á¦ÀÛ»ç |
SONY |
¸ðµ¨¸í |
SONY SH800S |
¼³Ä¡Àå¼Ò |
202-1È£
|
|
Àåºñ¸í |
ȸéÇü ¾ÆÀÌÆ®·¡Ä¿ Tobii Pro Spectrum HW + SW ÆÐŰÁö(Screen-based Eye Tracker: Tobii Pro Spectrum HW + SW) |
Á¦ÀÛ»ç |
ÅäºñÅ×Å©³î·ÎÁöÄÚ¸®¾Æ(ÁÖ) |
¸ðµ¨¸í |
Tobii Pro Spectrum 600Hz |
¼³Ä¡Àå¼Ò |
206È£
|
|
Àåºñ¸í |
[±Û·ÎÄÃ] ÆÄ¿ö·¦¾¾ µðÁöÅÐ µ¥ÀÌÅÍ ¼öÁý ½Ã½ºÅÛ([Glocal] PowerLab C Digital Data Collection System) |
Á¦ÀÛ»ç |
(ÁÖ)¶óÀÌÇÁÅØ |
¸ðµ¨¸í |
PowerLab C |
¼³Ä¡Àå¼Ò |
206È£
|
|
Àåºñ¸í |
°í¾Ð½ºÆÀ¸ê±Õ±â(Autoclave ES-315) |
Á¦ÀÛ»ç |
TOMY |
¸ðµ¨¸í |
ES-315 |
¼³Ä¡Àå¼Ò |
239È£
|
|
Àåºñ¸í |
(GLOCAL)¾×üũ·Î¸¶Åä±×·¡ÇÇ »ï´Ü»çÁß±ØÀÚ Áú·®ºÐ¼®±â(Liquid Chromatography-Triple Quadrupole Mass Spectrometry) |
Á¦ÀÛ»ç |
Waters |
¸ðµ¨¸í |
Xevo Absolute system |
¼³Ä¡Àå¼Ò |
3308È£
|
|
Àåºñ¸í |
Ãʰí¼Ó ¿ø½ÉºÐ¸®±â(Ultracentrifuge Optima XE-100) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima XE-100 |
¼³Ä¡Àå¼Ò |
332È£
|
|
Àåºñ¸í |
Á¦ºù±â(ICE-Maker) |
Á¦ÀÛ»ç |
ºñÀü°úÇÐ |
¸ðµ¨¸í |
VS-625 |
¼³Ä¡Àå¼Ò |
405È£
|
|
Àåºñ¸í |
Ãʰí¼Ó ¿ø½ÉºÐ¸®±â(Ultracentrifuge Optima XE-100) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima XE-100 |
¼³Ä¡Àå¼Ò |
410È£
|
|
Àåºñ¸í |
ÃÊ°í¼º´É ÀÚµ¿ ¼¼Æ÷ºÐ¼®±â(Ultra High-End Performance Flow Cytometry System) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
cyotoFLEX LX |
¼³Ä¡Àå¼Ò |
729È£
|
|
Àåºñ¸í |
Á¶Á÷Åõ¸íȽýºÅÛ(CLARITY-Tissue Clearing system) |
Á¦ÀÛ»ç |
·Î°í¹ÙÀÌ¿À½Ã½ºÅÛ |
¸ðµ¨¸í |
X-clarity |
¼³Ä¡Àå¼Ò |
BOIC 4210È£
|
|
Àåºñ¸í |
Áú·®ºÐ¼®±â°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¿ÀºñÆ®·¦Áú·®ºÐ¼®±â(High-performance Liquid Chromatography – Mass) |
Á¦ÀÛ»ç |
Perkin Elmer |
¸ðµ¨¸í |
Qsight220 |
¼³Ä¡Àå¼Ò |
BOIC 4307È£
|
|
Àåºñ¸í |
Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷)) |
Á¦ÀÛ»ç |
Merck Millipore |
¸ðµ¨¸í |
Milli-Q¢ç IQ 7015 |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
°í¼Ó ¿ø½ÉºÐ¸®±â(High Centrifuge Avanti J-E) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Avanti J-E |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
Ź»ó¿ë Ãʰí¼Ó ¿ø½ÉºÐ¸®(Table-top Centrifuge(Optima MAX-XP)) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima MAX-XP |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
Ãʰí¼Ó ¿ø½ÉºÐ¸®±â(Ultracentrifuge Optima XE-100) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima XE-100 |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
°í¼Ó ¿ø½ÉºÐ¸®±â(High Centrifuge Avanti J-E) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Avanti J-E |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
(GLOCAL)´ÜÀϼ¼Æ÷ °ø°£À¯Àüü ºÐ¼®ÀåÄ¡(Single-cell spatial genomics analyzer) |
Á¦ÀÛ»ç |
10xGENOMICS |
¸ðµ¨¸í |
Xenium analyzer |
¼³Ä¡Àå¼Ò |
BOIC [3311È£]
|
|
Àåºñ¸í |
°í¼Ó ¿ø½ÉºÐ¸®±â(High Centrifuge Avanti J-E) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Avanti J-E |
¼³Ä¡Àå¼Ò |
BOIC [4307È£]
|
|
Àåºñ¸í |
(GLOCAL)´ÜÀϼ¼Æ÷ À̹Ì¡ °ø°£ ºÐ¼® ½Ã½ºÅÛ(Ultra high-multiplexed single cell spatial analysis system) |
Á¦ÀÛ»ç |
Akoya Biosciences |
¸ðµ¨¸í |
Phenocycler-Fusion 2.0 |
¼³Ä¡Àå¼Ò |
BOIC [4308È£]
|
|
Àåºñ¸í |
Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷)) |
Á¦ÀÛ»ç |
Merck Millipore |
¸ðµ¨¸í |
Milli-Q¢ç Q-POD¢ç |
¼³Ä¡Àå¼Ò |
BOIC [4313È£]
|
|
Àåºñ¸í |
°í¼Ó ó¸®Çü±¤ ³ª³ëÀε§Å×ÀÌ¼Ç (Nanoindentation ) |
Á¦ÀÛ»ç |
OPTIC11 LIFE |
¸ðµ¨¸í |
Pavone |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
À̵¿Çü °í¿¡³ÊÁö ÆÄÀ庯ȯ ³ª³ëÆÞ½º ·¹ÀÌÀú (Photosonus X-50 ) |
Á¦ÀÛ»ç |
EKSPLA |
¸ðµ¨¸í |
Photosonus X-50 |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
´ë¿ë·® Â÷¼¼´ë¿°±â¼¿ºÐ¼® ½Ã½ºÅÛ(Next-Generation Sequencing system) |
Á¦ÀÛ»ç |
Illumina |
¸ðµ¨¸í |
NextSeq1000 |
¼³Ä¡Àå¼Ò |
C5
|
|
Àåºñ¸í |
ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System) |
Á¦ÀÛ»ç |
¿À¹æÅ×Å©³î·ÎÁö |
¸ðµ¨¸í |
OBT-PC300 |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
Á¦ÀÛ»ç |
ÇѺû·¹ÀÌÀú |
¸ðµ¨¸í |
GPPA-A377 |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System) |
Á¦ÀÛ»ç |
MUSASHI ENGINEERING, INC. |
¸ðµ¨¸í |
IMAGE MASTER 350PC SMART/SHOTMASTER 300QX |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
¿ø·á ÁõÂø ½Ã½ºÅÛ(Materials Deposition System with Piezoelectric Inkjet Catridge) |
Á¦ÀÛ»ç |
FUJIFILM |
¸ðµ¨¸í |
Dimatix DMP-2850 |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
Áø°øÇÁ·Îºê½ºÅ×À̼Ç(Vacuum Chamber Probe Station) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
M6VC |
¼³Ä¡Àå¼Ò |
C5 330È£
|
|
Àåºñ¸í |
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
MST8000 |
¼³Ä¡Àå¼Ò |
C5 332È£
|
|
Àåºñ¸í |
ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System) |
Á¦ÀÛ»ç |
Specialty Coating Systems (SCS) - A KISCO Company |
¸ðµ¨¸í |
PDS Labcoter 2 (PDS 2010 LABCOTER) |
¼³Ä¡Àå¼Ò |
C5 720-1È£
|
|
Àåºñ¸í |
5Ãà CNC(5-axis Computerized Numerical Control (CNC)) |
Á¦ÀÛ»ç |
ShopBot |
¸ðµ¨¸í |
PRSalpha |
¼³Ä¡Àå¼Ò |
C5 MAKER SPACE 4(ÁöÇÏ)
|
|
Àåºñ¸í |
3Ãà CNC(3-axis Computerized Numerical Control (CNC)) |
Á¦ÀÛ»ç |
ShopBot |
¸ðµ¨¸í |
PRSalpha |
¼³Ä¡Àå¼Ò |
C5 MAKER SPACE 4(ÁöÇÏ)
|
|
Àåºñ¸í |
Áß Àû¿Ü¼± ·¹ÀÌÀú(Mid-infrared laser) |
Á¦ÀÛ»ç |
Daylight Solutions |
¸ðµ¨¸í |
MIRCcat-QT-2100 |
¼³Ä¡Àå¼Ò |
C5 [232È£]½ÇÇè½Ç
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
TEMESCAL/BOC COATING TECH |
¸ðµ¨¸í |
BDJ 1800 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 110È£
|
|
Àåºñ¸í |
ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station) |
Á¦ÀÛ»ç |
The Micromanipulator Company |
¸ðµ¨¸í |
No. 6000 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 110È£
|
|
Àåºñ¸í |
ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station) |
Á¦ÀÛ»ç |
The Micromanipulator Company |
¸ðµ¨¸í |
No. 7100 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 202È£
|
|
Àåºñ¸í |
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station) |
Á¦ÀÛ»ç |
UNITEK CORPORATION |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 212È£
|
|
Àåºñ¸í |
´ÙÃþ±âÆÇ ÀûÃþ±â(Multi-layder Press) |
Á¦ÀÛ»ç |
LPKF Laser & Electronics AG |
¸ðµ¨¸í |
Multi Press II |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 420È£
|
|
Àåºñ¸í |
´ë±âÁ¶Àý¹è¾çÀÛ¾÷´ë(Modular Atmosphere Control Workstation System) |
Á¦ÀÛ»ç |
Don Whitley Scientific |
¸ðµ¨¸í |
Don Whitley Scientific A55 |
¼³Ä¡Àå¼Ò |
PBC 362È£
|
|
Àåºñ¸í |
UV-vis ºÐ±¤±¤µµ°è(UV-vis Spectrometer) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Lambda 750S |
¼³Ä¡Àå¼Ò |
RIST 3194È£
|
|
Àåºñ¸í |
¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD)) |
Á¦ÀÛ»ç |
CN1 |
¸ðµ¨¸í |
Atomic-Basic |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1139È£
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Telemark |
¸ðµ¨¸í |
246-28 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1145È£
|
|
Àåºñ¸í |
X-¼± ±¤ÀüÀÚ ºÐ±¤±â(X-ray Photoelectron Spectrometer (XPS) Microprobe) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
ESCALAB 250 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1153È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
GeminiSEM 500 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1153È£
|
|
Àåºñ¸í |
À̿ ¹Ð¸µ ½Ã½ºÅÛ(Cross Section Planar Ion Milling System) |
Á¦ÀÛ»ç |
GATAN |
¸ðµ¨¸í |
Ilion+II Model 697 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1162È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
AURIGA |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1163È£
|
|
Àåºñ¸í |
Áý¼Ó À̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
SII |
¸ðµ¨¸í |
SMI3050SE |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1169È£
|
|
Àåºñ¸í |
¼öÂ÷º¸Á¤ ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs-Corrected Scanning Transmission Electron Microscope (Cs-STEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-ARM200F |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1176È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
D/MAX-2500V |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1177È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
D/MAX-2500V |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1179È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
SmartLab |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1181È£
|
|
Àåºñ¸í |
Àü°è¹æÃâ Çö¹Ì°æ(Field Emission Electron Microscope) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2100F |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1188È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JSM-7600F |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1192È£
|
|
Àåºñ¸í |
À̿ ºö ¹Ð¸µ ½Ã½ºÅÛ(Triple Ion Beam Miller) |
Á¦ÀÛ»ç |
Leica Microsystems |
¸ðµ¨¸í |
EM TIC020 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1196È£
|
|
Àåºñ¸í |
°¡½ººÎ½Ä½ÃÇè±â(Gas Corrosion Test Instrument) |
Á¦ÀÛ»ç |
SUGA |
¸ðµ¨¸í |
GT-100 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1272È£
|
|
Àåºñ¸í |
±Û·Î¿ì ¹æÀü Áú·®ºÐ¼®±â(Glow Discharge Mass Spectrometry (GD-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
ELEMENT GD |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1302È£
|
|
Àåºñ¸í |
°íºÐÇØ´É À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(High Resolution Inductively Coupled Plasma Mass Spectrometer (HR-ICP-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
ELEMENT XR |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1304È£
|
|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
VERTEX 70 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1306È£
|
|
Àåºñ¸í |
·¹ÀÌÀú À¯µµ ÇöóÁ ºÐ±¤ºÐ¼®±â(Tandem Laser-ablation Laser-induced Breakdown Spectrometer (LA-LIBS)) |
Á¦ÀÛ»ç |
Applied Spectra |
¸ðµ¨¸í |
J200 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1306È£
|
|
Àåºñ¸í |
»ïÁß »ç±ØÀÚ À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(Triple Quadrupole Inductively Coupled Plasma Mass Spectrometer (TQ-ICP-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP TQ |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1306È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÁ Áú·®ºÐ¼®±â(Gas Chromatograph-Mass Spectrometer (GC-MS)) |
Á¦ÀÛ»ç |
SHIMADZU |
¸ðµ¨¸í |
GCMS-QP2010 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1308È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
AMETEK |
¸ðµ¨¸í |
Spectro Arcos |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1309È£
|
|
Àåºñ¸í |
¿øÀÚ Èí¼ö ºÐ±¤±â(Atomic Absorption Spectrometer (AAS)) |
Á¦ÀÛ»ç |
Analytik Jena |
¸ðµ¨¸í |
contrAA 800 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1309È£
|
|
Àåºñ¸í |
¼øÂ÷ ºÐ¼®Çü Çü±¤ X-¼± ºÐ¼®ÀåÄ¡(»ó¸éÁ¶»çÇü)(Tube-above Sequential Wavelength Dispersive X-ray Fluorescence (WDXRF) Spectrometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
ZSX Primus II |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1310È£
|
|
Àåºñ¸í |
¼øÂ÷ ºÐ¼®Çü Çü±¤ X-¼± ºÐ¼®ÀåÄ¡(Sequential Wavelength Dispersive X-ray Fluorescence (WDXRF) Spectrometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
ZSX Primus |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1310È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Optima 8300 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1311È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP 7000 Series |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1311È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
AMETEK |
¸ðµ¨¸í |
Spectro Arcos |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1311È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890B/5977A |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1314È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890B/5977B |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1314È£
|
|
Àåºñ¸í |
¿Å»Âø ÃøÁ¤ ½Ã½ºÅÛ(Thermal Desorption System) |
Á¦ÀÛ»ç |
Markes International |
¸ðµ¨¸í |
UNITY2 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1317È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Nittoseiko Analytech |
¸ðµ¨¸í |
AQF-2100H |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1318È£
|
|
Àåºñ¸í |
ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Dionex ICS-5000 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1320È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
MASTERSIZER 2000 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1320È£
|
|
Àåºñ¸í |
¸¶ÀÌÅ©·ÎÆÄ ½Ã·á ºÐÇØ ½Ã½ºÅÛ(Advanced Microwave Digestion System) |
Á¦ÀÛ»ç |
Milestone |
¸ðµ¨¸í |
ETHOS 1 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1334È£
|
|
Àåºñ¸í |
HPT-E-CAPº¹ÇÕÇÁ·¹½º(HPT-E-CAP Compound Press System) |
Á¦ÀÛ»ç |
(ÁÖ)¸ðÀνýº |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 2022È£
|
|
Àåºñ¸í |
Ź»óÇü Àý´Ü±â(Tabletop Cut-off Machine) |
Á¦ÀÛ»ç |
Struers |
¸ðµ¨¸í |
Discotom-100 |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2177È£
|
|
Àåºñ¸í |
Àüµ¿ µðÁöÅÐ Çö¹Ì°æ(Opto-digital Motorizing Microscope) |
Á¦ÀÛ»ç |
OLYMPUS |
¸ðµ¨¸í |
DSX100 |
¼³Ä¡Àå¼Ò |
RIST2µ¿ 2179È£
|
|
Àåºñ¸í |
º¹ÇÕ ºÎ½Ä ½ÃÇè±â(Cyclic Corrosion Tester) |
Á¦ÀÛ»ç |
Q-LAB |
¸ðµ¨¸í |
Q-FOG CCT 1100 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3011È£
|
|
Àåºñ¸í |
º¹ÇÕ »çÀÌŬ ½ÃÇè±â(Cyclic Corrosion Test Chamber) |
Á¦ÀÛ»ç |
Ascott Analytical |
¸ðµ¨¸í |
CC1000iP |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3016È£
|
|
Àåºñ¸í |
º¹ÇÕ ºÎ½Ä ½ÃÇè±â(Cyclic Corrosion Tester) |
Á¦ÀÛ»ç |
Q-LAB |
¸ðµ¨¸í |
Q-FOG CCT 1100 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3016È£
|
|
Àåºñ¸í |
UV-vis ºÐ±¤±¤µµ°è(UV-vis Spectrometer) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
Cary 4000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3102
|
|
Àåºñ¸í |
Áø°ø è¹ö Á¤¹Ð ºÐ¼® Àåºñ(Vacuum Chamber I-V Probing System) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
MST5000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3102È£
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Selcos |
¸ðµ¨¸í |
Cetus-E |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3104È£
|
|
Àåºñ¸í |
¿ ÈÇÐ ±â»ó ÁõÂø ÀåÄ¡(Thermal Chemical Vapor Deposition (CVD) System) |
Á¦ÀÛ»ç |
SNTEK |
¸ðµ¨¸í |
TCS5000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3104È£
|
|
Àåºñ¸í |
Á¤¹ÐÀÚµ¿Àý´Ü±â(Linear Precision Saw) |
Á¦ÀÛ»ç |
BUEHLER |
¸ðµ¨¸í |
ISOMET4000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3132È£
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
iNFOVION |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3147È£
|
|
Àåºñ¸í |
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System) |
Á¦ÀÛ»ç |
Roche |
¸ðµ¨¸í |
LightCycler96 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3153È£
|
|
Àåºñ¸í |
PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System) |
Á¦ÀÛ»ç |
MUSASHI ENGINEERING, INC. |
¸ðµ¨¸í |
IMAGE MASTER 350PC SMART/SHOTMASTER 300DS-S |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3170È£
|
|
Àåºñ¸í |
3D º¯ÇüÃøÁ¤½Ã½ºÅÛ(3D Deformation Analysis System) |
Á¦ÀÛ»ç |
GOM international AG |
¸ðµ¨¸í |
ARAMIS 12M |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3188È£
|
|
Àåºñ¸í |
ÁÖ»ç Åõ°ú ÀüÀÚÇö¹Ì°æ(Scanning Transmission Electron Microscope (STEM)) |
Á¦ÀÛ»ç |
COXEM |
¸ðµ¨¸í |
CX-200 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3188È£
|
|
Àåºñ¸í |
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System) |
Á¦ÀÛ»ç |
SNTEK |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3219È£
|
|
Àåºñ¸í |
ÇöóÁ ¿øÀÚÃþ ÁõÂø ½Ã½ºÅÛ(Plasma Enhanced Atomic Layer Deposition (PE-ALD) System) |
Á¦ÀÛ»ç |
ForALL |
¸ðµ¨¸í |
OZONE |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3223È£
|
|
Àåºñ¸í |
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
Á¦ÀÛ»ç |
HIGGSLAB |
¸ðµ¨¸í |
PLD SYSTEM |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3263È£
|
|
Àåºñ¸í |
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System) |
Á¦ÀÛ»ç |
Photron Ltd. |
¸ðµ¨¸í |
FASTCAM SA1 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3267È£
|
|
Àåºñ¸í |
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System) |
Á¦ÀÛ»ç |
Photron Ltd. |
¸ðµ¨¸í |
FASTCAM SA2 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3267È£
|
|
Àåºñ¸í |
ÀüÁö ¼º´É ½ÃÇè±â(Multi-cycling Battery Test System) |
Á¦ÀÛ»ç |
Korea Thermo-Tech |
¸ðµ¨¸í |
SERIES 4000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3278È£
|
|
Àåºñ¸í |
´Ùä³Î Potentiostat(Multi-channel Potentiostat) |
Á¦ÀÛ»ç |
HS Technologies |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3278È£
|
|
Àåºñ¸í |
¿Áß·®-½ÃÂ÷Áֻ翷®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC)) |
Á¦ÀÛ»ç |
TA Instruments |
¸ðµ¨¸í |
SDT Q600 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3278È£
|
|
Àåºñ¸í |
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
COMPex Pro 102 F |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3282È£
|
|
Àåºñ¸í |
UV-vis ºÐ±¤±¤µµ°è(UV-vis Spectrometer) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
Cary 5000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3306È£
|
|
Àåºñ¸í |
GPC ½Ã½ºÅÛ(Gel Permeation Chromatography (GPC) System) |
Á¦ÀÛ»ç |
Waters |
¸ðµ¨¸í |
1525/2414/410 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3312È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System) |
Á¦ÀÛ»ç |
KEITHLEY Instruments |
¸ðµ¨¸í |
4200 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3340È£
|
|
Àåºñ¸í |
´Ü°áÁ¤ ¿¢½º·¹ÀÌ È¸ÀýÀåÄ¡(Single Crystal X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
APEXII Quazar |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3352/3354È£
|
|
Àåºñ¸í |
ºÐ¸»½Ã·á ¿¢½º·¹ÀÌ È¸ÀýÀåÄ¡(Powder X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Advance |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3352/3354È£
|
|
Àåºñ¸í |
X-¼±±¤ÀüÀںб¤ºÐ¼®±â(XPS xonnectable Deposition system) |
Á¦ÀÛ»ç |
ULVAC-PHI, Inc. |
¸ðµ¨¸í |
PHI GENESIS Multi-tech Scanning XPS |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3360/3362È£
|
|
Àåºñ¸í |
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System) |
Á¦ÀÛ»ç |
Roche |
¸ðµ¨¸í |
LightCycler480 |
¼³Ä¡Àå¼Ò |
°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
|
|
Àåºñ¸í |
5Ãà º¹ÇÕ °¡°ø±â(5-axis Computerized Numerical Control (CNC) Turning Center) |
Á¦ÀÛ»ç |
DMG |
¸ðµ¨¸í |
CTX Beta 1250 TC |
¼³Ä¡Àå¼Ò |
±â°è°øÀÛµ¿ 100È£
|
|
Àåºñ¸í |
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System) |
Á¦ÀÛ»ç |
Photron Ltd. |
¸ðµ¨¸í |
FASTCAM Mini UX100 |
¼³Ä¡Àå¼Ò |
±â°è½ÇÇ赿 108È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ±¸µ¿ ±¤¿ø(Laser-driven Light Source (LSDS)) |
Á¦ÀÛ»ç |
ENERGETIQ TECHNOLOGY |
¸ðµ¨¸í |
EQ-1500 |
¼³Ä¡Àå¼Ò |
±â°è½ÇÇ赿 206È£
|
|
Àåºñ¸í |
°í¼Ó ¿ø¼ÒºÐ¼®ÀÌ °¡´ÉÇÑ Àü°è ¹æÃâÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(FE-SEM with high speed EDS system) |
Á¦ÀÛ»ç |
JEOL LTD. |
¸ðµ¨¸í |
JSM-7800F Prime |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 101È£
|
|
Àåºñ¸í |
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Nanolab G3 CX |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-4È£
|
|
Àåºñ¸í |
ÀÌÂ÷ÀÌ¿ÂÁú·®ºÐ¼®±â(Secondary Ion Mass Spectrometry (SIMS)) |
Á¦ÀÛ»ç |
CAMECA Instruments |
¸ðµ¨¸í |
IMS 6F |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105È£
|
|
Àåºñ¸í |
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Helios 600 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
|
|
Àåºñ¸í |
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Helios 650 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
|
|
Àåºñ¸í |
°¡½º Èñ¼® ½Ã½ºÅÛ(Computerized Gas Dilution System) |
Á¦ÀÛ»ç |
Environics |
¸ðµ¨¸í |
Series 4040 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
|
|
Àåºñ¸í |
±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope
(Cs-corrected HR-STEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2200FS |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø TEM-2200FS½Ç
|
|
Àåºñ¸í |
À̿¿¬¸¶±â(Ion Milling System) |
Á¦ÀÛ»ç |
GL CORPORATION |
¸ðµ¨¸í |
PIPS1 691 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
|
|
Àåºñ¸í |
Àú¿¡³ÊÁö À̿ ¿¬¸¶±â(Gentle Mill (Low Energy Ion Milling System)) |
Á¦ÀÛ»ç |
TechnoOrg Linda |
¸ðµ¨¸í |
IV5 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
LEO Elektronrnmikroskopie GmbH |
¸ðµ¨¸í |
FE-SEM |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVE-C300160 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
À¯±â¹° ÁõÂø±â(Organic Molecular Beam Deposition (OMBD) & Thermal Evaporator) |
Á¦ÀÛ»ç |
alpha-plus |
¸ðµ¨¸í |
OMBD & Thermal |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas)) |
Á¦ÀÛ»ç |
ATIS |
¸ðµ¨¸í |
Manual Wet Station |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas)) |
Á¦ÀÛ»ç |
ATIS |
¸ðµ¨¸í |
Manual Wet Station |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
±Ý¼Ó À¯±â¹° ÈÇбâ»óÁõÂø ½Ã½ºÅÛ(Metalorganic Chemical Vapor Deposition (MOVCD) System) |
Á¦ÀÛ»ç |
Jusung Eng. |
¸ðµ¨¸í |
Eureka 2000 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD)) |
Á¦ÀÛ»ç |
QUROS |
¸ðµ¨¸í |
Plus 200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVE-4000 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÀÓ°èÄ¡¼ö ÃøÁ¤ ÁÖ»çÀüÀÚÇö¹Ì°æ(Critical Dimension Scanning Electron Microscope (CD-SEM)) |
Á¦ÀÛ»ç |
HITACHI |
¸ðµ¨¸í |
S-9380 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½À½Ä ¼¼Á¤ÀåÄ¡(Wet Station (Acid)) |
Á¦ÀÛ»ç |
High Integrated Technology (HIT) |
¸ðµ¨¸í |
HWC-MCP |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
Àú¾Ð ÈÇÐÁõÂøÀåÄ¡(ÆÛ´Ï½º ŸÀÔ)(Low Pressure Chemical Vapor Deposition (LP-CVD; Furnace Type)) |
Á¦ÀÛ»ç |
(ÁÖ)À¯ÁøÅ×Å© |
¸ðµ¨¸í |
BJM100 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
Á¦ÀÛ»ç |
¾ÆÅؽýºÅÛ |
¸ðµ¨¸í |
UF-CVD 200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
°íÀü·ù ÀÓÇöõÅÍ(High-Current Implantor) |
Á¦ÀÛ»ç |
Applied Materials |
¸ðµ¨¸í |
VIISion200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
»ó¾Ð ÈÇбâ»óÁõÂø¹ý(Atmosphere Pressure Chemical Vapor Deposition (APCVD)) |
Á¦ÀÛ»ç |
Watkins Johnson |
¸ðµ¨¸í |
WJ-1000T |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
°í¿Â¿Ã³¸®¿ë V-ÆÛ´Ï½º(High Temperature Process V-Furnace) |
Á¦ÀÛ»ç |
TEL |
¸ðµ¨¸í |
Alpha-808SD |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½À½Ä»êÈ¿ë V-ÆÛ´Ï½º(Wet Oxidation V-Furnace) |
Á¦ÀÛ»ç |
TEL |
¸ðµ¨¸í |
Alpha-808SD |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
°Ç½Ä»êÈ¿ë V-ÆÛ´Ï½º(Dry Oxidation V-Furnace) |
Á¦ÀÛ»ç |
TEL |
¸ðµ¨¸í |
Alpha-808DN |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ź¼Ò³ª³ëÆ©ºê ÇÕ¼º CVD(Carbon Nanotube (CNT) Synthesis Chemical Vapor Deposition (CVD)) |
Á¦ÀÛ»ç |
¾ÆÅؽýºÅÛ |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
Á¦ÀÛ»ç |
BMR Technology Co. |
¸ðµ¨¸í |
HiDep-SC |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVE-C300160 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½Ç¸®ÄÜ °íÁ¾È¾ºñ ½Ä°¢ÀåÄ¡(Deep Reactive Ion Etcher (DRIE)) |
Á¦ÀÛ»ç |
SPTS |
¸ðµ¨¸í |
Pegasus |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
º¸È£¸·¿ë ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD) for Passivation) |
Á¦ÀÛ»ç |
TES |
¸ðµ¨¸í |
TELIA200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
(GLOCAL)ü¼ººÐºÐ¼®±â(Whole Body Composition Analyzer) |
Á¦ÀÛ»ç |
EchoMRI LLC |
¸ðµ¨¸í |
EchoMRI-100H Analyzer |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇе¿ A210È£
|
|
Àåºñ¸í |
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-1011 |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 156È£
|
|
Àåºñ¸í |
ÃʰíÇØ»óµµ smFRET STORM À̹Ì¡ Àåºñ(Super-resolution smFRET STORM imaging system) |
Á¦ÀÛ»ç |
ONI |
¸ðµ¨¸í |
Oxford Nanoimager S |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 253È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ¹Ì¼¼ ÇØºÎ ½Ã½ºÅÛ(Laser Microdissection Microscope System) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
PALM MicroBeam |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 341È£
|
|
Àåºñ¸í |
µå¶ø¼¼ÅÍ(Drop Setter for Protein Crystallization) |
Á¦ÀÛ»ç |
FORMULATRIX |
¸ðµ¨¸í |
NT8 |
¼³Ä¡Àå¼Ò |
»ý¸í°úÇаü 204È£
|
|
Àåºñ¸í |
Ź»óÇüÃʰí¼Ó¿ø½ÉºÐ¸®±â(Table-Top Ultracentrifuge) |
Á¦ÀÛ»ç |
Beckman Coulter |
¸ðµ¨¸í |
Optima MAX-XP |
¼³Ä¡Àå¼Ò |
¼¼Æ÷¸·´Ü¹éÁú¿¬±¸¼Ò 310È£ °øµ¿±â±â½Ç
|
|
Àåºñ¸í |
¸ð¼Çĸó ½Ã½ºÅÛ(Motion Capture System) |
Á¦ÀÛ»ç |
Optitrack |
¸ðµ¨¸í |
OptiTrack Motion Tracking System |
¼³Ä¡Àå¼Ò |
ÀΰøÁö´É¿¬±¸¿ø 142È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2100 (HR) |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 105È£
|
|
Àåºñ¸í |
±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope(Cs-corrected HR-STEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2200FS (UHR) |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 109È£
|
|
Àåºñ¸í |
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
HITACHI |
¸ðµ¨¸í |
7600H |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 111È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 DISCOVERY |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 111È£
|
|
Àåºñ¸í |
LED ÃøÁ¤ ½Ã½ºÅÛ(Wafer-level LED Measurement System) |
Á¦ÀÛ»ç |
WithLight |
¸ðµ¨¸í |
OPI-170 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System) |
Á¦ÀÛ»ç |
KEITHLEY Instruments |
¸ðµ¨¸í |
4200-SCS |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVPED-T0583 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 210È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
D/MAX-2500-PC |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 304-1È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚ Çö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
PHILIPS ELECTRON OPTICS B.V. |
¸ðµ¨¸í |
XL30S FEG |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 306-1È£
|
|
Àåºñ¸í |
¿¢½º¼± ¶ó¿ì¿¡ ȸÀýÆÐÅÏ ÃøÁ¤ÀåÄ¡(X-ray Diffractometer) |
Á¦ÀÛ»ç |
RES-Lab Co.,Ltd. |
¸ðµ¨¸í |
XRD mate IPX-LC/B |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 406È£
|
|
Àåºñ¸í |
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System) |
Á¦ÀÛ»ç |
(ÁÖ)¾ÅÅ©·Ð |
¸ðµ¨¸í |
MotionPro Y7S1 |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 314È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
DIONEX ICS-2100 |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(Inductively Coupled Plasma Mass Spectrometer (ICP-MS)) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
NexION-300D |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
¹æ»ç¼± µ¿À§¿ø¼Ò ¾×ü ¼¶±¤ °è¼ö±â(Liquid Scintillation Analyzer) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Tri-carb 2910TR |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
MiniFlex 600 |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
ÀúÁØÀ§ ¾×ü¼¶±¤ºÐ¼®±â(Low Activity Liquid Scintillation Analyzer) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Tri-Carb 5110 TR |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
ºñÁ¢ÃË½Ä 3Â÷¿ø ½ºÄ³³Ê(Structured-light 3D Scanner) |
Á¦ÀÛ»ç |
Breuckmann |
¸ðµ¨¸í |
SmartSCAN3D-HE |
¼³Ä¡Àå¼Ò |
Á¦2°øÇаü 206È£
|
|
Àåºñ¸í |
DPSS ·¹ÀÌÀú(Diode-pumped Solid-state (DPSS) Laser) |
Á¦ÀÛ»ç |
LIGHTHOUSE PHOTONICS |
¸ðµ¨¸í |
Sprout-G-12W |
¼³Ä¡Àå¼Ò |
Á¦2°øÇаü 504È£
|
|
Àåºñ¸í |
°íÈ¿À² À̹Ì¡ ½Ã½ºÅÛ(Electron Multiplying Charge-Coupled Device (EMCCD)) |
Á¦ÀÛ»ç |
Andor |
¸ðµ¨¸í |
iXon DU-897 |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 006È£
|
|
Àåºñ¸í |
°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(High Frequency Induction Heater) |
Á¦ÀÛ»ç |
EMWise Communications |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 105È£
|
|
Àåºñ¸í |
´Ù¸ñÀû ¹Ú¸· Ç¥¸é±¸Á¶ ºÐ¼® ¿øÀÚ Çö¹Ì°æ Àåºñ(Muti-purpose Atomic Force Microscope (AFM) System) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
MultiMode 8 |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 529È£
|
|
Àåºñ¸í |
32ä³Î ³úÆÄ ÃøÁ¤ ½Ã½ºÅÛ(32-Channel Electroencephalogram (EEG) Measurement System) |
Á¦ÀÛ»ç |
LAXTHA |
¸ðµ¨¸í |
LXE3232-RF |
¼³Ä¡Àå¼Ò |
Á¦4°øÇаü 005È£
|
|
Àåºñ¸í |
¼ºÇü»çÃâ±â(Injection Machine) |
Á¦ÀÛ»ç |
Battenfeld Kunststoffmaschinen |
¸ðµ¨¸í |
Microsystem 50 |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 006È£
|
|
Àåºñ¸í |
¼ºÇü»çÃâ±â(Injection Machine) |
Á¦ÀÛ»ç |
SUMITOMO HEAVY INDUSTRIES, LTD |
¸ðµ¨¸í |
SE50D |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 006È£
|
|
Àåºñ¸í |
¿Áß·®-½ÃÂ÷Áֻ翷®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC)) |
Á¦ÀÛ»ç |
Mettler Toledo |
¸ðµ¨¸í |
Mettler Toledo AG |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 206È£
|
|
Àåºñ¸í |
·¹ÀÌÀú À¯µµºØ±« ºÐ±¤±â(Laser-induced Breakdown Spectroscopy (LIBS)) |
Á¦ÀÛ»ç |
Applied Spectra |
¸ðµ¨¸í |
Aurora LIBS module |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 423È£
|
|
Àåºñ¸í |
»çÁß±ØÀÚ Áú·®ºÐ¼®±â(Quadrupole Mass Spectrometer) |
Á¦ÀÛ»ç |
HIDEN ANALYTICAL |
¸ðµ¨¸í |
HPR-20 |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 226È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
(ÁÖ)¼¼´ÏÁ¨ |
¸ðµ¨¸í |
Dionex Aquion IC system |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 228È£
|
|
Àåºñ¸í |
¼±Çü À̿ Ʈ·¦ Áú·®ºÐ¼®±â(Linear Ion Trap Mass Spectrometry) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
VELOS PRO |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 232È£
|
|
Àåºñ¸í |
´ëÇüÀý´Ü±â(Large Automatic Cut-off Machine) |
Á¦ÀÛ»ç |
Struers |
¸ðµ¨¸í |
Axitom-5 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 146-8È£
|
|
Àåºñ¸í |
Áý¼Ó À̿ºö(3Â÷¿ø-EBSD)(Focused Ion Beam (FIB; 3D-EBSD)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Quanta 3D FEG |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 150-2È£
|
|
Àåºñ¸í |
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
Ultra-55 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 154-6È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JSM-7100F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 154-6È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2100F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 161È£
|
|
Àåºñ¸í |
¸ÖƼ ½ºÄÉÀÏ ¹Ì¼¼±¸Á¶ ºÐ¼® ½Ã½ºÅÛ(Multi-scale Microstructure Analysis System) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
Neo-ARM |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 161È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JXA-8530F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 163È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-7900F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 163È£
|
|
Àåºñ¸í |
¹ß±¤ºÐ±¤ºÐ¼®±â(Optical Emission Spectrometer) |
Á¦ÀÛ»ç |
OBLF gmbh |
¸ðµ¨¸í |
OBLF QSN 750 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 171-3È£
|
|
Àåºñ¸í |
X-¼± Çü±¤ºÐ¼®±â(X-ray Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
S4 Pioneer |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 175-7È£
|
|
Àåºñ¸í |
X-¼± Çü±¤ºÐ¼®±â(X-ray Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
S8 Tiger |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 175-7È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP 6500 DUO |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 176È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Advance |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 180-2È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Advance - A25 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 180-2È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Advance |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 180-8È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
D8 Discover |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 184-8È£
|
|
Àåºñ¸í |
ºñƲ¸² ½ÃÇè±â(Tortion Tester) |
Á¦ÀÛ»ç |
ACE E&C,INC. |
¸ðµ¨¸í |
TRA-2K |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 242-4È£
|
|
Àåºñ¸í |
Áø°ø-°¡¾Ð ¿ëÇØ ¹× ¿¬¼ÓÁÖÁ¶ÀåÄ¡(Vacuum-over Pressure Continuous Casting Machine) |
Á¦ÀÛ»ç |
¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ |
¸ðµ¨¸í |
VCC 1000 (indutherm) |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 272È£
|
|
Àåºñ¸í |
TEM¿ë À̿¹иµ½Ã½ºÅÛ(Ion Milling System for Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
¢ßÁö¿¤ÄÚÆÛ·¹ÀÌ¼Ç |
¸ðµ¨¸í |
Gatan model 691 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 284È£
|
|
Àåºñ¸í |
Àç·á½ÃÇè±â(Advanced Indentation System) |
Á¦ÀÛ»ç |
(ÁÖ)ÇÁ·Ðƽ½º |
¸ðµ¨¸í |
AIS2000 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 312-4È£
|
|
Àåºñ¸í |
±Ý¼Ó ÆÇÀç ÀÎÀå¾ÐÃà½ÃÇè±â(Sheet Metal Deformation Simulator) |
Á¦ÀÛ»ç |
¢ß¾Ë¾Øºñ |
¸ðµ¨¸í |
RB319 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 312-4È£
|
|
Àåºñ¸í |
¿¿ªÇнùķ¹ÀÌÅÍ(Caster&Thermo-mechanical Simulator) |
Á¦ÀÛ»ç |
Fuji electronic Industrial |
¸ðµ¨¸í |
FTX-103HC-01 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
±¤ ÀÚ±â Ä¿ Çö¹Ì°æ(Magneto-Optical Kerr-Microscope) |
Á¦ÀÛ»ç |
Evico magnetics GmbH |
¸ðµ¨¸í |
Axio Imager D1m |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
½ºÆÛÅÍ / Áø°øÁõÂø ÀåÄ¡(Sputtering / Vacuum Deposition System) |
Á¦ÀÛ»ç |
¾ÆÀ̾¾Æ¼ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
Miniflex ¥± |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 380È£
|
|
Àåºñ¸í |
UV-vis/NIR ºÐ±¤±¤µµ°è(UV-vis/NIR Spectrometer) |
Á¦ÀÛ»ç |
SHIMADZU |
¸ðµ¨¸í |
UV-3600 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 472È£
|
|
Àåºñ¸í |
SOFC ´ÜÀüÁö Àå±â¼º´É Æò°¡ÀåÄ¡(Solid Oxide Fuel Cell (SOFC) Test Station) |
Á¦ÀÛ»ç |
³ª¶ó¼¿ÅØ(ÁÖ) |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
°í¼ÓÁÖÁ¶ ÁÖÆí ³Ã°¢ ¹× ÀÀ°í simulator(Simulator for Solidification and Cooling of a Slab during High Speed Continuous Casting) |
Á¦ÀÛ»ç |
¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
IET ¸ôµåÇ÷°½º ½Ã·á Á¦Á¶ ÀåÄ¡(High Frequency Induction Furnacer) |
Á¦ÀÛ»ç |
¿¤ÅØ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
½½·¡±×¿ëÇØ ¹× ³Ã°¢ÀåÄ¡(Slag Dissolution and Cooling System) |
Á¦ÀÛ»ç |
¸°Å×Å© |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
¿Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA)) |
Á¦ÀÛ»ç |
RUBOTHERM |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
MASTERSIZER 2000 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
¿Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA)) |
Á¦ÀÛ»ç |
RUBOTHERM |
¸ðµ¨¸í |
High Pressure TGA |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
À̵¿½Ä Áú·® ºÐ¼®±â(Mobile Bench-top Mass Spectrometer) |
Á¦ÀÛ»ç |
InProcess Instruments GmbH |
¸ðµ¨¸í |
GAM 400 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
¿Áß·®-½ÃÂ÷Áֻ翷®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC)) |
Á¦ÀÛ»ç |
Mettler Toledo |
¸ðµ¨¸í |
TGA/DSC1 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(High Frequency Induction Heater) |
Á¦ÀÛ»ç |
¿¤ÅØ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 580È£
|
|
Àåºñ¸í |
¿ëÇØ¿ë À¯µµ°¡¿ ÀåÄ¡(Induction Heating System for Melting) |
Á¦ÀÛ»ç |
PSTEK |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 584È£
|
|
Àåºñ¸í |
¿ø½ÉÁÖÁ¶±â(Sample Preparation Equipment) |
Á¦ÀÛ»ç |
linn high term gmbh |
¸ðµ¨¸í |
Lifumat-M-2000-7.7-VAC |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(Vacuum Induction Melting and Casting Furnace) |
Á¦ÀÛ»ç |
ALD Vacuum Technologies |
¸ðµ¨¸í |
VIM4 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
50Åæ ÇÁ·¹½º(Direct Drive Digital Servo-Press) |
Á¦ÀÛ»ç |
Hoden seimitsu kako kenkyusho |
¸ðµ¨¸í |
MPS8300DS |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
½Ç½Ã°£ X-¼± °Ë»ç±â(Realtime X-ray Inspection System) |
Á¦ÀÛ»ç |
¢ßÀÚºñ½º |
¸ðµ¨¸í |
X-Scan 7950 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
¸¶ÂûƯ¼º Æò°¡ÀåÄ¡(Friction Tester) |
Á¦ÀÛ»ç |
(À¯)Á¾·Î°úÇлó»ç |
¸ðµ¨¸í |
CR-FR-CH1 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
¿°£¾Ð¿¬±â(Pilot 4Hi-Hot Rolling Mill) |
Á¦ÀÛ»ç |
PTW sreel solution |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|
|
Àåºñ¸í |
¿ Áß·® ºÐ¼®±â+½ÃÂ÷ ÁÖ»ç ¿·®°è-Áú·® ºÐ¼®±â(TGA-DSC-MS SDT(Simultaneous DSC/TGA)-MS) |
Á¦ÀÛ»ç |
TA Instruments Korea |
¸ðµ¨¸í |
Discovery SDT 650 – Simultaneous DSC-TGA, Pfeiffer ThermoStar Quadrupole Mass Spectrometer |
¼³Ä¡Àå¼Ò |
ģȯ°æ¼ÒÀç´ëÇпø 184, 186È£
|
|
Àåºñ¸í |
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System) |
Á¦ÀÛ»ç |
(ÁÖ)¿ïÅØ |
¸ðµ¨¸í |
URS-100 |
¼³Ä¡Àå¼Ò |
Æ÷Ç×°¡¼Ó±â¿¬±¸¼Ò ÀúÀ帵µ¿ 118È£
|
|
Àåºñ¸í |
¸¶ÀÌÅ©·Î¹°¼º½ÃÇè±â(Micro-scale mechanical test system) |
Á¦ÀÛ»ç |
CellScale |
¸ðµ¨¸í |
MicrotesterG2 |
¼³Ä¡Àå¼Ò |
Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
|
|
Àåºñ¸í |
½Ç½Ã°£À¯ÀüÀÚÁõÆø±â PCR(Real-time PCR) |
Á¦ÀÛ»ç |
Thermo Fisher Scientific |
¸ðµ¨¸í |
QuantStudio5 |
¼³Ä¡Àå¼Ò |
Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
|
|
Àåºñ¸í |
3D ¹ÙÀÌ¿ÀÇÁ¸°ÅÍ(Extrusion-based 3D Bioprinter) |
Á¦ÀÛ»ç |
CELLINK |
¸ðµ¨¸í |
BIO X |
¼³Ä¡Àå¼Ò |
Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
|
|
Àåºñ¸í |
X-ray ÃøÁ¤½Ã½ºÅÛ(X-ray Measurement System) |
Á¦ÀÛ»ç |
¸ðµÎÅ×Å©³î·¯Áö, ¿ìÁ¤ÀÇ·á±â±â |
¸ðµ¨¸í |
Varian A272 |
¼³Ä¡Àå¼Ò |
dzµ¿µ¿ 108È£
|
|
Àåºñ¸í |
¸ÅÆ®¸¯½º º¸Á¶ ·¹ÀÌÀú Å»Âø ÀÌ¿ÂÈ Áú·®ºÐ¼®±â(Matrix Assisted Laser Desorption/Ionization Time-of-Flight (MALDI-TOF) Mass Spectrometer) |
Á¦ÀÛ»ç |
BRUKER |
¸ðµ¨¸í |
Autoflex Speed LRF |
¼³Ä¡Àå¼Ò |
ÈÇаü 112È£
|
|
Àåºñ¸í |
°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¼±Çü À̿ Ʈ·¦ Áú·® ºÐ¼®±â(HPLC dual-cell linear ion trap mass spectrometer (HPLC-ESI-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
LTQ Velos Pro |
¼³Ä¡Àå¼Ò |
ÈÇаü 112È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
-/5975C |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 103/104È£
|
|
Àåºñ¸í |
´ÙÁß°ËÃâ À¯µµ°áÇÕÇöóÁ Áú·®ºÐ¼®±â(Multi-Collector Inductively Coupled Plasma Mass Spectrometer (MC-ICP-MS)) |
Á¦ÀÛ»ç |
Nu Instruments Ltd |
¸ðµ¨¸í |
Plasma 3 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 105È£
|
|
Àåºñ¸í |
Áú·®ºÐ¼®±â(Mass Spectrometer) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JMS-800D |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 106È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP 7400 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 106È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
PANalytical B.V. |
¸ðµ¨¸í |
X¢¥Pert PRO MPO |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 109È£
|
|
Àåºñ¸í |
ÈÇÐÈíÂø·®ºÐ¼®±â(Chemisorption Analyzer) |
Á¦ÀÛ»ç |
micromeritics |
¸ðµ¨¸í |
Autochem II 2920 chemisorption analyzer |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 110È£
|
|
Àåºñ¸í |
°í¾Ð¿ë ºÎÇÇ½Ä ÈíÂøÀåºñ ¼ö¼Ò¿¡³ÊÁö ÀúÀå·® ÃøÁ¤ ÀÚµ¿È Àåºñ(Volumetric Sorption Measurement System) |
Á¦ÀÛ»ç |
Setaram |
¸ðµ¨¸í |
PCT Pro |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 110È£
|
|
Àåºñ¸í |
¿°±â¼¿ºÐ¼®±â(Ion Personal Genome Machine) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Ion Personal Genome Machine (PGM) System |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 206-1È£
|
|
Àåºñ¸í |
¾ÈÁ¤ µ¿À§¿ø¼Ò ºñÀ² Áú·® ºÐ¼®±â(Stable Isotope Ratio Mass Spectrometer) |
Á¦ÀÛ»ç |
Isoprime |
¸ðµ¨¸í |
IsoPrime 100 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 206-2È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890B/- |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 207È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Metrohm |
¸ðµ¨¸í |
790 Personal IC |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 230È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Dionex |
¸ðµ¨¸í |
ICS-2100 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 302È£
|
|
Àåºñ¸í |
±¤ ¿¡³ÊÁö Àüȯ·ü ÃøÁ¤±â(Incident Photon-to-electron Conversion Efficiency (IPCE) System) |
Á¦ÀÛ»ç |
NEWPORT |
¸ðµ¨¸í |
Newport 74125 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 302È£
|
|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Nicolet iS50 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 302È£
|
|
Àåºñ¸í |
¸ÅÆ®¸¯½º º¸Á¶ ·¹ÀÌÀú Å»Âø ÀÌ¿ÂÈ Áú·®ºÐ¼®±â(Matrix Assisted Laser Desorption/Ionization Time-of-Flight (MALDI-TOF) Mass Spectrometer) |
Á¦ÀÛ»ç |
Bruker |
¸ðµ¨¸í |
Autoflex Max LRF |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 320È£
|
|
Àåºñ¸í |
¿Áß·®-½ÃÂ÷Áֻ翷®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC)) |
Á¦ÀÛ»ç |
TA Instruments |
¸ðµ¨¸í |
SDT Q600 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 322È£
|
|
Àåºñ¸í |
¸¶ÀÌÅ©·ÎÇ÷¹ÀÌÆ® ¸®´õ(Multi-detection Microplate Reader) |
Á¦ÀÛ»ç |
Hidex Oy |
¸ðµ¨¸í |
Hidex Sense |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 327È£
|
|
Àåºñ¸í |
TFF ½Ã½ºÅÛ(Tangential Flow Filtration (TFF) System) |
Á¦ÀÛ»ç |
MERCK |
¸ðµ¨¸í |
Cogent M1 TFF System |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 331È£
|
|
Àåºñ¸í |
ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Dionex ICS-5000 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 331È£
|
|
Àåºñ¸í |
À¯Ã¼È帧Á¤Áö ºÐ±¤±¤µµ°è(Stopped-flow Spectrometer) |
Á¦ÀÛ»ç |
AppliedPhotophysics |
¸ðµ¨¸í |
SX20 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 334È£
|
|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Spectrum Two |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 403È£
|
|
Àåºñ¸í |
±â°øµµ ºÐ¼®±â(Brunauer-Emmett-Teller (BET) & Pore Analyzer) |
Á¦ÀÛ»ç |
micromeritics |
¸ðµ¨¸í |
ASAP 2020 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 412È£
|
|
Àåºñ¸í |
ÈÇÐÈíÂøºÐ¼®±â(Temperature Programed Reduction/Desorption (TPR/TPD) Chemisorption Analyzer) |
Á¦ÀÛ»ç |
micromeritics |
¸ðµ¨¸í |
AutoChem II |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 412È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Techonologies |
¸ðµ¨¸í |
7890B/5977B |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 412È£
|
|
Àåºñ¸í |
ÇÙ»ê ÃßÃâ±â(Auto Nucleic Acid Preparation System) |
Á¦ÀÛ»ç |
Precision System Science |
¸ðµ¨¸í |
Magtration System 12GC |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 414È£
|
|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Nicolet 6700 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 417È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Dionex |
¸ðµ¨¸í |
ICS-1100 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 417È£
|
|
Àåºñ¸í |
X-¼± ȸÀýºÐ¼®±â(X-ray Diffractometer) |
Á¦ÀÛ»ç |
Rigaku |
¸ðµ¨¸í |
Ultima IV |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 420È£
|
|
Àåºñ¸í |
»çÁß±ØÀÚ Áú·®ºÐ¼®±â(Quadrupole Mass Spectrometer) |
Á¦ÀÛ»ç |
HIDEN ANALYTICAL |
¸ðµ¨¸í |
HPR-20 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
|
|
Àåºñ¸í |
ÈÇÐÈíÂø·®ºÐ¼®±â(Chemisorption Analyzer) |
Á¦ÀÛ»ç |
MicrotracBEL Corp. |
¸ðµ¨¸í |
BELCAT ¥± |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
|
|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Nicolet iS50 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
|
|
Àåºñ¸í |
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Nicolet iS20 |
¼³Ä¡Àå¼Ò |
ȯ°æ°øÇе¿ 431È£
|