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10074089 |
Àåºñ¸í(ÇѱÛ) |
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Àåºñ¸í(¿µ¹®) |
Secondary Ion Mass Spectrometry (SIMS) |
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CAMECA Instruments |
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IMS 6F |
»ó¼¼Á¤º¸ |
Àåºñ»ç¾ç |
O2 primary ion at 1keV DUO(+3kV)/Secondary(+2kV) without Oxygen flooding/ Cs
Boron deta layer in Si 50nm(1.9nm/e)
Sputter rate 3nm/min |
Ȱ¿ëºÐ¾ß |
Áú·®ºÐ¼®±â¸¦ ÅëÇØ ½ÃÆí¿¡¼ Æ¢¾î³ª¿Â ÀÌÂ÷ÀÌ¿ÂÀÇ ¿ø¼ÒÀÇ Á¤º¸ µ¿¼Òü ȤÀº ºÐÀÚÀÇ Á¶¼º µîÀ» ppb ´ÜÀ§±îÁö ºÐ¼®
(¨ç mass spectrum, ¨è depth profile, ¨é image scan) |
Àåºñ¿î¿µÀη |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105È£
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±ÇÁ¤Çö |
ÀüÈ |
054-279-0289 |
À̸ÞÀÏ |
jhkwon87@postech.ac.kr |
µ¿ÀÏ/À¯»çÀåºñÁ¤º¸ |
Àåºñ¸í |
[±Û·ÎÄÃ] ÆÄ¿ö·¦¾¾ µðÁöÅÐ µ¥ÀÌÅÍ ¼öÁý ½Ã½ºÅÛ([Glocal] PowerLab C Digital Data Collection System) |
Á¦ÀÛ»ç |
(ÁÖ)¶óÀÌÇÁÅØ |
¸ðµ¨¸í |
PowerLab C |
¼³Ä¡Àå¼Ò |
206È£
|
|
Àåºñ¸í |
(GLOCAL)¾×üũ·Î¸¶Åä±×·¡ÇÇ »ï´Ü»çÁß±ØÀÚ Áú·®ºÐ¼®±â(Liquid Chromatography-Triple Quadrupole Mass Spectrometry) |
Á¦ÀÛ»ç |
Waters |
¸ðµ¨¸í |
Xevo Absolute system |
¼³Ä¡Àå¼Ò |
3308È£
|
|
Àåºñ¸í |
Áú·®ºÐ¼®±â°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¿ÀºñÆ®·¦Áú·®ºÐ¼®±â(High-performance Liquid Chromatography – Mass) |
Á¦ÀÛ»ç |
Perkin Elmer |
¸ðµ¨¸í |
Qsight220 |
¼³Ä¡Àå¼Ò |
BOIC 4307È£
|
|
Àåºñ¸í |
Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷)) |
Á¦ÀÛ»ç |
Merck Millipore |
¸ðµ¨¸í |
Milli-Q¢ç IQ 7015 |
¼³Ä¡Àå¼Ò |
BOIC [3307È£]
|
|
Àåºñ¸í |
Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷)) |
Á¦ÀÛ»ç |
Merck Millipore |
¸ðµ¨¸í |
Milli-Q¢ç Q-POD¢ç |
¼³Ä¡Àå¼Ò |
BOIC [4313È£]
|
|
Àåºñ¸í |
°í¼Ó ó¸®Çü±¤ ³ª³ëÀε§Å×ÀÌ¼Ç (Nanoindentation ) |
Á¦ÀÛ»ç |
OPTIC11 LIFE |
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Pavone |
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C5
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|
Àåºñ¸í |
´ë¿ë·® Â÷¼¼´ë¿°±â¼¿ºÐ¼® ½Ã½ºÅÛ(Next-Generation Sequencing system) |
Á¦ÀÛ»ç |
Illumina |
¸ðµ¨¸í |
NextSeq1000 |
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C5
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|
Àåºñ¸í |
ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System) |
Á¦ÀÛ»ç |
¿À¹æÅ×Å©³î·ÎÁö |
¸ðµ¨¸í |
OBT-PC300 |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
Á¦ÀÛ»ç |
ÇѺû·¹ÀÌÀú |
¸ðµ¨¸í |
GPPA-A377 |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System) |
Á¦ÀÛ»ç |
MUSASHI ENGINEERING, INC. |
¸ðµ¨¸í |
IMAGE MASTER 350PC SMART/SHOTMASTER 300QX |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
¿ø·á ÁõÂø ½Ã½ºÅÛ(Materials Deposition System with Piezoelectric Inkjet Catridge) |
Á¦ÀÛ»ç |
FUJIFILM |
¸ðµ¨¸í |
Dimatix DMP-2850 |
¼³Ä¡Àå¼Ò |
C5 329È£
|
|
Àåºñ¸í |
Áø°øÇÁ·Îºê½ºÅ×À̼Ç(Vacuum Chamber Probe Station) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
M6VC |
¼³Ä¡Àå¼Ò |
C5 330È£
|
|
Àåºñ¸í |
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station) |
Á¦ÀÛ»ç |
MS TECH |
¸ðµ¨¸í |
MST8000 |
¼³Ä¡Àå¼Ò |
C5 332È£
|
|
Àåºñ¸í |
ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System) |
Á¦ÀÛ»ç |
Specialty Coating Systems (SCS) - A KISCO Company |
¸ðµ¨¸í |
PDS Labcoter 2 (PDS 2010 LABCOTER) |
¼³Ä¡Àå¼Ò |
C5 720-1È£
|
|
Àåºñ¸í |
ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station) |
Á¦ÀÛ»ç |
The Micromanipulator Company |
¸ðµ¨¸í |
No. 6000 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 110È£
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|
Àåºñ¸í |
ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station) |
Á¦ÀÛ»ç |
The Micromanipulator Company |
¸ðµ¨¸í |
No. 7100 |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 202È£
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|
Àåºñ¸í |
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station) |
Á¦ÀÛ»ç |
UNITEK CORPORATION |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
LG¿¬±¸µ¿ 212È£
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|
Àåºñ¸í |
´ë±âÁ¶Àý¹è¾çÀÛ¾÷´ë(Modular Atmosphere Control Workstation System) |
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Don Whitley Scientific |
¸ðµ¨¸í |
Don Whitley Scientific A55 |
¼³Ä¡Àå¼Ò |
PBC 362È£
|
|
Àåºñ¸í |
¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD)) |
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CN1 |
¸ðµ¨¸í |
Atomic-Basic |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1139È£
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|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
GeminiSEM 500 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1153È£
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|
Àåºñ¸í |
À̿ ¹Ð¸µ ½Ã½ºÅÛ(Cross Section Planar Ion Milling System) |
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GATAN |
¸ðµ¨¸í |
Ilion+II Model 697 |
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RIST1µ¿ 1162È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
AURIGA |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1163È£
|
|
Àåºñ¸í |
Áý¼Ó À̿ºö(Focused Ion Beam (FIB)) |
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SII |
¸ðµ¨¸í |
SMI3050SE |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1169È£
|
|
Àåºñ¸í |
¼öÂ÷º¸Á¤ ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs-Corrected Scanning Transmission Electron Microscope (Cs-STEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-ARM200F |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1176È£
|
|
Àåºñ¸í |
Àü°è¹æÃâ Çö¹Ì°æ(Field Emission Electron Microscope) |
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JEOL |
¸ðµ¨¸í |
JEM-2100F |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1188È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JSM-7600F |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1192È£
|
|
Àåºñ¸í |
À̿ ºö ¹Ð¸µ ½Ã½ºÅÛ(Triple Ion Beam Miller) |
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Leica Microsystems |
¸ðµ¨¸í |
EM TIC020 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1196È£
|
|
Àåºñ¸í |
°¡½ººÎ½Ä½ÃÇè±â(Gas Corrosion Test Instrument) |
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SUGA |
¸ðµ¨¸í |
GT-100 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1272È£
|
|
Àåºñ¸í |
±Û·Î¿ì ¹æÀü Áú·®ºÐ¼®±â(Glow Discharge Mass Spectrometry (GD-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
ELEMENT GD |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1302È£
|
|
Àåºñ¸í |
°íºÐÇØ´É À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(High Resolution Inductively Coupled Plasma Mass Spectrometer (HR-ICP-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
ELEMENT XR |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1304È£
|
|
Àåºñ¸í |
·¹ÀÌÀú À¯µµ ÇöóÁ ºÐ±¤ºÐ¼®±â(Tandem Laser-ablation Laser-induced Breakdown Spectrometer (LA-LIBS)) |
Á¦ÀÛ»ç |
Applied Spectra |
¸ðµ¨¸í |
J200 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1306È£
|
|
Àåºñ¸í |
»ïÁß »ç±ØÀÚ À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(Triple Quadrupole Inductively Coupled Plasma Mass Spectrometer (TQ-ICP-MS)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP TQ |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1306È£
|
|
Àåºñ¸í |
±âü Å©·Î¸¶Åä±×·¡ÇÁ Áú·®ºÐ¼®±â(Gas Chromatograph-Mass Spectrometer (GC-MS)) |
Á¦ÀÛ»ç |
SHIMADZU |
¸ðµ¨¸í |
GCMS-QP2010 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1308È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
AMETEK |
¸ðµ¨¸í |
Spectro Arcos |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1309È£
|
|
Àåºñ¸í |
¿øÀÚ Èí¼ö ºÐ±¤±â(Atomic Absorption Spectrometer (AAS)) |
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Analytik Jena |
¸ðµ¨¸í |
contrAA 800 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1309È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Optima 8300 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1311È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP 7000 Series |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1311È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
AMETEK |
¸ðµ¨¸í |
Spectro Arcos |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1311È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890B/5977A |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1314È£
|
|
Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
Á¦ÀÛ»ç |
Agilent Technologies |
¸ðµ¨¸í |
7890B/5977B |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1314È£
|
|
Àåºñ¸í |
¿Å»Âø ÃøÁ¤ ½Ã½ºÅÛ(Thermal Desorption System) |
Á¦ÀÛ»ç |
Markes International |
¸ðµ¨¸í |
UNITY2 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1317È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Nittoseiko Analytech |
¸ðµ¨¸í |
AQF-2100H |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1318È£
|
|
Àåºñ¸í |
ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
Dionex ICS-5000 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1320È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
MASTERSIZER 2000 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1320È£
|
|
Àåºñ¸í |
¸¶ÀÌÅ©·ÎÆÄ ½Ã·á ºÐÇØ ½Ã½ºÅÛ(Advanced Microwave Digestion System) |
Á¦ÀÛ»ç |
Milestone |
¸ðµ¨¸í |
ETHOS 1 |
¼³Ä¡Àå¼Ò |
RIST1µ¿ 1334È£
|
|
Àåºñ¸í |
º¹ÇÕ ºÎ½Ä ½ÃÇè±â(Cyclic Corrosion Tester) |
Á¦ÀÛ»ç |
Q-LAB |
¸ðµ¨¸í |
Q-FOG CCT 1100 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3011È£
|
|
Àåºñ¸í |
º¹ÇÕ »çÀÌŬ ½ÃÇè±â(Cyclic Corrosion Test Chamber) |
Á¦ÀÛ»ç |
Ascott Analytical |
¸ðµ¨¸í |
CC1000iP |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3016È£
|
|
Àåºñ¸í |
º¹ÇÕ ºÎ½Ä ½ÃÇè±â(Cyclic Corrosion Tester) |
Á¦ÀÛ»ç |
Q-LAB |
¸ðµ¨¸í |
Q-FOG CCT 1100 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3016È£
|
|
Àåºñ¸í |
¿ ÈÇÐ ±â»ó ÁõÂø ÀåÄ¡(Thermal Chemical Vapor Deposition (CVD) System) |
Á¦ÀÛ»ç |
SNTEK |
¸ðµ¨¸í |
TCS5000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3104È£
|
|
Àåºñ¸í |
Á¤¹ÐÀÚµ¿Àý´Ü±â(Linear Precision Saw) |
Á¦ÀÛ»ç |
BUEHLER |
¸ðµ¨¸í |
ISOMET4000 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3132È£
|
|
Àåºñ¸í |
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System) |
Á¦ÀÛ»ç |
Roche |
¸ðµ¨¸í |
LightCycler96 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3153È£
|
|
Àåºñ¸í |
PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System) |
Á¦ÀÛ»ç |
MUSASHI ENGINEERING, INC. |
¸ðµ¨¸í |
IMAGE MASTER 350PC SMART/SHOTMASTER 300DS-S |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3170È£
|
|
Àåºñ¸í |
3D º¯ÇüÃøÁ¤½Ã½ºÅÛ(3D Deformation Analysis System) |
Á¦ÀÛ»ç |
GOM international AG |
¸ðµ¨¸í |
ARAMIS 12M |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3188È£
|
|
Àåºñ¸í |
ÁÖ»ç Åõ°ú ÀüÀÚÇö¹Ì°æ(Scanning Transmission Electron Microscope (STEM)) |
Á¦ÀÛ»ç |
COXEM |
¸ðµ¨¸í |
CX-200 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3188È£
|
|
Àåºñ¸í |
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System) |
Á¦ÀÛ»ç |
SNTEK |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3219È£
|
|
Àåºñ¸í |
ÇöóÁ ¿øÀÚÃþ ÁõÂø ½Ã½ºÅÛ(Plasma Enhanced Atomic Layer Deposition (PE-ALD) System) |
Á¦ÀÛ»ç |
ForALL |
¸ðµ¨¸í |
OZONE |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3223È£
|
|
Àåºñ¸í |
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
Á¦ÀÛ»ç |
HIGGSLAB |
¸ðµ¨¸í |
PLD SYSTEM |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3263È£
|
|
Àåºñ¸í |
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System) |
Á¦ÀÛ»ç |
COHERENT |
¸ðµ¨¸í |
COMPex Pro 102 F |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3282È£
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|
Àåºñ¸í |
GPC ½Ã½ºÅÛ(Gel Permeation Chromatography (GPC) System) |
Á¦ÀÛ»ç |
Waters |
¸ðµ¨¸í |
1525/2414/410 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3312È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System) |
Á¦ÀÛ»ç |
KEITHLEY Instruments |
¸ðµ¨¸í |
4200 |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3340È£
|
|
Àåºñ¸í |
X-¼±±¤ÀüÀںб¤ºÐ¼®±â(XPS xonnectable Deposition system) |
Á¦ÀÛ»ç |
ULVAC-PHI, Inc. |
¸ðµ¨¸í |
PHI GENESIS Multi-tech Scanning XPS |
¼³Ä¡Àå¼Ò |
RIST3µ¿ 3360/3362È£
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|
Àåºñ¸í |
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System) |
Á¦ÀÛ»ç |
Roche |
¸ðµ¨¸í |
LightCycler480 |
¼³Ä¡Àå¼Ò |
°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
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|
Àåºñ¸í |
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Nanolab G3 CX |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-4È£
|
|
Àåºñ¸í |
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Helios 600 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
|
|
Àåºñ¸í |
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Helios 650 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
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|
Àåºñ¸í |
°¡½º Èñ¼® ½Ã½ºÅÛ(Computerized Gas Dilution System) |
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Environics |
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Series 4040 |
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
|
|
Àåºñ¸í |
±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope
(Cs-corrected HR-STEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2200FS |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø TEM-2200FS½Ç
|
|
Àåºñ¸í |
À̿¿¬¸¶±â(Ion Milling System) |
Á¦ÀÛ»ç |
GL CORPORATION |
¸ðµ¨¸í |
PIPS1 691 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
|
|
Àåºñ¸í |
Àú¿¡³ÊÁö À̿ ¿¬¸¶±â(Gentle Mill (Low Energy Ion Milling System)) |
Á¦ÀÛ»ç |
TechnoOrg Linda |
¸ðµ¨¸í |
IV5 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
LEO Elektronrnmikroskopie GmbH |
¸ðµ¨¸í |
FE-SEM |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
À¯±â¹° ÁõÂø±â(Organic Molecular Beam Deposition (OMBD) & Thermal Evaporator) |
Á¦ÀÛ»ç |
alpha-plus |
¸ðµ¨¸í |
OMBD & Thermal |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas)) |
Á¦ÀÛ»ç |
ATIS |
¸ðµ¨¸í |
Manual Wet Station |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas)) |
Á¦ÀÛ»ç |
ATIS |
¸ðµ¨¸í |
Manual Wet Station |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
±Ý¼Ó À¯±â¹° ÈÇбâ»óÁõÂø ½Ã½ºÅÛ(Metalorganic Chemical Vapor Deposition (MOVCD) System) |
Á¦ÀÛ»ç |
Jusung Eng. |
¸ðµ¨¸í |
Eureka 2000 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD)) |
Á¦ÀÛ»ç |
QUROS |
¸ðµ¨¸í |
Plus 200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÀÓ°èÄ¡¼ö ÃøÁ¤ ÁÖ»çÀüÀÚÇö¹Ì°æ(Critical Dimension Scanning Electron Microscope (CD-SEM)) |
Á¦ÀÛ»ç |
HITACHI |
¸ðµ¨¸í |
S-9380 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½À½Ä ¼¼Á¤ÀåÄ¡(Wet Station (Acid)) |
Á¦ÀÛ»ç |
High Integrated Technology (HIT) |
¸ðµ¨¸í |
HWC-MCP |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
Àú¾Ð ÈÇÐÁõÂøÀåÄ¡(ÆÛ´Ï½º ŸÀÔ)(Low Pressure Chemical Vapor Deposition (LP-CVD; Furnace Type)) |
Á¦ÀÛ»ç |
(ÁÖ)À¯ÁøÅ×Å© |
¸ðµ¨¸í |
BJM100 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
Á¦ÀÛ»ç |
¾ÆÅؽýºÅÛ |
¸ðµ¨¸í |
UF-CVD 200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
»ó¾Ð ÈÇбâ»óÁõÂø¹ý(Atmosphere Pressure Chemical Vapor Deposition (APCVD)) |
Á¦ÀÛ»ç |
Watkins Johnson |
¸ðµ¨¸í |
WJ-1000T |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½À½Ä»êÈ¿ë V-ÆÛ´Ï½º(Wet Oxidation V-Furnace) |
Á¦ÀÛ»ç |
TEL |
¸ðµ¨¸í |
Alpha-808SD |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
°Ç½Ä»êÈ¿ë V-ÆÛ´Ï½º(Dry Oxidation V-Furnace) |
Á¦ÀÛ»ç |
TEL |
¸ðµ¨¸í |
Alpha-808DN |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ź¼Ò³ª³ëÆ©ºê ÇÕ¼º CVD(Carbon Nanotube (CNT) Synthesis Chemical Vapor Deposition (CVD)) |
Á¦ÀÛ»ç |
¾ÆÅؽýºÅÛ |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
Á¦ÀÛ»ç |
BMR Technology Co. |
¸ðµ¨¸í |
HiDep-SC |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
½Ç¸®ÄÜ °íÁ¾È¾ºñ ½Ä°¢ÀåÄ¡(Deep Reactive Ion Etcher (DRIE)) |
Á¦ÀÛ»ç |
SPTS |
¸ðµ¨¸í |
Pegasus |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
º¸È£¸·¿ë ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD) for Passivation) |
Á¦ÀÛ»ç |
TES |
¸ðµ¨¸í |
TELIA200 |
¼³Ä¡Àå¼Ò |
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
|
|
Àåºñ¸í |
(GLOCAL)ü¼ººÐºÐ¼®±â(Whole Body Composition Analyzer) |
Á¦ÀÛ»ç |
EchoMRI LLC |
¸ðµ¨¸í |
EchoMRI-100H Analyzer |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇе¿ A210È£
|
|
Àåºñ¸í |
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-1011 |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 156È£
|
|
Àåºñ¸í |
ÃʰíÇØ»óµµ smFRET STORM À̹Ì¡ Àåºñ(Super-resolution smFRET STORM imaging system) |
Á¦ÀÛ»ç |
ONI |
¸ðµ¨¸í |
Oxford Nanoimager S |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 253È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ¹Ì¼¼ ÇØºÎ ½Ã½ºÅÛ(Laser Microdissection Microscope System) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
PALM MicroBeam |
¼³Ä¡Àå¼Ò |
»ý¸í°øÇבּ¸¼¾ÅÍ 341È£
|
|
Àåºñ¸í |
µå¶ø¼¼ÅÍ(Drop Setter for Protein Crystallization) |
Á¦ÀÛ»ç |
FORMULATRIX |
¸ðµ¨¸í |
NT8 |
¼³Ä¡Àå¼Ò |
»ý¸í°úÇаü 204È£
|
|
Àåºñ¸í |
¸ð¼Çĸó ½Ã½ºÅÛ(Motion Capture System) |
Á¦ÀÛ»ç |
Optitrack |
¸ðµ¨¸í |
OptiTrack Motion Tracking System |
¼³Ä¡Àå¼Ò |
ÀΰøÁö´É¿¬±¸¿ø 142È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2100 (HR) |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 105È£
|
|
Àåºñ¸í |
±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope(Cs-corrected HR-STEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2200FS (UHR) |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 109È£
|
|
Àåºñ¸í |
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
HITACHI |
¸ðµ¨¸í |
7600H |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 111È£
|
|
Àåºñ¸í |
¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System) |
Á¦ÀÛ»ç |
KEITHLEY Instruments |
¸ðµ¨¸í |
4200-SCS |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 208È£
|
|
Àåºñ¸í |
ÇöóÁ ÈÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD)) |
Á¦ÀÛ»ç |
Korea Vacuum Tech |
¸ðµ¨¸í |
KVPED-T0583 |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 210È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚ Çö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM)) |
Á¦ÀÛ»ç |
PHILIPS ELECTRON OPTICS B.V. |
¸ðµ¨¸í |
XL30S FEG |
¼³Ä¡Àå¼Ò |
Á¦1°øÇаü 306-1È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
DIONEX ICS-2100 |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(Inductively Coupled Plasma Mass Spectrometer (ICP-MS)) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
NexION-300D |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
¹æ»ç¼± µ¿À§¿ø¼Ò ¾×ü ¼¶±¤ °è¼ö±â(Liquid Scintillation Analyzer) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Tri-carb 2910TR |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
ÀúÁØÀ§ ¾×ü¼¶±¤ºÐ¼®±â(Low Activity Liquid Scintillation Analyzer) |
Á¦ÀÛ»ç |
PerkinElmer |
¸ðµ¨¸í |
Tri-Carb 5110 TR |
¼³Ä¡Àå¼Ò |
Á¦1½ÇÇ赿 318È£
|
|
Àåºñ¸í |
°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(High Frequency Induction Heater) |
Á¦ÀÛ»ç |
EMWise Communications |
¸ðµ¨¸í |
- |
¼³Ä¡Àå¼Ò |
Á¦3°øÇаü 105È£
|
|
Àåºñ¸í |
¼ºÇü»çÃâ±â(Injection Machine) |
Á¦ÀÛ»ç |
Battenfeld Kunststoffmaschinen |
¸ðµ¨¸í |
Microsystem 50 |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 006È£
|
|
Àåºñ¸í |
¼ºÇü»çÃâ±â(Injection Machine) |
Á¦ÀÛ»ç |
SUMITOMO HEAVY INDUSTRIES, LTD |
¸ðµ¨¸í |
SE50D |
¼³Ä¡Àå¼Ò |
Á¦5°øÇаü 006È£
|
|
Àåºñ¸í |
»çÁß±ØÀÚ Áú·®ºÐ¼®±â(Quadrupole Mass Spectrometer) |
Á¦ÀÛ»ç |
HIDEN ANALYTICAL |
¸ðµ¨¸í |
HPR-20 |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 226È£
|
|
Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
Á¦ÀÛ»ç |
(ÁÖ)¼¼´ÏÁ¨ |
¸ðµ¨¸í |
Dionex Aquion IC system |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 228È£
|
|
Àåºñ¸í |
¼±Çü À̿ Ʈ·¦ Áú·®ºÐ¼®±â(Linear Ion Trap Mass Spectrometry) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
VELOS PRO |
¼³Ä¡Àå¼Ò |
Áö°î¿¬±¸µ¿ 232È£
|
|
Àåºñ¸í |
Áý¼Ó À̿ºö(3Â÷¿ø-EBSD)(Focused Ion Beam (FIB; 3D-EBSD)) |
Á¦ÀÛ»ç |
FEI |
¸ðµ¨¸í |
Quanta 3D FEG |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 150-2È£
|
|
Àåºñ¸í |
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
Carl Zeiss |
¸ðµ¨¸í |
Ultra-55 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 154-6È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JSM-7100F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 154-6È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-2100F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 161È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JXA-8530F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 163È£
|
|
Àåºñ¸í |
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM)) |
Á¦ÀÛ»ç |
JEOL |
¸ðµ¨¸í |
JEM-7900F |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 163È£
|
|
Àåºñ¸í |
¹ß±¤ºÐ±¤ºÐ¼®±â(Optical Emission Spectrometer) |
Á¦ÀÛ»ç |
OBLF gmbh |
¸ðµ¨¸í |
OBLF QSN 750 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 171-3È£
|
|
Àåºñ¸í |
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
Á¦ÀÛ»ç |
Thermo Scientific |
¸ðµ¨¸í |
iCAP 6500 DUO |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 176È£
|
|
Àåºñ¸í |
ºñƲ¸² ½ÃÇè±â(Tortion Tester) |
Á¦ÀÛ»ç |
ACE E&C,INC. |
¸ðµ¨¸í |
TRA-2K |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 242-4È£
|
|
Àåºñ¸í |
TEM¿ë À̿¹иµ½Ã½ºÅÛ(Ion Milling System for Transmission Electron Microscope (TEM)) |
Á¦ÀÛ»ç |
¢ßÁö¿¤ÄÚÆÛ·¹ÀÌ¼Ç |
¸ðµ¨¸í |
Gatan model 691 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 284È£
|
|
Àåºñ¸í |
Àç·á½ÃÇè±â(Advanced Indentation System) |
Á¦ÀÛ»ç |
(ÁÖ)ÇÁ·Ðƽ½º |
¸ðµ¨¸í |
AIS2000 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 312-4È£
|
|
Àåºñ¸í |
±Ý¼Ó ÆÇÀç ÀÎÀå¾ÐÃà½ÃÇè±â(Sheet Metal Deformation Simulator) |
Á¦ÀÛ»ç |
¢ß¾Ë¾Øºñ |
¸ðµ¨¸í |
RB319 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 312-4È£
|
|
Àåºñ¸í |
½ºÆÛÅÍ / Áø°øÁõÂø ÀåÄ¡(Sputtering / Vacuum Deposition System) |
Á¦ÀÛ»ç |
¾ÆÀ̾¾Æ¼ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 374È£
|
|
Àåºñ¸í |
SOFC ´ÜÀüÁö Àå±â¼º´É Æò°¡ÀåÄ¡(Solid Oxide Fuel Cell (SOFC) Test Station) |
Á¦ÀÛ»ç |
³ª¶ó¼¿ÅØ(ÁÖ) |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
°í¼ÓÁÖÁ¶ ÁÖÆí ³Ã°¢ ¹× ÀÀ°í simulator(Simulator for Solidification and Cooling of a Slab during High Speed Continuous Casting) |
Á¦ÀÛ»ç |
¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
IET ¸ôµåÇ÷°½º ½Ã·á Á¦Á¶ ÀåÄ¡(High Frequency Induction Furnacer) |
Á¦ÀÛ»ç |
¿¤ÅØ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
½½·¡±×¿ëÇØ ¹× ³Ã°¢ÀåÄ¡(Slag Dissolution and Cooling System) |
Á¦ÀÛ»ç |
¸°Å×Å© |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 480È£
|
|
Àåºñ¸í |
¿Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA)) |
Á¦ÀÛ»ç |
RUBOTHERM |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer) |
Á¦ÀÛ»ç |
Malvern Instruments |
¸ðµ¨¸í |
MASTERSIZER 2000 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
¿Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA)) |
Á¦ÀÛ»ç |
RUBOTHERM |
¸ðµ¨¸í |
High Pressure TGA |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
À̵¿½Ä Áú·® ºÐ¼®±â(Mobile Bench-top Mass Spectrometer) |
Á¦ÀÛ»ç |
InProcess Instruments GmbH |
¸ðµ¨¸í |
GAM 400 |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 546È£
|
|
Àåºñ¸í |
°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(High Frequency Induction Heater) |
Á¦ÀÛ»ç |
¿¤ÅØ |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
¼³Ä¡Àå¼Ò |
ö°´ëÇпø 580È£
|
|
Àåºñ¸í |
¿ëÇØ¿ë À¯µµ°¡¿ ÀåÄ¡(Induction Heating System for Melting) |
Á¦ÀÛ»ç |
PSTEK |
¸ðµ¨¸í |
Ư¼öÁ¦ÀÛ |
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¿ø½ÉÁÖÁ¶±â(Sample Preparation Equipment) |
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linn high term gmbh |
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Lifumat-M-2000-7.7-VAC |
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°íÁÖÆÄ À¯µµ °¡¿ ¿ëÇØ·Î(Vacuum Induction Melting and Casting Furnace) |
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ALD Vacuum Technologies |
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VIM4 |
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½Ç½Ã°£ X-¼± °Ë»ç±â(Realtime X-ray Inspection System) |
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¢ßÀÚºñ½º |
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X-Scan 7950 |
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¸¶ÂûƯ¼º Æò°¡ÀåÄ¡(Friction Tester) |
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(À¯)Á¾·Î°úÇлó»ç |
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CR-FR-CH1 |
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RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System) |
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(ÁÖ)¿ïÅØ |
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URS-100 |
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Æ÷Ç×°¡¼Ó±â¿¬±¸¼Ò ÀúÀ帵µ¿ 118È£
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3D ¹ÙÀÌ¿ÀÇÁ¸°ÅÍ(Extrusion-based 3D Bioprinter) |
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CELLINK |
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BIO X |
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
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Àü±âºÐ¹« ÀÌ¿ÂÀ̵¿µµ ºÐ¼® - Áú·® ºÐ¼®±â(Electrospray ionization Ion mobility - Mass spectrometry) |
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AGILENT |
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Agilent 6560 |
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ÈÇаü 112È£
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¸ÅÆ®¸¯½º º¸Á¶ ·¹ÀÌÀú Å»Âø ÀÌ¿ÂÈ Áú·®ºÐ¼®±â(Matrix Assisted Laser Desorption/Ionization Time-of-Flight (MALDI-TOF) Mass Spectrometer) |
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BRUKER |
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Autoflex Speed LRF |
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ÈÇаü 112È£
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°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¼±Çü À̿ Ʈ·¦ Áú·® ºÐ¼®±â(HPLC dual-cell linear ion trap mass spectrometer (HPLC-ESI-MS)) |
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Thermo Scientific |
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LTQ Velos Pro |
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ÈÇаü 112È£
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GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
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Agilent Technologies |
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-/5975C |
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ȯ°æ°øÇе¿ 103/104È£
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´ÙÁß°ËÃâ À¯µµ°áÇÕÇöóÁ Áú·®ºÐ¼®±â(Multi-Collector Inductively Coupled Plasma Mass Spectrometer (MC-ICP-MS)) |
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Nu Instruments Ltd |
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Plasma 3 |
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ȯ°æ°øÇе¿ 105È£
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Áú·®ºÐ¼®±â(Mass Spectrometer) |
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JEOL |
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JMS-800D |
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ȯ°æ°øÇе¿ 106È£
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À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES)) |
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Thermo Scientific |
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iCAP 7400 |
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ȯ°æ°øÇе¿ 106È£
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ÈÇÐÈíÂø·®ºÐ¼®±â(Chemisorption Analyzer) |
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micromeritics |
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Autochem II 2920 chemisorption analyzer |
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ȯ°æ°øÇе¿ 110È£
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°í¾Ð¿ë ºÎÇÇ½Ä ÈíÂøÀåºñ ¼ö¼Ò¿¡³ÊÁö ÀúÀå·® ÃøÁ¤ ÀÚµ¿È Àåºñ(Volumetric Sorption Measurement System) |
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Setaram |
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PCT Pro |
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ȯ°æ°øÇе¿ 110È£
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¿°±â¼¿ºÐ¼®±â(Ion Personal Genome Machine) |
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Thermo Scientific |
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Ion Personal Genome Machine (PGM) System |
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ȯ°æ°øÇе¿ 206-1È£
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¾ÈÁ¤ µ¿À§¿ø¼Ò ºñÀ² Áú·® ºÐ¼®±â(Stable Isotope Ratio Mass Spectrometer) |
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Isoprime |
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IsoPrime 100 |
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ȯ°æ°øÇе¿ 206-2È£
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GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
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Agilent Technologies |
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7890B/- |
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ȯ°æ°øÇе¿ 207È£
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À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
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Metrohm |
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790 Personal IC |
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ȯ°æ°øÇе¿ 230È£
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À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
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Dionex |
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ICS-2100 |
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ȯ°æ°øÇе¿ 302È£
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±¤ ¿¡³ÊÁö Àüȯ·ü ÃøÁ¤±â(Incident Photon-to-electron Conversion Efficiency (IPCE) System) |
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NEWPORT |
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Newport 74125 |
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ȯ°æ°øÇе¿ 302È£
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¸ÅÆ®¸¯½º º¸Á¶ ·¹ÀÌÀú Å»Âø ÀÌ¿ÂÈ Áú·®ºÐ¼®±â(Matrix Assisted Laser Desorption/Ionization Time-of-Flight (MALDI-TOF) Mass Spectrometer) |
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Bruker |
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Autoflex Max LRF |
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ȯ°æ°øÇе¿ 320È£
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¸¶ÀÌÅ©·ÎÇ÷¹ÀÌÆ® ¸®´õ(Multi-detection Microplate Reader) |
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Hidex Oy |
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Hidex Sense |
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ȯ°æ°øÇе¿ 327È£
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TFF ½Ã½ºÅÛ(Tangential Flow Filtration (TFF) System) |
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MERCK |
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Cogent M1 TFF System |
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ȯ°æ°øÇе¿ 331È£
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ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System) |
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Thermo Scientific |
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Dionex ICS-5000 |
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ȯ°æ°øÇе¿ 331È£
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ÈÇÐÈíÂøºÐ¼®±â(Temperature Programed Reduction/Desorption (TPR/TPD) Chemisorption Analyzer) |
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micromeritics |
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AutoChem II |
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ȯ°æ°øÇе¿ 412È£
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Àåºñ¸í |
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System) |
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Agilent Techonologies |
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7890B/5977B |
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ȯ°æ°øÇе¿ 412È£
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Àåºñ¸í |
ÇÙ»ê ÃßÃâ±â(Auto Nucleic Acid Preparation System) |
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Precision System Science |
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Magtration System 12GC |
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ȯ°æ°øÇе¿ 414È£
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Àåºñ¸í |
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System) |
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Dionex |
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ICS-1100 |
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ȯ°æ°øÇе¿ 417È£
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Àåºñ¸í |
»çÁß±ØÀÚ Áú·®ºÐ¼®±â(Quadrupole Mass Spectrometer) |
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HIDEN ANALYTICAL |
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HPR-20 |
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ȯ°æ°øÇе¿ 431È£
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Àåºñ¸í |
ÈÇÐÈíÂø·®ºÐ¼®±â(Chemisorption Analyzer) |
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MicrotracBEL Corp. |
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BELCAT ¥± |
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ȯ°æ°øÇе¿ 431È£
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