±âº»Á¤º¸ |
¼³ºñ¹øÈ£ |
10112243 |
Àåºñ¸í(ÇѱÛ) |
Áø°øÇÁ·Îºê½ºÅ×À̼Ç
|
Àåºñ¸í(¿µ¹®) |
Vacuum Chamber Probe Station |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
M6VC |
»ó¼¼Á¤º¸ |
Àåºñ»ç¾ç |
Vacuum Chamber Probe Station is the equipment where output data may be obtained by controlling and measruing. All situations with software while changing the conditions such as temperature, fiber, gas, bend stage, vacuum carrier magnet carrier, etc. by a given amount for all measurement system (IV, CV, RF, impedance, magnet) and vacuum situations. Also, customized expansion is possible with additional attachment. |
Ȱ¿ëºÐ¾ß |
Vacuum Chamber Probe |
Àåºñ¿î¿µÀη |
¼³Ä¡Àå¼Ò |
C5 330È£
|
¼Ò¼Ó |
âÀÇITÀ¶ÇÕ°øÇаú |
¼º¸í |
±èÀçÁØ |
ÀüÈ |
054-279-8861 |
À̸ÞÀÏ |
jaejoon@postech.ac.kr |
µ¿ÀÏ/À¯»çÀåºñÁ¤º¸ |
Àåºñ¸í |
(GLOCAL)°ø°£ Àü»çü Žħ À̵¿ ÀåÄ¡(in situ probe transfer for Spantial transcriptome analysis ) |
Á¦ÀÛ»ç |
10xGENOMICS |
¸ðµ¨¸í |
Visium CytAssist |
¼³Ä¡Àå¼Ò |
BOIC [3311È£]
|
|
Àåºñ¸í |
¿þÀÌÆÛºÐ¼® ÇÁ·Îºê ½ºÅ×À̼Ç(Wafer Prober) |
Á¦ÀÛ»ç |
Cascade Microtech |
¸ðµ¨¸í |
Summit 11000 |
¼³Ä¡Àå¼Ò |
C5 330È£
|
|
Àåºñ¸í |
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
MST8000 |
¼³Ä¡Àå¼Ò |
C5 332È£
|
|
Àåºñ¸í |
ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station) |
Á¦ÀÛ»ç |
The Micromanipulator Company |
¸ðµ¨¸í |
No. 6000 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 110È£
|
|
Àåºñ¸í |
ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station) |
Á¦ÀÛ»ç |
The Micromanipulator Company |
¸ðµ¨¸í |
No. 7100 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 202È£
|
|
Àåºñ¸í |
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station) |
Á¦ÀÛ»ç |
UNITEK CORPORATION |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 212È£
|
|
Àåºñ¸í |
´ë±âÁ¶Àý¹è¾çÀÛ¾÷´ë(Modular Atmosphere Control Workstation System) |
Á¦ÀÛ»ç |
Don Whitley Scientific |
¸ðµ¨¸í |
Don Whitley Scientific A55 |
¼³Ä¡Àå¼Ò |
PBC 362È£
|
|
Àåºñ¸í |
X-¼± ±¤ÀüÀÚ ºÐ±¤±â(X-ray Photoelectron Spectrometer (XPS) Microprobe) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
ESCALAB 250 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1153È£
|
|
Àåºñ¸í |
ÁÖ»çÇü ¿ÀÁ¦ ÀüÀÚÇö¹Ì°æ(Scanning Auger Electron Spectroscopy (AES) Nanoprobe) |
Á¦ÀÛ»ç |
ULVAC-PHI |
¸ðµ¨¸í |
PHI 700 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1163È£
|
|
Àåºñ¸í |
ÀüÀÚ¼± ¹Ì¼ÒºÎ ºÐ¼®±â(Electron Probe Microanalyzer (EPMA)) |
Á¦ÀÛ»ç |
SHIMADZU |
¸ðµ¨¸í |
EPMA-1600 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1194È£
|
|
Àåºñ¸í |
°íÁø°ø Ä«º» ÁõÂø±â(High Vacuum Carbon Coater) |
Á¦ÀÛ»ç |
Cressington |
¸ðµ¨¸í |
208carbon |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1198È£
|
|
Àåºñ¸í |
°¡¿/³Ã°¢ è¹ö(Heating/Cooling Chamber) |
Á¦ÀÛ»ç |
JEIO TECH |
¸ðµ¨¸í |
K-Series ID CHAMBER |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3009È£
|
|
Àåºñ¸í |
º¹ÇÕ »çÀÌŬ ½ÃÇè±â(Cyclic Corrosion Test Chamber) |
Á¦ÀÛ»ç |
Ascott Analytical |
¸ðµ¨¸í |
CC1000iP |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3016È£
|
|
Àåºñ¸í |
Áø°ø è¹ö Á¤¹Ð ºÐ¼® Àåºñ(Vacuum Chamber I-V Probing System) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
MST5000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3102È£
|
|
Àåºñ¸í |
Áø°ø¹è¾ç±â(Vacuum Chamber & Frame) |
Á¦ÀÛ»ç |
SNTEK |
¸ðµ¨¸í |
SPR-5004 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3147È£
|
|
Àåºñ¸í |
¹ü¿ë ÇÁ·Îºê ½Ã½ºÅÛ(Universal Measurement Probe System) |
Á¦ÀÛ»ç |
TERALEADER |
¸ðµ¨¸í |
UMP100 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3170È£
|
|
Àåºñ¸í |
Áø°ø ¿ÁõÂø ½Ã½ºÅÛ(Vacuum Thermal Evaporating System) |
Á¦ÀÛ»ç |
WOOSUNG HI-VAC |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3363È£
|
|
Àåºñ¸í |
3D ¿øÀÚÇö¹Ì°æ(3D Atom Probe) |
Á¦ÀÛ»ç |
CAMECA Instruments |
¸ðµ¨¸í |
LA-WATAP |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-2È£
|
|
Àåºñ¸í |
±¹¼Ò ·¹ÀÌÁ® Àü°èÇü ¿øÀÚ´ÜÃþÇö¹Ì°æ(Local Electrode Atom Probe) |
Á¦ÀÛ»ç |
CAMECA Instruments |
¸ðµ¨¸í |
LEAP 4000X HR |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-3È£
|
|
Àåºñ¸í |
ÃʰíÁø°øÀú¿Â ÁÖ»çÅͳθµÇö¹Ì°æ(Ultra High Vacuum Low Temperature Scanning Tunneling Microscopy (STM)) |
Á¦ÀÛ»ç |
Unisoku |
¸ðµ¨¸í |
USM 1200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 101È£
|
|
Àåºñ¸í |
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas)) |
Á¦ÀÛ»ç |
ATIS |
¸ðµ¨¸í |
Manual Wet Station |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas)) |
Á¦ÀÛ»ç |
ATIS |
¸ðµ¨¸í |
Manual Wet Station |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
Á֯ļöÃøÁ¤±â(Universal Probe Holder) |
Á¦ÀÛ»ç |
MBRAUN |
¸ðµ¨¸í |
MB6000 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½À½Ä ¼¼Á¤ÀåÄ¡(Wet Station (Acid)) |
Á¦ÀÛ»ç |
High Integrated Technology (HIT) |
¸ðµ¨¸í |
HWC-MCP |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½ÃÆ® ÀúÇ× ÃøÁ¤ ½Ã½ºÅÛ(4 Point Probe) |
Á¦ÀÛ»ç |
(ÁÖ)¿¡À̾ÆÀÌÆ¼ |
¸ðµ¨¸í |
CMT-SR2000N |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÁÖ»ç ÇÁ·Îºê Çö¹Ì°æ(Scanning Probe Microscope (SPM)) |
Á¦ÀÛ»ç |
Veeco |
¸ðµ¨¸í |
Dimension 3100 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
³ª³ë½Ã½º SPM Á¶Àý ½Ã½ºÅÛ(Nanonis Scanning Probe Microscopy (SPM) Control System) |
Á¦ÀÛ»ç |
SPECS |
¸ðµ¨¸í |
SPECS Nanonis Controller |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 008È£
|
|
Àåºñ¸í |
Áø°øÁÖÁ¶±â(Vacuum Casting Machine) |
Á¦ÀÛ»ç |
¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ |
¸ðµ¨¸í |
MC100V |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 272È£
|
|
Àåºñ¸í |
Áø°ø-°¡¾Ð ¿ëÇØ ¹× ¿¬¼ÓÁÖÁ¶ÀåÄ¡(Vacuum-over Pressure Continuous Casting Machine) |
Á¦ÀÛ»ç |
¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ |
¸ðµ¨¸í |
VCC 1000 (indutherm) |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 272È£
|
|
Àåºñ¸í |
Áø°ø ¿ëÇØÀåÄ¡(Vaccum Chamber) |
Á¦ÀÛ»ç |
¿¡À̽ºÀ̾ؾ¾ ÁÖ½Äȸ»ç |
¸ðµ¨¸í |
Ace-VIM-001 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
½ºÆÛÅÍ / Áø°øÁõÂø ÀåÄ¡(Sputtering / Vacuum Deposition System) |
Á¦ÀÛ»ç |
¾ÆÀ̾¾Æ¼ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
°íÁø°ø·Î(High Vacuum Furnace) |
Á¦ÀÛ»ç |
¿¡ÀÌÆ¼¿¡ÇÁ(ATF) |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 380È£
|
|
Àåºñ¸í |
Áø°ø/ºÐÀ§±â ¿Ã³¸® ÀåÄ¡(Vacuum Chamber) |
Á¦ÀÛ»ç |
¢ßÁö´Ï¾ÆÅØ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 380È£
|
|
Àåºñ¸í |
SOFC ´ÜÀüÁö Àå±â¼º´É Æò°¡ÀåÄ¡(Solid Oxide Fuel Cell (SOFC) Test Station) |
Á¦ÀÛ»ç |
³ª¶ó¼¿ÅØ(ÁÖ) |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(Vacuum Induction Melting and Casting Furnace) |
Á¦ÀÛ»ç |
ALD Vacuum Technologies |
¸ðµ¨¸í |
VIM4 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø ´ëÇü½ÇÇ赿
|