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Atomic Layer Deposition (ALD) |
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QUROS |
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Plus 200 |
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Standard process : Al2O3, HfO2, TiN
Process Temperature : 100 ~ 300¡É
Precusor : TMA, TEMAHf, TEMATi (UPChem)
Wafer size : up to 8inch wafer
Gases : Ar, O2, NH3, N2, H2 |
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Al2O3 : high-k material for different semiconductor devices growing thin, conformal, pinhole-free films with featureless microstructure and low stress(in OLED) effective field-effect passivatio(in solar)
HfO2 : the dielectric constant of HfO2 is 4-6 times higher than that of SiO2
TiN : high thermodynamic stability, high corrosion resistance, low friction constant, low electrical resitivity, and high mechanical conductor |
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054-279-0267 |
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¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM)) |
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Park Systems |
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XE7 |
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C5 228È£
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ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System) |
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OBT-PC300 |
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C5 329È£
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ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
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GPPA-A377 |
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C5 329È£
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¿ø·á ÁõÂø ½Ã½ºÅÛ(Materials Deposition System with Piezoelectric Inkjet Catridge) |
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FUJIFILM |
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Dimatix DMP-2850 |
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C5 329È£
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ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System) |
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Specialty Coating Systems (SCS) - A KISCO Company |
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PDS Labcoter 2 (PDS 2010 LABCOTER) |
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C5 720-1È£
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Park Systems |
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XE7 |
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¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD)) |
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CN1 |
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Atomic-Basic |
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¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM)) |
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¿øÀÚ Èí¼ö ºÐ±¤±â(Atomic Absorption Spectrometer (AAS)) |
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Analytik Jena |
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contrAA 800 |
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¿ ÈÇÐ ±â»ó ÁõÂø ÀåÄ¡(Thermal Chemical Vapor Deposition (CVD) System) |
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SNTEK |
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TCS5000 |
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ÇöóÁ ¿øÀÚÃþ ÁõÂø ½Ã½ºÅÛ(Plasma Enhanced Atomic Layer Deposition (PE-ALD) System) |
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ForALL |
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OZONE |
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HIGGSLAB |
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PLD SYSTEM |
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ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
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COHERENT |
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COMPex Pro 102 F |
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X-¼±±¤ÀüÀںб¤ºÐ¼®±â(XPS xonnectable Deposition system) |
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ULVAC-PHI, Inc. |
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PHI GENESIS Multi-tech Scanning XPS |
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Veeco |
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Dimension 3100 |
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À¯±â¹° ÁõÂø±â(Organic Molecular Beam Deposition (OMBD) & Thermal Evaporator) |
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OMBD & Thermal |
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±Ý¼Ó À¯±â¹° ÈÇбâ»óÁõÂø ½Ã½ºÅÛ(Metalorganic Chemical Vapor Deposition (MOVCD) System) |
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Jusung Eng. |
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Eureka 2000 |
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BJM100 |
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ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
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UF-CVD 200 |
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Watkins Johnson |
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WJ-1000T |
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ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
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BMR Technology Co. |
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TELIA200 |
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Korea Vacuum Tech |
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KVPED-T0583 |
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Bruker |
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MultiMode 8 |
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¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM)) |
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SEIKO INSTRUMENTS INC. |
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SPI3800N Pro |
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