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Equipment Information
¼Òµ¿¹°¿ë ü³» ±¤ÇÐ ¿µ»ó À̹Ì¡ ½Ã½ºÅÛ(In vivo optical imaging system for small animal)
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Equip. Info.
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Reservation
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10202550
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¼Òµ¿¹°¿ë ü³» ±¤ÇÐ ¿µ»ó À̹Ì¡ ½Ã½ºÅÛ
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In vivo optical imaging system for small animal
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Revvity
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IVIS Lumina III Imaging System
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Àåºñ»ç¾ç
1. ±Ô°Ý: 48.0 cm (W) x 71 cm (D) x 104.0 cm (H) (À̹Ì¡ ±â±â)
2. »ç¾ç (½Ã½ºÅÛ ±¸¼º ³»¿ª)
1) À̹Ì¡ ±â±â
2) ¸¶Ãë ±â±â
3) ¹èÀ²¿ë ·»Áî
4) ÄÄÇ»ÅÍ ¹× Àü¿ø±â±â
- Detector Type: 0.5¡° Back-thinned, back-illuminated Grade 1 CCD
- Camera Temp: -90¡É
- CCD Size: 1.3 cm X 1.3 cm
- CCD pixel Size (¥ìm) 13
- Optical FOV (cm) 5 – 12 cm (2.6 cm with ZFOV attachment)
- Optical Resolution (Microns) 50 (35 with ZFOV)
- Imaging Pixels 1024 x 1024
- Wavelength Range (nm) : 410 – 860
- Number of Emission Filters/Bandwidth: 7/30 nm
- Emission Filters: 520, 570, 620, 670, 710, 790, 845
- Number of Excitation Filters/Bandwidth: 19/20 nm
- Excitation Filters: 420, 440, 460, 480, 500, 520, 540, 560, 580, 600, 620, 640, 660, 680, 700, 720, 740, 760, 780
- Excitation Light Source: Extended NIR Range 150 W Tungsten EKE-ER
- Heated Chamber: 20 – 40¡É
- Accessory Line: Zoom lens, MVI-2, expansion lens, isolation chamber, ECG, injection system, anethesia pull out tray, calibration tools, pantom mice
Ȱ¿ëºÐ¾ß
'º» Àκñº¸ À̹Ì¡ ½Ã½ºÅÛ(In Vivo Imaging System)Àº ¼Òµ¿¹° ¸ðµ¨À» ´ë»óÀ¸·Î Çü±¤(Fluorescence) ¹× »ýü ¹ß±¤(Bioluminescence) ½ÅÈ£¸¦ ºñħ½ÀÀû(Non-invasive)À¸·Î °ËÃâÇÏ¿©, Èĺ¸ ¾à¹°°ú À¯ÀüÀÚ Àü´ÞüÀÇ »ýü ³» µ¿Å¸¦ Á¤·®ÀûÀ¸·Î ºÐ¼®Çϴ ÷´Ü ±¤ÇÐ ¿µ»ó ÀåºñÀÔ´Ï´Ù.
½Å¾à ¹× ±â´É¼º ¾à¹° °³¹ß ´Ü°è¿¡¼­ Çü±¤ ¿°·á¸¦ °áÇÕÇÑ ¾à¹°°ú Àü´Þü¸¦ ÁÖ»çÇÑ µÚ, ü³» À̵¿ °æ·Î, Ç¥Àû ÁöÇ⼺, ³»¡¤¿ÜºÎ Àڱؿ¡ µû¸¥ ¾à¹° ¹æÃ⠰ŵ¿À» ½Ç½Ã°£À¸·Î ÃßÀûÇÒ ¼ö ÀÖ½À´Ï´Ù. ¶ÇÇÑ ¸®Æ÷ÅÍ À¯ÀüÀÚ°¡ žÀçµÈ Àü´Þü¸¦ Ȱ¿ëÇÏ¿© ƯÁ¤ Á¶Á÷¿¡¼­ÀÇ À¯ÀüÀÚ ¹ßÇö È¿À²°ú À§Ä¡¸¦ °æ½ÃÀûÀ¸·Î ¸ð´ÏÅ͸µÇÏ´Â µ¥ ÃÖÀûÈ­µÇ¾î ÀÖ½À´Ï´Ù.
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Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
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Carl Zeiss
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AURIGA
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RIST1µ¿ 1163È£
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ÁÖ»çÇü ¿ÀÁ¦ ÀüÀÚÇö¹Ì°æ(Scanning Auger Electron Spectroscopy (AES) Nanoprobe)
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ULVAC-PHI
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PHI 700
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RIST1µ¿ 1163È£
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¼öÂ÷º¸Á¤ ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs-Corrected Scanning Transmission Electron Microscope (Cs-STEM))
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JEOL
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JEM-ARM200F
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RIST1µ¿ 1176È£
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ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM))
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JEOL
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JSM-6480LV
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RIST1µ¿ 1187È£
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Rockwell °æµµ±â(Rockwell Hardness Testing Machine)
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Akashi
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Wizhard
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RIST1µ¿ 1188È£
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½ÃÂ÷¿­ºÐ¼®/½ÃÂ÷Áֻ翭·®ºÐ¼®±â(Differential Thermal Analysis (DTA)/Differential Scanning Calorimeter (DSC))
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SETARAM Instrumentation
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Labsys DTA/DSC
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RIST1µ¿ 1188È£
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Vickers °æµµ±â(Vickers Hardness Testing Machine)
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Mitutoyo
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HV-114
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RIST1µ¿ 1188È£
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ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM))
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HITACHI
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S-3400N
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RIST1µ¿ 1190È£
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Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
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JEOL
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JSM-7600F
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RIST1µ¿ 1192È£
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°¡½ººÎ½Ä½ÃÇè±â(Gas Corrosion Test Instrument)
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SUGA
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GT-100
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RIST1µ¿ 1272È£
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°íºÐÇØ´É À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(High Resolution Inductively Coupled Plasma Mass Spectrometer (HR-ICP-MS))
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Thermo Scientific
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ELEMENT XR
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RIST1µ¿ 1304È£
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Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer)
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Bruker
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VERTEX 70
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RIST1µ¿ 1306È£
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·¹ÀÌÀú À¯µµ ÇöóÁ ºÐ±¤ºÐ¼®±â(Tandem Laser-ablation Laser-induced Breakdown Spectrometer (LA-LIBS))
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Applied Spectra
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J200
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RIST1µ¿ 1306È£
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»ïÁß »ç±ØÀÚ À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(Triple Quadrupole Inductively Coupled Plasma Mass Spectrometer (TQ-ICP-MS))
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Thermo Scientific
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iCAP TQ
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RIST1µ¿ 1306È£
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À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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AMETEK
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Spectro Arcos
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RIST1µ¿ 1309È£
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À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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PerkinElmer
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Optima 8300
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RIST1µ¿ 1311È£
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À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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Thermo Scientific
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iCAP 7000 Series
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RIST1µ¿ 1311È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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AMETEK
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Spectro Arcos
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RIST1µ¿ 1311È£
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GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Technologies
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7890B/5977A
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RIST1µ¿ 1314È£
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GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Technologies
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7890B/5977B
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RIST1µ¿ 1314È£
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»ïÁß »ç±ØÀÚ LC/MS/MS ½Ã½ºÅÛ(Triple Quadrupole LC/MS/MS System)
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Thermo Scientific
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TSQ Quantum Ultra
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RIST1µ¿ 1316È£
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°í¼º´É ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ(Ultra High Performance Liquid Chromatograph (UHPLC))
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Thermo Scientific
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DIONEX UltiMate 3000
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RIST1µ¿ 1316È£
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°í¼º´É ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ(Ultra High Performance Liquid Chromatograph (UHPLC))
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Thermo Scientific
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DIONEX UltiMate 3000
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RIST1µ¿ 1316È£
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¿­Å»Âø ÃøÁ¤ ½Ã½ºÅÛ(Thermal Desorption System)
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Markes International
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UNITY2
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RIST1µ¿ 1317È£
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À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Nittoseiko Analytech
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AQF-2100H
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RIST1µ¿ 1318È£
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ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System)
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Thermo Scientific
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Dionex ICS-5000
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RIST1µ¿ 1320È£
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¸¶ÀÌÅ©·ÎÆÄ ½Ã·á ºÐÇØ ½Ã½ºÅÛ(Advanced Microwave Digestion System)
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Milestone
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ETHOS 1
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RIST1µ¿ 1334È£
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Áøµ¿Çü ÄŹÐ(Vibrating Cup Mill)
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FRITSCH
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Pulverisette 9
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RIST1µ¿ 1338È£
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HPT-E-CAPº¹ÇÕÇÁ·¹½º(HPT-E-CAP Compound Press System)
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(ÁÖ)¸ðÀνýº
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RIST1µ¿ 2022È£
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Ź»óÇü Àý´Ü±â(Tabletop Cut-off Machine)
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Struers
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Discotom-100
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RIST2µ¿ 2177È£
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Àüµ¿ µðÁöÅÐ Çö¹Ì°æ(Opto-digital Motorizing Microscope)
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OLYMPUS
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DSX100
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RIST2µ¿ 2179È£
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°øÃÊÁ¡ ·¹ÀÌÀú ÁÖ»ç Çö¹Ì°æ(Confocal Laser Scanning Microscope)
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OLYMPUS
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OLS3000
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RIST2µ¿ 2179È£
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ÇǷνÃÇè±â(Fatigue Testing Machine)
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MTS
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MTS Landmark Servohydraulic Test System
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RIST2µ¿ 2180È£
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¸¶¿îÆÃ Àåºñ(CitoPress Mounting Equipment)
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Struers
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Citopress-30
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RIST2µ¿ 2185È£
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ÇǷνÃÇè±â(Fatigue Testing Machine)
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MTS
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MTS Landmark Servohydraulic Test System
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RIST2µ¿ 2187È£
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ÇǷμö¸í½ÃÇè±â(Material Test System)
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MTS
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810 Material Test System
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RIST2µ¿ 2193È£
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ÇǷνÃÇè±â(Fatigue Testing Machine)
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MTS
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MTS Landmark Servohydraulic Test System
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RIST2µ¿ 2195È£
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ÇǷμö¸í½ÃÇè±â(Material Test System)
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MTS
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810 Material Test System
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RIST3µ¿ 3003È£
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°¡¿­/³Ã°¢ è¹ö(Heating/Cooling Chamber)
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JEIO TECH
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K-Series ID CHAMBER
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RIST3µ¿ 3009È£
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CASS ½ÃÇè±â(CASS Test Instrument)
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SUGA
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CAP-90V-5
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RIST3µ¿ 3010È£
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QUVÃËÁø ³»Èļº ½ÃÇè±â(QUV Accelerated Weathering Tester)
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Q-LAB
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QUV/spray
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RIST3µ¿ 3018È£
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Áø°ø è¹ö Á¤¹Ð ºÐ¼® Àåºñ(Vacuum Chamber I-V Probing System)
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MS TECH
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MST5000
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RIST3µ¿ 3102È£
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ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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Selcos
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Cetus-E
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RIST3µ¿ 3104È£
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¿­ È­ÇÐ ±â»ó ÁõÂø ÀåÄ¡(Thermal Chemical Vapor Deposition (CVD) System)
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SNTEK
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TCS5000
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RIST3µ¿ 3104È£
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Á¤¹ÐÀÚµ¿Àý´Ü±â(Linear Precision Saw)
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BUEHLER
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ISOMET4000
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RIST3µ¿ 3132È£
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Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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TERALEADER
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TLP1001
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RIST3µ¿ 3139È£
Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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iNFOVION
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-
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RIST3µ¿ 3147È£
Àåºñ¸í
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System)
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Roche
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LightCycler96
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RIST3µ¿ 3153È£
Àåºñ¸í
Çü±¤/Àα¤ ÃøÁ¤ ½Ã½ºÅÛ(Fluoroscence/Luminescence Measuring System)
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Thermo Scientific
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Fluoroskan Ascent FL
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RIST3µ¿ 3161È£
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ºÐ±¤½Ã½ºÅÛ(Spectrometer System)
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(ÁÖ)¿µÇ³¾¾¿¥¾¾
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CS-2000
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RIST3µ¿ 3169È£
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PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System)
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MUSASHI ENGINEERING, INC.
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IMAGE MASTER 350PC SMART/SHOTMASTER 300DS-S
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RIST3µ¿ 3170È£
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¹ü¿ë ÇÁ·Îºê ½Ã½ºÅÛ(Universal Measurement Probe System)
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TERALEADER
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UMP100
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RIST3µ¿ 3170È£
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3D º¯ÇüÃøÁ¤½Ã½ºÅÛ(3D Deformation Analysis System)
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GOM international AG
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ARAMIS 12M
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RIST3µ¿ 3188È£
Àåºñ¸í
ÁÖ»ç Åõ°ú ÀüÀÚÇö¹Ì°æ(Scanning Transmission Electron Microscope (STEM))
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COXEM
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CX-200
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RIST3µ¿ 3188È£
Àåºñ¸í
¸¸´É ½ÃÇè±â(Micro Universal Testing Machine (UTM))
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R&B
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RB 302 ML
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RIST3µ¿ 3188È£
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Àڿܼ± ÆòÇ౤ Á¶»ç ½Ã½ºÅÛ(Mask Aligner and Exposure System)
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MIDAS SYSTEM
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MDA-400M
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RIST3µ¿ 3212È£
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½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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SNTEK
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RSP-5000
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RIST3µ¿ 3219È£
Àåºñ¸í
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System)
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SNTEK
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-
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RIST3µ¿ 3219È£
Àåºñ¸í
ÇöóÁ ¿øÀÚÃþ ÁõÂø ½Ã½ºÅÛ(Plasma Enhanced Atomic Layer Deposition (PE-ALD) System)
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ForALL
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OZONE
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RIST3µ¿ 3223È£
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¹Ú¸·ÃøÁ¤±â(Thin Film Measurement System)
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KSV INSTRUMENTS
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-
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RIST3µ¿ 3229È£
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½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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SNTEK
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RSP-5000
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RIST3µ¿ 3263È£
Àåºñ¸í
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System)
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COHERENT
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COMPex 201 F
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RIST3µ¿ 3263È£
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ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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HIGGSLAB
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PLD SYSTEM
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RIST3µ¿ 3263È£
Àåºñ¸í
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System)
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Photron Ltd.
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FASTCAM SA1
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RIST3µ¿ 3267È£
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ºÐ±¤½Ã½ºÅÛ(Spectrometer System)
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Andor Technology
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SR-303i
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RIST3µ¿ 3267È£
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Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System)
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Photron Ltd.
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FASTCAM SA2
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RIST3µ¿ 3267È£
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ÀüÁö ¼º´É ½ÃÇè±â(Multi-cycling Battery Test System)
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Korea Thermo-Tech
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SERIES 4000
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RIST3µ¿ 3278È£
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¿­Áß·®-½ÃÂ÷Áֻ翭·®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC))
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TA Instruments
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SDT Q600
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RIST3µ¿ 3278È£
Àåºñ¸í
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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COHERENT
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COMPex Pro 102 F
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RIST3µ¿ 3282È£
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Àú¿ÂÀ¯ÁöÀåÄ¡(Cryostat System)
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Oxford Instruments
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CCC1104
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RIST3µ¿ 3289È£
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±¤»ê¶õ °ËÃâ±â(Light Scattering Detector)
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Precision Detectors
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PD2020
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RIST3µ¿ 3306È£
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GPC ½Ã½ºÅÛ(Gel Permeation Chromatography (GPC) System)
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Waters
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1525/2414/410
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RIST3µ¿ 3312È£
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½ÃÂ÷ ÁÖ»ç ¿­·®ÃøÁ¤±â(Differential Scanning Calorimeter (DSC))
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PerkinElmer
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DSC 4000
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RIST3µ¿ 3312È£
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¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System)
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KEITHLEY Instruments
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4200
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RIST3µ¿ 3340È£
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QE ÃøÁ¤±â(External and Internal Quantum Efficiency (EQE and IQE) Measurement System)
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NEWPORT
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Oriel IQE-200
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RIST3µ¿ 3340È£
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´Ü°áÁ¤ ¿¢½º·¹ÀÌ È¸ÀýÀåÄ¡(Single Crystal X-ray Diffractometer)
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Bruker
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APEXII Quazar
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RIST3µ¿ 3352/3354È£
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X-¼±±¤ÀüÀںб¤ºÐ¼®±â(XPS xonnectable Deposition system)
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ULVAC-PHI, Inc.
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PHI GENESIS Multi-tech Scanning XPS
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RIST3µ¿ 3360/3362È£
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Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Vacuum Thermal Evaporating System)
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WOOSUNG HI-VAC
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-
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RIST3µ¿ 3363È£
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°í¼º´É À¯¼¼Æ÷ºÐ¼®±â(High Performance Flow Cytometer)
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Becton Dickinson And Company
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FACS Canto II
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°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
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¿µ»óºÐ¼® ½Ã½ºÅÛ(Luminescent Image Analyzer)
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FUJIFILM
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LAS-4000
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°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
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µµ¸³ Çü±¤ Çö¹Ì°æ(Fluorescence Inverted Microscope)
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Carl Zeiss
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Axio Observer A1
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°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
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½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System)
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Roche
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LightCycler480
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°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
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»ýü³» Çü±¤ºÐ±¤ ºÐ¼®±â(Automatic Multispectral In vivo Imaging)
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CRI, INC
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Maestro II
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°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
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°í¼Ó ´Ü¹éÁú ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ (FPLC)(Fast Protein Liquid Chromatography (FPLC))
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GE Healthcare
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AKTA purifier
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°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
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5Ãà º¹ÇÕ °¡°ø±â(5-axis Computerized Numerical Control (CNC) Turning Center)
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DMG
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CTX Beta 1250 TC
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±â°è°øÀÛµ¿ 100È£
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¹ü¿ë ¹Ð¸µ ¸Ó½Å´×¼¾ÅÍ(Universal Milling Machining Center)
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±âÈï±â°è
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KMB-U5
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±â°è°øÀÛµ¿ 100È£
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¼öÁ÷Çü ¸Ó½Ã´×¼¾ÅÍ(Vertical Machining Center)
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µÎ»ê°øÀÛ±â°è
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DNM 750¥±
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±â°è°øÀÛµ¿ 100È£
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CNC ¼öÆòÇü ¸Ó½Å´×¼¾ÅÍ(Computerized Numerical Control (CNC) Machining Center)
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´ë¿ìÁß°ø¾÷
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ACE-H50
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±â°è°øÀÛµ¿ 101È£
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CNC ¿ÍÀ̾î ÄÆÆÃ ¸Ó½Å´×¼¾ÅÍ(Computerized Numerical Control (CNC) Wire Cut Machining Center)
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SODICK
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AL600G
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±â°è°øÀÛµ¿ 101È£
Àåºñ¸í
±Ý¼Ó ºÐ¸» 3Â÷¿ø Á¶Çü Àåºñ(Metal Additive Manufacturing Machine)
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Concept Laser GmbH
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M2 cusing SL400W
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±â°è°øÀÛµ¿ 202È£
Àåºñ¸í
À̺ÒÈ­Á¦³í ½Ä°¢±â(Xenon difluoride Etching system)
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¢ß½ÎÀÌ¿£ÅØ
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Xef2 etching system
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±â°è½ÇÇ赿 104È£
Àåºñ¸í
ÁÖ»çÀüÀÚÇö¹Ì°æ(S.E.M(SCANNING ELECTRON MICROSCOPE))
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JEOL LTD
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JSM-6390LV
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±â°è½ÇÇ赿 106È£
Àåºñ¸í
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System)
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Photron Ltd.
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FASTCAM Mini UX100
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±â°è½ÇÇ赿 108È£
Àåºñ¸í
´ÙÀÌ¿Àµå ·¹ÀÌÁ® ½Ã½ºÅÛ(Diode Laser System)
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COHERENT
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Chameleon Vision 2
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±â°è½ÇÇ赿 206È£
Àåºñ¸í
±¤ ÆÄ¶ó¸ÞÆ®¸¯ ¹ßÁø±â(Optical Parametric Oscillator)
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COHERENT
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Chameleon OPO
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±â°è½ÇÇ赿 206È£
Àåºñ¸í
ÆèÅäÃÊ ÆÞ½º ·¹ÀÌÀú ½Ã½ºÅÛ(Femtosecond Pulse Laser System)
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COHERENT
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Chameleon
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±â°è½ÇÇ赿 206È£
Àåºñ¸í
°í¼Ó ¿ø¼ÒºÐ¼®ÀÌ °¡´ÉÇÑ Àü°è ¹æÃâÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(FE-SEM with high speed EDS system)
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JEOL LTD.
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JSM-7800F Prime
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 101È£
Àåºñ¸í
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM))
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JEOL
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JSM-7401F
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 103È£
Àåºñ¸í
¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM))
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Veeco
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Dimension 3100
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Àåºñ¸í
ÃʰíÁø°øÀú¿Â ÁÖ»çÅͳθµÇö¹Ì°æ(Ultra High Vacuum Low Temperature Scanning Tunneling Microscopy (STM))
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Unisoku
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USM 1200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 101È£
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°í¼ÓȸÀü °ÇÁ¶±â(Spin Dryer (High Spin))
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KSM
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KSD-6001
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 216È£
Àåºñ¸í
3D Ç¥¸éÃøÁ¤ ½Ã½ºÅÛ(3D Optical Surface Metrology System)
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Leica Microsystems
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DCM 3D
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 216È£
Àåºñ¸í
Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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DDONG High Technologies
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Thermal Evaporator System
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
Àåºñ¸í
°¡½º Èñ¼® ½Ã½ºÅÛ(Computerized Gas Dilution System)
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Environics
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Series 4040
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
Àåºñ¸í
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM))
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JEOL
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JEM-2100F(with STEM Cs corrector)
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³ª³ëÀ¶ÇÕ±â¼ú¿ø TEM ½Ç
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±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope (Cs-corrected HR-STEM))
Á¦ÀÛ»ç
JEOL
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JEM-2200FS
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³ª³ëÀ¶ÇÕ±â¼ú¿ø TEM-2200FS½Ç
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Àý´Ü¿¬¸¶±â(Polishing Machine)
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Allied
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Multiprep
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³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
Àåºñ¸í
À̿¿¬¸¶±â(Ion Milling System)
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GL CORPORATION
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PIPS1 691
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Àåºñ¸í
Àú¿¡³ÊÁö À̿ ¿¬¸¶±â(Gentle Mill (Low Energy Ion Milling System))
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TechnoOrg Linda
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IV5
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³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
Á¦ÀÛ»ç
LEO Elektronrnmikroskopie GmbH
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FE-SEM
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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Korea Vacuum Tech
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KVE-C300160
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
±Ý¼Ó À¯±â¹° È­Çбâ»óÁõÂø ½Ã½ºÅÛ(Metalorganic Chemical Vapor Deposition (MOVCD) System)
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Jusung Eng.
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Eureka 2000
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Àåºñ¸í
°íºÐÀÚ À¯±â ¹ÝµµÃ¼ ¹°Áú µµÆ÷ ÀåÄ¡(Spin Coater with Glove Box)
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¼¼¸í¿¡¹ö¿¡³ÊÁö(ÁÖ)
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Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
Á¦ÀÛ»ç
Korea Vacuum Tech
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KVE-4000
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
·¹ÀÌÀú ¸®¼Ò±×·¡ÇÇ ½Ã½ºÅÛ(Laser Lithography system)
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Heidelberg Instruments
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DWL-200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
½ºÆ®·¹½º ÃøÁ¤ ½Ã½ºÅÛ(Stress Measurement System)
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FSM
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500TC
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Àåºñ¸í
ÀÓ°èÄ¡¼ö ÃøÁ¤ ÁÖ»çÀüÀÚÇö¹Ì°æ(Critical Dimension Scanning Electron Microscope (CD-SEM))
Á¦ÀÛ»ç
HITACHI
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S-9380
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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SNTEK
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MSS5000
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Àåºñ¸í
½ÃÆ® ÀúÇ× ÃøÁ¤ ½Ã½ºÅÛ(4 Point Probe)
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(ÁÖ)¿¡À̾ÆÀÌÆ¼
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CMT-SR2000N
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
°¨±¤Á¦ ȸÀü µµÆ÷±â(Photoresist (PR) Spin Coater)
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SAWATEC Solutions AG
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LSM 250
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Àåºñ¸í
ȸÀü °ÇÁ¶±â(Spin Dryer)
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PTLKorea
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8300S
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Àåºñ¸í
À¯µµ°áÇÕ ÇöóÁ ½Ä°¢ ÀåÄ¡(Inductively Coupled Plasma (ICP) Etcher)
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(ÁÖ)µð¿¥¿¡½º
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ICP Etcher
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Àåºñ¸í
½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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AMAT
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E5500
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Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
Á¦ÀÛ»ç
Korea Vacuum Tech
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KVE-C300160
¼³Ä¡Àå¼Ò
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
º¸È£¸·¿ë ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD) for Passivation)
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TES
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TELIA200
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Àåºñ¸í
´ÙÀÌ½Ì ½î¿ì(Dicing Saw)
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DISCO
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DFD 6340
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Àåºñ¸í
°í¼Ó ´Ü¹éÁú ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ (FPLC)(Fast Protein Liquid Chromatography (FPLC))
Á¦ÀÛ»ç
GE Healthcare
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AKTA FPLC
¼³Ä¡Àå¼Ò
»ý¸í°øÇבּ¸¼¾ÅÍ 229È£
Àåºñ¸í
ÃʰíÇØ»óµµ smFRET STORM À̹Ì¡ Àåºñ(Super-resolution smFRET STORM imaging system)
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ONI
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Oxford Nanoimager S
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»ý¸í°øÇבּ¸¼¾ÅÍ 253È£
Àåºñ¸í
µµ¸³ Çö¹Ì°æ(Inverted Microscope)
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OLYMPUS
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IX81
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»ý¸í°øÇבּ¸¼¾ÅÍ 328È£
Àåºñ¸í
·¹ÀÌÀú ¹Ì¼¼ ÇØºÎ ½Ã½ºÅÛ(Laser Microdissection Microscope System)
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Carl Zeiss
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PALM MicroBeam
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»ý¸í°øÇבּ¸¼¾ÅÍ 341È£
Àåºñ¸í
Ź»óÇü ¸¶ÀÌÅ©·Î¾î·¹ÀÌ ½Ã½ºÅÛ(Benchtop Microarray System)
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GENETIX
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QArray mini
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»ý¸í°øÇבּ¸¼¾ÅÍ 458È£
Àåºñ¸í
µå¶ø¼¼ÅÍ(Drop Setter for Protein Crystallization)
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FORMULATRIX
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NT8
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»ý¸í°úÇаü 204È£
Àåºñ¸í
[±Û·ÎÄÃ] 3D·¹Áø ÇÁ¸°ÅÍ +¼¼Ã´±â ¼¼Æ®([Glocal] 3D Resin Printer + Washing Machine Set)
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¿¡ÀÌÆå½º¾²¸®µð(APEX3D)
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Form 4L Complete Package
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ÀΰøÁö´É¿¬±¸¿ø 142È£
Àåºñ¸í
ÇÁ·£Ä« ¸®¼­Ä¡ 3 ·Îº¿ ½Ã½ºÅÛ(FRANKA RESEARCH 3 robot system)
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Franka Robotics
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Franka Research 3
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ÀΰøÁö´É¿¬±¸¿ø 142È£
Àåºñ¸í
¸ð¼Çĸó ½Ã½ºÅÛ(Motion Capture System)
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Optitrack
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OptiTrack Motion Tracking System
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ÀΰøÁö´É¿¬±¸¿ø 142È£
Àåºñ¸í
±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope(Cs-corrected HR-STEM))
Á¦ÀÛ»ç
JEOL
¸ðµ¨¸í
JEM-2200FS (UHR)
¼³Ä¡Àå¼Ò
Á¦1°øÇаü 109È£
Àåºñ¸í
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM))
Á¦ÀÛ»ç
HITACHI
¸ðµ¨¸í
S-3400N
¼³Ä¡Àå¼Ò
Á¦1°øÇаü 111È£
Àåºñ¸í
½ÃÂ÷ ÁÖ»ç ¿­·®ÃøÁ¤±â(Differential Scanning Calorimeter (DSC))
Á¦ÀÛ»ç
SETARAM Instrumentation
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Labsys Evo
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Á¦1°øÇаü 112È£
Àåºñ¸í
Àú¿Â±¤ÇÐÃøÁ¤Àåºñ(Optical Cryostat)
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MONTANA INSTRUMENTS
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CRYOSTATION C2
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Á¦1°øÇаü 113È£
Àåºñ¸í
·¹ÀÌÀú ½Ã½ºÅÛ(Laser System)
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KIMMON KOHA
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IK3301R-G
¼³Ä¡Àå¼Ò
Á¦1°øÇаü 206È£
Àåºñ¸í
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System)
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LAMBDA PHYSIK AG
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Compex 205
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Á¦1°øÇаü 208È£
Àåºñ¸í
ÁÖ»ç ÇÁ·Îºê Çö¹Ì°æ(Scanning Probe Microscope (SPM))
Á¦ÀÛ»ç
Veeco
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Dimension 3100
¼³Ä¡Àå¼Ò
Á¦1°øÇаü 208È£
Àåºñ¸í
LED ÃøÁ¤ ½Ã½ºÅÛ(Wafer-level LED Measurement System)
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WithLight
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OPI-170
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Á¦1°øÇаü 208È£
Àåºñ¸í
¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System)
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KEITHLEY Instruments
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4200-SCS
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Á¦1°øÇаü 208È£
Àåºñ¸í
°Ç½Ä½Ä°¢ÀåÄ¡(Inductively Coupled Plasma (ICP) Etcher)
Á¦ÀÛ»ç
Korea Vacuum Tech
¸ðµ¨¸í
KVICP-T406530
¼³Ä¡Àå¼Ò
Á¦1°øÇаü 210È£
Àåºñ¸í
Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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GD-Tech
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KVT-2008L
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Á¦1°øÇаü 210È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚ Çö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
Á¦ÀÛ»ç
PHILIPS ELECTRON OPTICS B.V.
¸ðµ¨¸í
XL30S FEG
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Á¦1°øÇаü 306-1È£
Àåºñ¸í
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System)
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(ÁÖ)¾ÅÅ©·Ð
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MotionPro Y7S1
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Á¦1½ÇÇ赿 314È£
Àåºñ¸í
ÀÔÀÚ ¿µ»ó À¯¼Ó°è(Particle Image Velocimetry (PIV) System)
Á¦ÀÛ»ç
TSI
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MODULE4G-2DPIV
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Á¦1½ÇÇ赿 316È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Thermo Scientific
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DIONEX ICS-2100
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Á¦1½ÇÇ赿 318È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(Inductively Coupled Plasma Mass Spectrometer (ICP-MS))
Á¦ÀÛ»ç
PerkinElmer
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NexION-300D
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Á¦1½ÇÇ赿 318È£
Àåºñ¸í
¹æ»ç¼± µ¿À§¿ø¼Ò ¾×ü ¼¶±¤ °è¼ö±â(Liquid Scintillation Analyzer)
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PerkinElmer
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Tri-carb 2910TR
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Á¦1½ÇÇ赿 318È£
Àåºñ¸í
ÀúÁØÀ§ ¾×ü¼¶±¤ºÐ¼®±â(Low Activity Liquid Scintillation Analyzer)
Á¦ÀÛ»ç
PerkinElmer
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Tri-Carb 5110 TR
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Á¦1½ÇÇ赿 318È£
Àåºñ¸í
µµ¸³ Çö¹Ì°æ(Inverted Microscope)
Á¦ÀÛ»ç
OLYMPUS
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IX71
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Á¦2°øÇаü 033È£
Àåºñ¸í
±¤ÇÐ½Ä 3Â÷¿ø ºñÁ¢ÃË ½ºÄ³³Ê(Optical 3D Scanner)
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FARO
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Focus 3D S120
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Á¦2°øÇаü 206È£
Àåºñ¸í
3D ÇÁ¸°ÅÍ(3D Printer)
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Stratasys
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Objet Eden260V
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Á¦2°øÇаü 504È£
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Àç»ý ÁõÆø±â(Regenerative Amplifier System)
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Spectra-Physics
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Spitfire Ace
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Á¦2°øÇаü 504È£
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°íÈ¿À² À̹Ì¡ ½Ã½ºÅÛ(Electron Multiplying Charge-Coupled Device (EMCCD))
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Andor
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iXon DU-897
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Á¦3°øÇаü 006È£
Àåºñ¸í
Çö¹Ì°æ Stage ¹× Á¶Àý ½Ã½ºÅÛ(Microscope Stage and Controller System)
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Applied Scientific Instrumentation (ASI)
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MS-2000
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Á¦3°øÇаü 006È£
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¹ü¿ë ¹Ð¸µ ¸Ó½Å´×¼¾ÅÍ(Universal Milling Machining Center)
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±âÈï±â°è
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KMB-U3
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Á¦3°øÇаü 007È£
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°íÁÖÆÄ À¯µµ °¡¿­ ¿ëÇØ·Î(High Frequency Induction Heater)
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EMWise Communications
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Á¦3°øÇаü 105È£
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±Ø¹Ì±¤ °ËÃâ Ä«¸Þ¶ó(Intensified Charged Coupled Device (ICCD))
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Princeton Instruments
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PI-MAX4-1024i
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Á¦3°øÇаü 105È£
Àåºñ¸í
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System)
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COHERENT
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COMPex Pro
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Á¦3°øÇаü 206È£
Àåºñ¸í
´ÙÀÌ¿Àµå ·¹ÀÌÀú Á¶Àý±â(Digital Controller for Diode Lasers)
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Toptica Photonics
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DLC pro
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Á¦3°øÇаü 402È£
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ÆèÅäÃÊ ÆÞ½º ·¹ÀÌÀú ½Ã½ºÅÛ(Femtosecond Pulse Laser System)
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COHERENT
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Chameleon
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Á¦3°øÇаü 502AÈ£
Àåºñ¸í
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System)
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COHERENT
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COMPex Pro 199F
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Á¦3°øÇаü 508È£
Àåºñ¸í
´Ù¸ñÀû ¹Ú¸· Ç¥¸é±¸Á¶ ºÐ¼® ¿øÀÚ Çö¹Ì°æ Àåºñ(Muti-purpose Atomic Force Microscope (AFM) System)
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Bruker
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MultiMode 8
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Á¦3°øÇаü 529È£
Àåºñ¸í
32ä³Î ³úÆÄ ÃøÁ¤ ½Ã½ºÅÛ(32-Channel Electroencephalogram (EEG) Measurement System)
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LAXTHA
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LXE3232-RF
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Á¦4°øÇаü 005È£
Àåºñ¸í
¹«¼± ±ÙÀüµµ ½Ã½ºÅÛ(Electromyographic (EMG) and Sensor System)
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NORAXON
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TELEMYO 2400R G2
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Á¦4°øÇаü 005È£
Àåºñ¸í
¼ºÇü»çÃâ±â(Injection Machine)
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Battenfeld Kunststoffmaschinen
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Microsystem 50
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Á¦5°øÇаü 006È£
Àåºñ¸í
¼ºÇü»çÃâ±â(Injection Machine)
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SUMITOMO HEAVY INDUSTRIES, LTD
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SE50D
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Á¦5°øÇаü 006È£
Àåºñ¸í
³ª³ë½Ã½º SPM Á¶Àý ½Ã½ºÅÛ(Nanonis Scanning Probe Microscopy (SPM) Control System)
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SPECS
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SPECS Nanonis Controller
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Á¦5°øÇаü 008È£
Àåºñ¸í
3D ÇÁ¸°ÅÍ(3D Printer)
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(ÁÖ)ÇÁ·ÎÅäÅØ
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Dimension SST 1200es
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Á¦5°øÇаü 104È£
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µµ¸³ Çö¹Ì°æ(Inverted Microscope)
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OLYMPUS
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CKX41
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Á¦5°øÇаü 204È£
Àåºñ¸í
Àç·á½ÃÇè±â(Nano Testing System)
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MTS
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Nano UTM Testing System
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Á¦5°øÇаü 206-1È£
Àåºñ¸í
¿øÀÚ°£·Â Çö¹Ì°æ(Atomic Force Microscope (AFM))
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SEIKO INSTRUMENTS INC.
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SPI3800N Pro
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Á¦5°øÇаü 206-1È£
Àåºñ¸í
ÆØÃ¢°è¼ö ÃøÁ¤±â(Dilatometer System)
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ERICH NETZSCH GmbH & Co. Holdi
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DIL 402C Dilatometer
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Á¦5°øÇаü 206È£
Àåºñ¸í
¼ÒÇü ÄÄÆÄ¿îµù Àåºñ(Mini Compounder)
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(ÁÖ)½êŏŨ
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Twin Screw Mixer
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Á¦5°øÇаü 206È£
Àåºñ¸í
¿­Áß·®-½ÃÂ÷Áֻ翭·®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC))
Á¦ÀÛ»ç
Mettler Toledo
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Mettler Toledo AG
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Á¦5°øÇаü 206È£
Àåºñ¸í
¸ð¼¼°üÇü°¡¿­·Î(Capillary Furnace System)
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Malvern Instruments
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Rosand RH7
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Á¦5°øÇаü 206È£
Àåºñ¸í
»ó¿Â¿­È®»êµµÃøÁ¤Àåºñ(Flash Diffusivity Testing Apparatus)
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ERICH NETZSCH GmbH & Co. Holdi
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LFA 467
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Á¦5°øÇаü 304È£
Àåºñ¸í
ÆèÅäÃÊ ·¹ÀÌÀú ½Ã½ºÅÛ(Femtosecond Laser System)
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COHERENT
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Libra
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Á¦5°øÇаü 406È£
Àåºñ¸í
·¹ÀÌÀú À¯µµºØ±« ºÐ±¤±â(Laser-induced Breakdown Spectroscopy (LIBS))
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Applied Spectra
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Aurora LIBS module
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Á¦5°øÇаü 423È£
Àåºñ¸í
µ¿Àû±¤»ê¶õ ºÐ±¤±â(Dynamic Light Scattering Spectroscopy)
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Malvern Instruments
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Nano ZS90
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Á¦5°øÇаü 423È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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(ÁÖ)¼¼´ÏÁ¨
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Dionex Aquion IC system
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Áö°î¿¬±¸µ¿ 228È£
Àåºñ¸í
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM))
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Bio-logic SAS
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M470
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Áö°î¿¬±¸µ¿ 228È£
Àåºñ¸í
Ç¥¸éÈûÃøÁ¤±â(Surface Force Apparatus (SFA))
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SurForce LLC
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SFA 2000
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Áö°î¿¬±¸µ¿ 230È£
Àåºñ¸í
Ç¥¸éÈûÃøÁ¤±â(Surface Force Apparatus (SFA))
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SurForce LLC
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SFA 2000
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Áö°î¿¬±¸µ¿ 230È£
Àåºñ¸í
¼±Çü À̿ Ʈ·¦ Áú·®ºÐ¼®±â(Linear Ion Trap Mass Spectrometry)
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Thermo Scientific
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VELOS PRO
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Áö°î¿¬±¸µ¿ 232È£
Àåºñ¸í
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM))
Á¦ÀÛ»ç
JEOL
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JSM-6010LV
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Áö°î¿¬±¸µ¿ 232È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
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Dynamic Systems
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GLEEBLE 3500
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ö°­´ëÇпø 142-4È£
Àåºñ¸í
´ëÇüÀý´Ü±â(Large Automatic Cut-off Machine)
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Struers
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Axitom-5
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ö°­´ëÇпø 146-8È£
Àåºñ¸í
¸¶¿îÆÃ Àåºñ(CitoPress Mounting Equipment)
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Struers
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Citopress-20
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ö°­´ëÇпø 146-8È£
Àåºñ¸í
¿¬¸¶±â(Grinding/Polishing Machine)
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Struers
¸ðµ¨¸í
Abrapol-20
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ö°­´ëÇпø 146-8È£
Àåºñ¸í
¸ÖƼ ½ºÄÉÀÏ ¹Ì¼¼±¸Á¶ ºÐ¼® ½Ã½ºÅÛ(Multi-scale Microstructure Analysis System)
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JEOL
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Neo-ARM
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ö°­´ëÇпø 161È£
Àåºñ¸í
¹ß±¤ºÐ±¤ºÐ¼®±â(Optical Emission Spectrometer)
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OBLF gmbh
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OBLF QSN 750
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ö°­´ëÇпø 171-3È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
Á¦ÀÛ»ç
Thermo Scientific
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iCAP 6500 DUO
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ö°­´ëÇпø 176È£
Àåºñ¸í
¿­Áß·®/¿­·® µ¿½Ã ºÐ¼®±â(Thermal Analyzer System)
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netzsch geraetebau gmbh
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STA 449C
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ö°­´ëÇпø 178-9È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
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Dynamic Systems
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GLEEBLE 3500
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ö°­´ëÇпø 242-4È£
Àåºñ¸í
ÆØÃ¢°è¼ö ÃøÁ¤±â(Dilatometer System)
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bahr-thermoanalyse gmbh
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DIL805A/D
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 242-4È£
Àåºñ¸í
Ç¥¸é󸮽ýºÅÛ(Target Surfacing System)
Á¦ÀÛ»ç
Leica Microsystems
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EM TXP
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ö°­´ëÇпø 250È£
Àåºñ¸í
Áø°øÁÖÁ¶±â(Vacuum Casting Machine)
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¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ
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MC100V
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ö°­´ëÇпø 272È£
Àåºñ¸í
Áø°ø-°¡¾Ð ¿ëÇØ ¹× ¿¬¼ÓÁÖÁ¶ÀåÄ¡(Vacuum-over Pressure Continuous Casting Machine)
Á¦ÀÛ»ç
¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ
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VCC 1000 (indutherm)
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 272È£
Àåºñ¸í
°í¿ÂÀÎÀå½ÃÇè±â(High Temp Universel Testing Instrument)
Á¦ÀÛ»ç
INSTRON
¸ðµ¨¸í
M5582
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ö°­´ëÇпø 284È£
Àåºñ¸í
³ª³ë Àε§ÅÍ(Nano Indenter)
Á¦ÀÛ»ç
Agilent Technologies
¸ðµ¨¸í
Nano Indenter G200
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ö°­´ëÇпø 284È£
Àåºñ¸í
TEM¿ë À̿¹иµ½Ã½ºÅÛ(Ion Milling System for Transmission Electron Microscope (TEM))
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¢ßÁö¿¤ÄÚÆÛ·¹À̼Ç
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Gatan model 691
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 284È£
Àåºñ¸í
Àç·á½ÃÇè±â(Advanced Indentation System)
Á¦ÀÛ»ç
(ÁÖ)ÇÁ·Ðƽ½º
¸ðµ¨¸í
AIS2000
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ö°­´ëÇпø 312-4È£
Àåºñ¸í
±Ý¼Ó ÆÇÀç ÀÎÀå¾ÐÃà½ÃÇè±â(Sheet Metal Deformation Simulator)
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¢ß¾Ë¾Øºñ
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RB319
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 312-4È£
Àåºñ¸í
¹ü¿ë ½ÃÇè±â(Universal Sheet Metal Testing Machine)
Á¦ÀÛ»ç
ERICHSEN
¸ðµ¨¸í
145-60
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 331-3È£
Àåºñ¸í
°í¼ÓÀÎÀåÃæ°Ý½ÃÇè±â(High Strain Tensile Impact Tester)
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´ëµ¿Á¤¹Ð
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 331-3È£
Àåºñ¸í
±ÝÇüÅ×½ºÅͱâ(U Draw Test Mold for Servo Press)
Á¦ÀÛ»ç
R&B
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 331-3È£
Àåºñ¸í
±¤ ÀÚ±â Ä¿ Çö¹Ì°æ(Magneto-Optical Kerr-Microscope)
Á¦ÀÛ»ç
Evico magnetics GmbH
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Axio Imager D1m
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 374È£
Àåºñ¸í
¾ÆÅ©¿ëÇØ·Î(Arc Melting Furnace)
Á¦ÀÛ»ç
¾ÆÀ̾¾Æ¼
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KHAM-500
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ö°­´ëÇпø 374È£
Àåºñ¸í
½ºÆÛÅÍ / Áø°øÁõÂø ÀåÄ¡(Sputtering / Vacuum Deposition System)
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¾ÆÀ̾¾Æ¼
¸ðµ¨¸í
Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 374È£
Àåºñ¸í
±Ý¼Ó Żź ¿­Ã³¸® ½Ã½ºÅÛ(Tube Type Furnace System)
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¢ßº£½º
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 380È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
Á¦ÀÛ»ç
INSTRON
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INSTRON 8801
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 416-8È£
Àåºñ¸í
ÇǷνÃÇè±â(Fatigue Testing Machine)
Á¦ÀÛ»ç
INSTRON
¸ðµ¨¸í
INSTRON 8801
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 416-8È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
Á¦ÀÛ»ç
INSTRON
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INSTRON 8801
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 416È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
Á¦ÀÛ»ç
INSTRON
¸ðµ¨¸í
INSTRON 8501
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 431-3È£
Àåºñ¸í
Àç·á½ÃÇè±â(Material Testing Machine)
Á¦ÀÛ»ç
INSTRON
¸ðµ¨¸í
INSTRON 8862
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 431-3È£
Àåºñ¸í
¹ü¿ë Àç·á ½ÃÇè±â(Universal Testing System)
Á¦ÀÛ»ç
INSTRON
¸ðµ¨¸í
INSTRON 3382
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 431-3È£
Àåºñ¸í
¼ö¼Ò·® ºÐ¼® ½Ã½ºÅÛ(Total Dissolved Solids (TDS) System for Hydrogen Analysis)
Á¦ÀÛ»ç
R-Dec
¸ðµ¨¸í
HTDS-003
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 435-7È£
Àåºñ¸í
¼ö¿­ÇÕ¼ºÀåºñ(500 mL Stirred Autoclave System)
Á¦ÀÛ»ç
¢ßÀϽſÀÅäŬ·¹À̺ê
¸ðµ¨¸í
Ư¼öÁ¦ÀÛ
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 472È£
Àåºñ¸í
µ¿Àû±¤»ê¶õ ºÐ±¤±â(Dynamic Light Scattering Spectroscopy)
Á¦ÀÛ»ç
Malvern Instruments
¸ðµ¨¸í
Nano ZS
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 476È£
Àåºñ¸í
°í¼ÓÁÖÁ¶ ÁÖÆí ³Ã°¢ ¹× ÀÀ°í simulator(Simulator for Solidification and Cooling of a Slab during High Speed Continuous Casting)
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¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ
¸ðµ¨¸í
Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
°í¿Â½ÃÂ÷Áֻ翭·®°è(High Temperature Differential Scanning Calorimeter)
Á¦ÀÛ»ç
¢ß½ÅÄÚ¿¥¾ØÆ¼
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Labsys Evo DSC
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 480È£
Àåºñ¸í
IET ¸ôµåÇ÷°½º ½Ã·á Á¦Á¶ ÀåÄ¡(High Frequency Induction Furnacer)
Á¦ÀÛ»ç
¿¤ÅØ
¸ðµ¨¸í
Ư¼öÁ¦ÀÛ
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 480È£
Àåºñ¸í
½½·¡±×¿ëÇØ ¹× ³Ã°¢ÀåÄ¡(Slag Dissolution and Cooling System)
Á¦ÀÛ»ç
¸°Å×Å©
¸ðµ¨¸í
Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
°øÃÊÁ¡ ·¹ÀÌÀú ÁÖ»ç Çö¹Ì°æ(Confocal Laser Scanning Microscope)
Á¦ÀÛ»ç
Lasertec Corporation
¸ðµ¨¸í
VL2000DX
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ö°­´ëÇпø 546È£
Àåºñ¸í
°í¿Â°¡¿­·Î(Image Furnace System)
Á¦ÀÛ»ç
ULVAC
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MR-39H/D
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 546È£
Àåºñ¸í
¾ÐÃà ¹× ÀÎÀå½ÃÇè±â(Tensile Compress Test Machine)
Á¦ÀÛ»ç
INSTRON
¸ðµ¨¸í
INSTRON 5848
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 546È£
Àåºñ¸í
¿­Áß·®-½ÃÂ÷Áֻ翭·®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC))
Á¦ÀÛ»ç
Mettler Toledo
¸ðµ¨¸í
TGA/DSC1
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ö°­´ëÇпø 546È£
Àåºñ¸í
µµ°¡´Ï ºÎÇÏ ½Ã½ºÅÛ(1600 ¡ÆC Furnace Crucible Leading System)
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Lenton
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LTF-16/75/610
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ö°­´ëÇпø 546È£
Àåºñ¸í
±Þ¼Ó°¡¿­ÀåÄ¡(Infrared Gold Image Furnace)
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ÅäÅ»¼Ö·ç¼Ç°úÇÐ
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VHT-E44
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ö°­´ëÇпø 546È£
Àåºñ¸í
¿ëÀ¶Á¡/Á¢Ã˰¢ ½Ã½ºÅÛ(Heating Microscope)
Á¦ÀÛ»ç
export system solutions s.r.i
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misura hsm
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ö°­´ëÇпø 572È£
Àåºñ¸í
À̹ÌÁö½Ã½ºÅÛ(Imaging System)
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Dantec Dynamics A/S
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Advanced Imaging System
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ö°­´ëÇпø 572È£
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°íÁÖÆÄ À¯µµ °¡¿­ ¿ëÇØ·Î(High Frequency Induction Heater)
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ö°­´ëÇпø 580È£
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¿ëÇØ¿ë À¯µµ°¡¿­ ÀåÄ¡(Induction Heating System for Melting)
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PSTEK
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ö°­´ëÇпø 584È£
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Å©¸®ÇÁ ½ÃÇè±â(Lever Arm Type Creep Tester System)
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ats technology, Inc
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Series 2320 Lever Arm Tester
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ö°­´ëÇпø B106È£
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Àç·á½ÃÇè±â(Universal Materials Testing Machine)
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zwick gmbh & co. kg
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ZWICK 100KN
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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ÇǷνÃÇè±â(Fatigue Testing Machine)
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INSTRON
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MicroTester5848
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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¾ÐÃà ¹× ÀÎÀå½ÃÇè±â(Tensile Compress Test Machine)
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INSTRON
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INSTRON 4482
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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ÀÌ¼Ó ¾Ð¿¬Àåºñ(Differential Speed Rolling Machine)
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¢ß¸ðÀνýº
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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°íÁÖÆÄ À¯µµ °¡¿­ ¿ëÇØ·Î(Vacuum Induction Melting and Casting Furnace)
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ALD Vacuum Technologies
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VIM4
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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Áø°øºÐ±¤°è(Fourier Transform Infrared)
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Bruker
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VERTEX 80v with HYPERION 2000
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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¹úÁö/FLC ½ÃÇè±â(Bulge/Forming Limit Curves (FLC) Tester)
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ERICHSEN
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Model 161
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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¼ÒÇü ¾Ð¿¬½ÇÇè±â(Small Scale Calliber Rolling Machine)
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caliber rolling machine
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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ÀÌÃàÀÎÀå ½ÃÇè±â(Biaxial Tensile Testing machine)
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Kokusai Co. Ltd
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KBAT-100
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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½Ç½Ã°£ X-¼± °Ë»ç±â(Realtime X-ray Inspection System)
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¢ßÀÚºñ½º
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X-Scan 7950
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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º¥µù ±â°è(Bending Machine)
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¢ß·ºÅͽ¼
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UTM-B10T
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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¿­°£¾Ð¿¬±â(Pilot 4Hi-Hot Rolling Mill)
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PTW sreel solution
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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°¡¼ÓÀ²¿­·®°è(ARC (Accelerating Rate Calorimeter))
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Thermal Hazard Technology (THT)
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ES-ARC_ ARCSYS-001, ARCSYS-SBK
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ģȯ°æ¼ÒÀç´ëÇпø 184, 186È£
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ÀúÀü¾Ð °íºÐÇØ´É Àü°è¹æÃâÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope)
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CARL ZEISS MICROSCOP
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Gemini 360
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ģȯ°æ¼ÒÀç´ëÇпø 184, 186È£
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½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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¾ÆÆå½º(ÁÖ)
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EOS-310(Á¦ÀÛǰ)
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Æ÷Ç×°¡¼Ó±â¿¬±¸¼Ò ÀúÀ帵µ¿ 118È£
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RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System)
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(ÁÖ)¿ïÅØ
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URS-100
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Æ÷Ç×°¡¼Ó±â¿¬±¸¼Ò ÀúÀ帵µ¿ 118È£
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3Â÷¿ø¼¼Æ÷ÇÁ¸°ÅÍ(3D Bioprinter)
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T&R Biofab
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DX-Printer
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ cGMP
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3Â÷¿ø¼¼Æ÷ÇÁ¸°ÅÍ(3D Bioprinter)
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T&R Biofab
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DX-Printer
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ cGMP
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Á¡Åº¼ºÃøÁ¤±â(Rheometer system)
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Ta Instruments
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DHR-20
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
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CellScale
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MicrotesterG2
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
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3D ¹ÙÀÌ¿ÀÇÁ¸°ÅÍ(Extrusion-based 3D Bioprinter)
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CELLINK
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BIO X
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
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Àε¥ÄÚ
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Ư¼öÁ¦ÀÛ
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dzµ¿µ¿ 105È£
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´ëÇüdzµ¿(Wind Tunnel)
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Ư¼öÁ¦ÀÛ
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dzµ¿µ¿ 107È£
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ȸ·ù¼öÁ¶(Circulating Water Channel)
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V2-30B
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dzµ¿µ¿ 107È£
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½ºÆÃ ¹ë·±½º(Sting Balance)
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AEROLAB
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1/2 A
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dzµ¿µ¿ 107È£
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Slit jet ³Ã°¢Çì´õ ¸ðÇü ¹× ºÎ°¡ÀåÄ¡(Slit Jet Cooling Header Model)
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Ư¼öÁ¦ÀÛ
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dzµ¿µ¿ 107È£
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X-ray ÃøÁ¤½Ã½ºÅÛ(X-ray Measurement System)
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Varian A272
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dzµ¿µ¿ 108È£
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Àü±âÈ­ÇÐ ºÐ¼®±â(Electrochemical Analyzer System)
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Advanced Measurement Technology
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2101A
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µµ¸³ Çö¹Ì°æ(Inverted Microscope)
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OLYMPUS
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IX73
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Çѱ¹·Îº¿À¶ÇÕ¿¬±¸¿ø 411È£
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°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¼±Çü À̿ Ʈ·¦ Áú·® ºÐ¼®±â(HPLC dual-cell linear ion trap mass spectrometer (HPLC-ESI-MS))
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Thermo Scientific
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LTQ Velos Pro
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È­Çаü 112È£
Àåºñ¸í
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Technologies
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-/5975C
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ȯ°æ°øÇе¿ 103/104È£
Àåºñ¸í
´ÙÁß°ËÃâ À¯µµ°áÇÕÇöóÁ Áú·®ºÐ¼®±â(Multi-Collector Inductively Coupled Plasma Mass Spectrometer (MC-ICP-MS))
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Nu Instruments Ltd
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Plasma 3
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ȯ°æ°øÇе¿ 105È£
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À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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Thermo Scientific
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iCAP 7400
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ȯ°æ°øÇе¿ 106È£
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°í¾Ð¿ë ºÎÇÇ½Ä ÈíÂøÀåºñ ¼ö¼Ò¿¡³ÊÁö ÀúÀå·® ÃøÁ¤ ÀÚµ¿È­ Àåºñ(Volumetric Sorption Measurement System)
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Setaram
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PCT Pro
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ȯ°æ°øÇе¿ 110È£
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Çü±¤ºÐ¼®±â(Luminometer)
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Thermo Labsystems
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Luminoskan Ascent
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ȯ°æ°øÇе¿ 206-1È£
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¿°±â¼­¿­ºÐ¼®±â(Ion Personal Genome Machine)
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Thermo Scientific
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Ion Personal Genome Machine (PGM) System
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ȯ°æ°øÇе¿ 206-1È£
Àåºñ¸í
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Technologies
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7890B/-
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ȯ°æ°øÇе¿ 207È£
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Áú¼Ò ¹× ´Ü¹éÁú ºÐ¼®ÀåÄ¡(Automatic Nitrogen and Protein Analyzer)
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Foss
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Kjeltec 2300
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ȯ°æ°øÇе¿ 230È£
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À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Metrohm
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790 Personal IC
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ȯ°æ°øÇе¿ 230È£
Àåºñ¸í
°í¼º´É ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ(High Performance Liquid Chromatograph (HPLC))
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Agilent Technologies
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1260 Infinity
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ȯ°æ°øÇе¿ 302È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Dionex
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ICS-2100
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ȯ°æ°øÇе¿ 302È£
Àåºñ¸í
±¤ ¿¡³ÊÁö Àüȯ·ü ÃøÁ¤±â(Incident Photon-to-electron Conversion Efficiency (IPCE) System)
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NEWPORT
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Newport 74125
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ȯ°æ°øÇе¿ 302È£
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±âÆÇ ±â¹Ý ¹°Áú Á¦ÀÛ¿ë ¾Æ³ë´ÙÀÌÁî(Anodizer for AAO)
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TERALEADER
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TAD-001-2CH
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ȯ°æ°øÇе¿ 302È£
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Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer)
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Thermo Scientific
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Nicolet iS50
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ȯ°æ°øÇе¿ 302È£
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·¹¿À¹ÌÅÍ(Rheometer System)
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TA Instruments
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DHR-1
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¹«±âź¼ÒºÐ¼®±â(Total Inorganic Carbon Analyzer)
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UIC INC.
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CM5017
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ȯ°æ°øÇе¿ 312È£
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Áß°£¹°Áú È­ÇÐÁ¾ ºÐ¼®±â(Reactive Intermediate Species Analyzer)
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Global Fia
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PC-25232/Flame-T/NEOFOX-KIT-PATCH
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ȯ°æ°øÇе¿ 312È£
Àåºñ¸í
LC/MS/MS ½Ã½ºÅÛ(LC/MS/MS System)
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Waters
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Acquity HPLC System/TQ Detector
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ȯ°æ°øÇе¿ 317
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Ź»óÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Mini Scanning Electron Microscope (SEM))
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SEC
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SNE4500M
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ȯ°æ°øÇе¿ 322È£
Àåºñ¸í
¿­Áß·®-½ÃÂ÷Áֻ翭·®ºÐ¼®±â(Thermogravimetric Analysis-Differential Scanning Calorimetry (TGA-DSC))
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TA Instruments
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SDT Q600
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ȯ°æ°øÇе¿ 322È£
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°í¼Ó ´Ü¹éÁú ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ (FPLC)(Fast Protein Liquid Chromatography (FPLC))
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GE Healthcare
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AKTA FPLC
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ȯ°æ°øÇе¿ 331È£
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°í¼Ó ´Ü¹éÁú ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ (FPLC)(Fast Protein Liquid Chromatography (FPLC))
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GE Healthcare
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AKTApilot
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ȯ°æ°øÇе¿ 331È£
Àåºñ¸í
TFF ½Ã½ºÅÛ(Tangential Flow Filtration (TFF) System)
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MERCK
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Cogent M1 TFF System
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ȯ°æ°øÇе¿ 331È£
Àåºñ¸í
ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System)
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Thermo Scientific
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Dionex ICS-5000
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ȯ°æ°øÇе¿ 331È£
Àåºñ¸í
°øÃÊÁ¡ ·¹ÀÌÀú ÁÖ»ç Çö¹Ì°æ(Confocal Laser Scanning Microscope)
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OLYMPUS
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FV3000
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ȯ°æ°øÇе¿ 333È£
Àåºñ¸í
¾Æ¹Ì³ë»ê Á¶¼ººÐ¼®±â(Auto Amino Acid Analyzer)
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¾ÆÁÖ°úÇÐ
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Automatic amino acid analyzer S433
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ȯ°æ°øÇе¿ 334È£
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µµ¸³ Çü±¤ Çö¹Ì°æ(Inverted Fluorescence Microscope)
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NIKON
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Eclipse Ti2
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ȯ°æ°øÇе¿ 403È£
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Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer)
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PerkinElmer
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Spectrum Two
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ȯ°æ°øÇе¿ 403È£
Àåºñ¸í
Ç¥¸é ¹°¼º ÃøÁ¤±â(Force Tensiometer)
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Kruss
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K100
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ȯ°æ°øÇе¿ 403È£
Àåºñ¸í
Ź»óÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Mini Scanning Electron Microscope (SEM))
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SEC
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SNE4000M
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ȯ°æ°øÇе¿ 410È£
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Àڿܼ± ÆòÇ౤ Á¶»ç ½Ã½ºÅÛ(Mask Aligner and Exposure System)
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PROWIN
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M150P
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ȯ°æ°øÇе¿ 410È£
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ÀÓÇÇ´ø½º ÃøÁ¤Àåºñ(Impedance Analyzer System)
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BioLogic
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VSP-300
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ȯ°æ°øÇе¿ 412È£
Àåºñ¸í
ÀÓÇÇ´ø½º ÃøÁ¤Àåºñ(Impedance Analyzer System)
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BioLogic
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VSP-300
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ȯ°æ°øÇе¿ 412È£
Àåºñ¸í
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Techonologies
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7890B/5977B
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ȯ°æ°øÇе¿ 412È£
Àåºñ¸í
°í¼º´É ¾×ü Å©·Î¸¶Åä±×·¡ÇÇ(High Performance Liquid Chromatograph (HPLC))
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Waters
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e2695
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ȯ°æ°øÇе¿ 412È£
Àåºñ¸í
°øÃÊÁ¡ ·¹ÀÌÀú ÁÖ»ç Çö¹Ì°æ(Confocal Laser Scanning Microscope)
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Carl Zeiss
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LSM 5
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ȯ°æ°øÇе¿ 414È£
Àåºñ¸í
ÁÖ»çÀüÀÚÇö¹Ì°æ(Scanning Electron Microscope (SEM))
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JEOL
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JSM-6510
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ȯ°æ°øÇе¿ 414È£
Àåºñ¸í
ÇÙ»ê ÃßÃâ±â(Auto Nucleic Acid Preparation System)
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Precision System Science
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Magtration System 12GC
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ȯ°æ°øÇе¿ 414È£
Àåºñ¸í
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer)
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Thermo Scientific
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Nicolet 6700
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ȯ°æ°øÇе¿ 417È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Dionex
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ICS-1100
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ȯ°æ°øÇе¿ 417È£
Àåºñ¸í
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer)
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Thermo Scientific
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Nicolet iS50
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ȯ°æ°øÇе¿ 431È£
Àåºñ¸í
Àû¿Ü¼± ºÐ±¤±â(Fourier-transform Infrared (FT-IR) Spectrometer)
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Thermo Scientific
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Nicolet iS20
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ȯ°æ°øÇе¿ 431È£
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»ê¼ººñ ÀÚµ¿Ã¤Ãë±â(Automatic Acid Rain Sampler)
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Eigenbrodt GmbH & Co. KG
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NSA 181 / KE
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