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Equipment Information
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System)
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Equip. Info.
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Reservation
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10108730
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RIE ½Ã½ºÅÛ
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Reactive Ion Etching (RIE) System
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SNTEK
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Reactive Ion Etching (RIE) System
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Reactive Ion Etching
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RIST3µ¿ 3219È£
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ȲÇö»ó
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054-279-2155
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hwanghs@postech.ac.kr
µ¿ÀÏ/À¯»çÀåºñÁ¤º¸
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À¯¼¼Æ÷ ºÐ¼®±â(Accuri C6 plus System)
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BD Biosciences
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BD Accuri¢â C6 Plus
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202-1È£
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[±Û·ÎÄÃ] ÆÄ¿ö·¦¾¾ µðÁöÅÐ µ¥ÀÌÅÍ ¼öÁý ½Ã½ºÅÛ([Glocal] PowerLab C Digital Data Collection System)
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(ÁÖ)¶óÀÌÇÁÅØ
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PowerLab C
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206È£
Àåºñ¸í
PCR ½Ã½ºÅÛ(GeneAmp PCR System 9700)
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Thermo Fisher Scientific
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GeneAmp PCR System 9700
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410È£
Àåºñ¸í
ÃÊ°í¼º´É ÀÚµ¿ ¼¼Æ÷ºÐ¼®±â(Ultra High-End Performance Flow Cytometry System)
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Beckman Coulter
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cyotoFLEX LX
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729È£
Àåºñ¸í
Á¶Á÷Åõ¸íÈ­½Ã½ºÅÛ(CLARITY-Tissue Clearing system)
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·Î°í¹ÙÀÌ¿À½Ã½ºÅÛ
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X-clarity
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BOIC 4210È£
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Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷))
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Merck Millipore
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Milli-Q¢ç IQ 7015
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BOIC [3307È£]
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¹ÙÀÌ¿ÀºÐÀÚ À̹Ì¡ ½Ã½ºÅÛ(Biomolecular Imaging System)
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GE Healthcare(Çö Cytiva)
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Amersham Imager 600
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BOIC [4307È£]
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(GLOCAL)´ÜÀϼ¼Æ÷ À̹Ì¡ °ø°£ ºÐ¼® ½Ã½ºÅÛ(Ultra high-multiplexed single cell spatial analysis system)
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Akoya Biosciences
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Phenocycler-Fusion 2.0
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BOIC [4308È£]
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Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷))
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Merck Millipore
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Milli-Q¢ç Q-POD¢ç
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BOIC [4313È£]
Àåºñ¸í
°í¼Ó ó¸®Çü±¤ ³ª³ëÀε§Å×ÀÌ¼Ç (Nanoindentation )
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OPTIC11 LIFE
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Pavone
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C5
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È­Çй߱¤ À̹ÌÁö ÃøÁ¤ÀåÄ¡(Western Blot Imaging System)
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Cytiva
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Amersham Image Quant IQ800
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C5
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°íÈ¿À² ½Ã·á°Ë»ö ½Ã½ºÅÛ(High throughput screening system)
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Revvity
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Fontus NGS
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C5
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´ë¿ë·® Â÷¼¼´ë¿°±â¼­¿­ºÐ¼® ½Ã½ºÅÛ(Next-Generation Sequencing system)
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Illumina
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NextSeq1000
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C5
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·¹ÀÌÀú ½Ã½ºÅÛ(Tunable Laser System)
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Amplitude
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Surelite OPO
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C5 228È£
Àåºñ¸í
¿¬±¸¿ë ÃÊÀ½ÆÄ ½Ã½ºÅÛ(Research Ultrasound System)
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Verasonics
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VANTAGE 256
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C5 228È£
Àåºñ¸í
·¡ÇÎ&Æú¸®½Ì ½Ã½ºÅÛ(Lapping & Polishing System)
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LOGITECH
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PM6
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C5 228È£
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ÀÓÇÇ´ø½º ÃøÁ¤Àåºñ(Impedance Analyzer System)
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Keysight Technologies
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E4990A
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C5 232È£
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ü¿Ü »ýü Á¶Á÷ Èû ÃøÁ¤ ÀåÄ¡(Isolated Muscle System)
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Aurora Scientific
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1500A
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C5 232È£
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Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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´ëµ¿ÇÏÀÌÅØ
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DD-GT103R
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C5 329È£
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ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System)
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¿À¹æÅ×Å©³î·ÎÁö
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OBT-PC300
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C5 329È£
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ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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ÇѺû·¹ÀÌÀú
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GPPA-A377
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C5 329È£
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PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System)
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MUSASHI ENGINEERING, INC.
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IMAGE MASTER 350PC SMART/SHOTMASTER 300QX
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C5 329È£
Àåºñ¸í
¿ø·á ÁõÂø ½Ã½ºÅÛ(Materials Deposition System with Piezoelectric Inkjet Catridge)
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FUJIFILM
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Dimatix DMP-2850
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C5 329È£
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Áø°øÇÁ·Îºê½ºÅ×À̼Ç(Vacuum Chamber Probe Station)
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MS TECH
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M6VC
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C5 330È£
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¹ÝµµÃ¼ ½ºÀ§Äª ½Ã½ºÅÛ(Semiconductor Switching System)
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KEITHLEY Instruments
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707B
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C5 330È£
Àåºñ¸í
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station)
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MS TECH
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MST8000
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C5 332È£
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ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System)
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Specialty Coating Systems (SCS) - A KISCO Company
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PDS Labcoter 2 (PDS 2010 LABCOTER)
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C5 720-1È£
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½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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JUWON TECH
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JWMSS-200XL
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C5 721È£
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3D ÇÁ¸°ÅÍ(Standalone 3D printer system)
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3D Systems
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Figure 4 Standalone 3D Printer
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C5, 722È£(¹ÙÀÌ¿ÀÇコÄɾÅÍ)
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3D ±¼ÀýÇö¹Ì°æ(Low coherence holotomography systems)
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Tomocube
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HT-X1
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C5, 722È£(¹ÙÀÌ¿ÀÇコÄɾÅÍ)
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ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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TEMESCAL/BOC COATING TECH
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BDJ 1800
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LG¿¬±¸µ¿ 110È£
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ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station)
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The Micromanipulator Company
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No. 6000
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LG¿¬±¸µ¿ 110È£
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¸¶±×³×Æ®·Ð ½ºÆÛÅ͸µ Àåºñ(Magnetron Sputtering System)
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SNTEK
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SPR-5006
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LG¿¬±¸µ¿ 110È£
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ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station)
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The Micromanipulator Company
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No. 7100
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LG¿¬±¸µ¿ 202È£
Àåºñ¸í
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station)
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UNITEK CORPORATION
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-
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LG¿¬±¸µ¿ 212È£
Àåºñ¸í
Àç»ý ¹èÅ͸® ÆÑ Å×½ºÆ® ½Ã½ºÅÛ(Regenerative Battery Pack Test System)
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Chroma
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Model 17020
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LG¿¬±¸µ¿ 420È£
Àåºñ¸í
¹èÅ͸® ¼¿ Ãæ¹æÀü Àåºñ(Battery Cell Charge/Discharge Test System)
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Chroma
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Model 17011
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LG¿¬±¸µ¿ 420È£
Àåºñ¸í
´ë±âÁ¶Àý¹è¾çÀÛ¾÷´ë(Modular Atmosphere Control Workstation System)
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Don Whitley Scientific
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Don Whitley Scientific A55
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PBC 362È£
Àåºñ¸í
°í°¨µµ PDL Ȧ ÃøÁ¤ ½Ã½ºÅÛ (High Sensitivity Parallel Dipole Line Hall System )
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Semilab
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PDL 1000
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RIST 3µ¿ 3116/3118È£
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Çï·ý °¡½º ȸ¼ö¿ë ÄÄÇÁ·¹¼­(Helium Compressor and Filtering System)
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Bumhan
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BH-AL7B
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RIST1µ¿ 1018È£
Àåºñ¸í
¹°¸®Àû Ư¼º ÃøÁ¤ ½Ã½ºÅÛ(Physical Property Measurement System)
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Quantum Design
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Quantum Design PPMS
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RIST1µ¿ 1104È£
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Àڱ⹰¼ºÃøÁ¤ÀåÄ¡(MAGNETIC PROPERTY MEASUREMENT SYSTEM)
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QUANTUM DESIGN
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XL5
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RIST1µ¿ 1104È£
Àåºñ¸í
¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD))
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CN1
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Atomic-Basic
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RIST1µ¿ 1139È£
Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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Telemark
¸ðµ¨¸í
246-28
¼³Ä¡Àå¼Ò
RIST1µ¿ 1145È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
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Carl Zeiss
¸ðµ¨¸í
GeminiSEM 500
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RIST1µ¿ 1153È£
Àåºñ¸í
À̿ ¹Ð¸µ ½Ã½ºÅÛ(Cross Section Planar Ion Milling System)
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GATAN
¸ðµ¨¸í
Ilion+II Model 697
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RIST1µ¿ 1162È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
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Carl Zeiss
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AURIGA
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RIST1µ¿ 1163È£
Àåºñ¸í
Áý¼Ó À̿ºö(Focused Ion Beam (FIB))
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SII
¸ðµ¨¸í
SMI3050SE
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RIST1µ¿ 1169È£
Àåºñ¸í
¼öÂ÷º¸Á¤ ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs-Corrected Scanning Transmission Electron Microscope (Cs-STEM))
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JEOL
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JEM-ARM200F
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RIST1µ¿ 1176È£
Àåºñ¸í
Àü°è¹æÃâ Çö¹Ì°æ(Field Emission Electron Microscope)
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JEOL
¸ðµ¨¸í
JEM-2100F
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RIST1µ¿ 1188È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
Á¦ÀÛ»ç
JEOL
¸ðµ¨¸í
JSM-7600F
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RIST1µ¿ 1192È£
Àåºñ¸í
À̿ ºö ¹Ð¸µ ½Ã½ºÅÛ(Triple Ion Beam Miller)
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Leica Microsystems
¸ðµ¨¸í
EM TIC020
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RIST1µ¿ 1196È£
Àåºñ¸í
°¡½ººÎ½Ä½ÃÇè±â(Gas Corrosion Test Instrument)
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SUGA
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GT-100
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RIST1µ¿ 1272È£
Àåºñ¸í
°íºÐÇØ´É À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(High Resolution Inductively Coupled Plasma Mass Spectrometer (HR-ICP-MS))
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Thermo Scientific
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ELEMENT XR
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RIST1µ¿ 1304È£
Àåºñ¸í
·¹ÀÌÀú À¯µµ ÇöóÁ ºÐ±¤ºÐ¼®±â(Tandem Laser-ablation Laser-induced Breakdown Spectrometer (LA-LIBS))
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Applied Spectra
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J200
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RIST1µ¿ 1306È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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AMETEK
¸ðµ¨¸í
Spectro Arcos
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RIST1µ¿ 1309È£
Àåºñ¸í
¿øÀÚ Èí¼ö ºÐ±¤±â(Atomic Absorption Spectrometer (AAS))
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Analytik Jena
¸ðµ¨¸í
contrAA 800
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RIST1µ¿ 1309È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
Á¦ÀÛ»ç
PerkinElmer
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Optima 8300
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RIST1µ¿ 1311È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
Á¦ÀÛ»ç
Thermo Scientific
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iCAP 7000 Series
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RIST1µ¿ 1311È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
Á¦ÀÛ»ç
AMETEK
¸ðµ¨¸í
Spectro Arcos
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RIST1µ¿ 1311È£
Àåºñ¸í
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Technologies
¸ðµ¨¸í
7890B/5977A
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RIST1µ¿ 1314È£
Àåºñ¸í
GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Technologies
¸ðµ¨¸í
7890B/5977B
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RIST1µ¿ 1314È£
Àåºñ¸í
»ïÁß »ç±ØÀÚ LC/MS/MS ½Ã½ºÅÛ(Triple Quadrupole LC/MS/MS System)
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Thermo Scientific
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TSQ Quantum Ultra
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RIST1µ¿ 1316È£
Àåºñ¸í
¿­Å»Âø ÃøÁ¤ ½Ã½ºÅÛ(Thermal Desorption System)
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Markes International
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UNITY2
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RIST1µ¿ 1317È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Nittoseiko Analytech
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AQF-2100H
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RIST1µ¿ 1318È£
Àåºñ¸í
ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System)
Á¦ÀÛ»ç
Thermo Scientific
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Dionex ICS-5000
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RIST1µ¿ 1320È£
Àåºñ¸í
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer)
Á¦ÀÛ»ç
Malvern Instruments
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MASTERSIZER 2000
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RIST1µ¿ 1320È£
Àåºñ¸í
¸¶ÀÌÅ©·ÎÆÄ ½Ã·á ºÐÇØ ½Ã½ºÅÛ(Advanced Microwave Digestion System)
Á¦ÀÛ»ç
Milestone
¸ðµ¨¸í
ETHOS 1
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RIST1µ¿ 1334È£
Àåºñ¸í
HPT-E-CAPº¹ÇÕÇÁ·¹½º(HPT-E-CAP Compound Press System)
Á¦ÀÛ»ç
(ÁÖ)¸ðÀνýº
¸ðµ¨¸í
Ư¼öÁ¦ÀÛ
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RIST1µ¿ 2022È£
Àåºñ¸í
ÇǷμö¸í½ÃÇè±â(Material Test System)
Á¦ÀÛ»ç
MTS
¸ðµ¨¸í
810 Material Test System
¼³Ä¡Àå¼Ò
RIST2µ¿ 2193È£
Àåºñ¸í
ÇǷμö¸í½ÃÇè±â(Material Test System)
Á¦ÀÛ»ç
MTS
¸ðµ¨¸í
810 Material Test System
¼³Ä¡Àå¼Ò
RIST3µ¿ 3003È£
Àåºñ¸í
º¹ÇÕ ºÎ½Ä ½ÃÇè±â(Cyclic Corrosion Tester)
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Q-LAB
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Q-FOG CCT 1100
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RIST3µ¿ 3011È£
Àåºñ¸í
º¹ÇÕ »çÀÌŬ ½ÃÇè±â(Cyclic Corrosion Test Chamber)
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Ascott Analytical
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CC1000iP
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RIST3µ¿ 3016È£
Àåºñ¸í
º¹ÇÕ ºÎ½Ä ½ÃÇè±â(Cyclic Corrosion Tester)
Á¦ÀÛ»ç
Q-LAB
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Q-FOG CCT 1100
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RIST3µ¿ 3016È£
Àåºñ¸í
Áø°ø è¹ö Á¤¹Ð ºÐ¼® Àåºñ(Vacuum Chamber I-V Probing System)
Á¦ÀÛ»ç
MS TECH
¸ðµ¨¸í
MST5000
¼³Ä¡Àå¼Ò
RIST3µ¿ 3102È£
Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
Á¦ÀÛ»ç
Selcos
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Cetus-E
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RIST3µ¿ 3104È£
Àåºñ¸í
¿­ È­ÇÐ ±â»ó ÁõÂø ÀåÄ¡(Thermal Chemical Vapor Deposition (CVD) System)
Á¦ÀÛ»ç
SNTEK
¸ðµ¨¸í
TCS5000
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RIST3µ¿ 3104È£
Àåºñ¸í
Á¤¹ÐÀÚµ¿Àý´Ü±â(Linear Precision Saw)
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BUEHLER
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ISOMET4000
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RIST3µ¿ 3132È£
Àåºñ¸í
Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
Á¦ÀÛ»ç
TERALEADER
¸ðµ¨¸í
TLP1001
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RIST3µ¿ 3139È£
Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
Á¦ÀÛ»ç
iNFOVION
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-
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RIST3µ¿ 3147È£
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½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System)
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Roche
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LightCycler96
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RIST3µ¿ 3153È£
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Çü±¤/Àα¤ ÃøÁ¤ ½Ã½ºÅÛ(Fluoroscence/Luminescence Measuring System)
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Thermo Scientific
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Fluoroskan Ascent FL
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RIST3µ¿ 3161È£
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ºÐ±¤½Ã½ºÅÛ(Spectrometer System)
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(ÁÖ)¿µÇ³¾¾¿¥¾¾
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CS-2000
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RIST3µ¿ 3169È£
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PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System)
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MUSASHI ENGINEERING, INC.
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IMAGE MASTER 350PC SMART/SHOTMASTER 300DS-S
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RIST3µ¿ 3170È£
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¹ü¿ë ÇÁ·Îºê ½Ã½ºÅÛ(Universal Measurement Probe System)
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TERALEADER
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UMP100
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RIST3µ¿ 3170È£
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3D º¯ÇüÃøÁ¤½Ã½ºÅÛ(3D Deformation Analysis System)
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GOM international AG
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ARAMIS 12M
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RIST3µ¿ 3188È£
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ÁÖ»ç Åõ°ú ÀüÀÚÇö¹Ì°æ(Scanning Transmission Electron Microscope (STEM))
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COXEM
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CX-200
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RIST3µ¿ 3188È£
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Àڿܼ± ÆòÇ౤ Á¶»ç ½Ã½ºÅÛ(Mask Aligner and Exposure System)
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MIDAS SYSTEM
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MDA-400M
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RIST3µ¿ 3212È£
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½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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SNTEK
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RSP-5000
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RIST3µ¿ 3219È£
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ÇöóÁ ¿øÀÚÃþ ÁõÂø ½Ã½ºÅÛ(Plasma Enhanced Atomic Layer Deposition (PE-ALD) System)
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ForALL
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OZONE
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RIST3µ¿ 3223È£
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¹Ú¸·ÃøÁ¤±â(Thin Film Measurement System)
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KSV INSTRUMENTS
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-
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RIST3µ¿ 3229È£
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½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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SNTEK
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RSP-5000
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RIST3µ¿ 3263È£
Àåºñ¸í
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System)
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COHERENT
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COMPex 201 F
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RIST3µ¿ 3263È£
Àåºñ¸í
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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HIGGSLAB
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PLD SYSTEM
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RIST3µ¿ 3263È£
Àåºñ¸í
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System)
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Photron Ltd.
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FASTCAM SA1
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RIST3µ¿ 3267È£
Àåºñ¸í
ºÐ±¤½Ã½ºÅÛ(Spectrometer System)
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Andor Technology
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SR-303i
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RIST3µ¿ 3267È£
Àåºñ¸í
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System)
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Photron Ltd.
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FASTCAM SA2
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RIST3µ¿ 3267È£
Àåºñ¸í
ÀüÁö ¼º´É ½ÃÇè±â(Multi-cycling Battery Test System)
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Korea Thermo-Tech
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SERIES 4000
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RIST3µ¿ 3278È£
Àåºñ¸í
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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COHERENT
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COMPex Pro 102 F
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RIST3µ¿ 3282È£
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Àú¿ÂÀ¯ÁöÀåÄ¡(Cryostat System)
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Oxford Instruments
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CCC1104
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RIST3µ¿ 3289È£
Àåºñ¸í
GPC ½Ã½ºÅÛ(Gel Permeation Chromatography (GPC) System)
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Waters
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1525/2414/410
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RIST3µ¿ 3312È£
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¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System)
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KEITHLEY Instruments
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4200
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RIST3µ¿ 3340È£
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QE ÃøÁ¤±â(External and Internal Quantum Efficiency (EQE and IQE) Measurement System)
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NEWPORT
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Oriel IQE-200
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RIST3µ¿ 3340È£
Àåºñ¸í
X-¼±±¤ÀüÀںб¤ºÐ¼®±â(XPS xonnectable Deposition system)
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ULVAC-PHI, Inc.
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PHI GENESIS Multi-tech Scanning XPS
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RIST3µ¿ 3360/3362È£
Àåºñ¸í
Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Vacuum Thermal Evaporating System)
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WOOSUNG HI-VAC
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-
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RIST3µ¿ 3363È£
Àåºñ¸í
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System)
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Roche
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LightCycler480
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°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
Àåºñ¸í
À̺ÒÈ­Á¦³í ½Ä°¢±â(Xenon difluoride Etching system)
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¢ß½ÎÀÌ¿£ÅØ
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Xef2 etching system
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±â°è½ÇÇ赿 104È£
Àåºñ¸í
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System)
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Photron Ltd.
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FASTCAM Mini UX100
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±â°è½ÇÇ赿 108È£
Àåºñ¸í
´ÙÀÌ¿Àµå ·¹ÀÌÁ® ½Ã½ºÅÛ(Diode Laser System)
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COHERENT
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Chameleon Vision 2
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±â°è½ÇÇ赿 206È£
Àåºñ¸í
ÆèÅäÃÊ ÆÞ½º ·¹ÀÌÀú ½Ã½ºÅÛ(Femtosecond Pulse Laser System)
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COHERENT
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Chameleon
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±â°è½ÇÇ赿 206È£
Àåºñ¸í
°í¼Ó ¿ø¼ÒºÐ¼®ÀÌ °¡´ÉÇÑ Àü°è ¹æÃâÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(FE-SEM with high speed EDS system)
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JEOL LTD.
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JSM-7800F Prime
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 101È£
Àåºñ¸í
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB))
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FEI
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Nanolab G3 CX
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-4È£
Àåºñ¸í
ÀÌÂ÷ÀÌ¿ÂÁú·®ºÐ¼®±â(Secondary Ion Mass Spectrometry (SIMS))
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CAMECA Instruments
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IMS 6F
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 105È£
Àåºñ¸í
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB))
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FEI
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Helios 600
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
Àåºñ¸í
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB))
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FEI
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Helios 650
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
Àåºñ¸í
3D Ç¥¸éÃøÁ¤ ½Ã½ºÅÛ(3D Optical Surface Metrology System)
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Leica Microsystems
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DCM 3D
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 216È£
Àåºñ¸í
Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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DDONG High Technologies
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Thermal Evaporator System
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
Àåºñ¸í
°¡½º Èñ¼® ½Ã½ºÅÛ(Computerized Gas Dilution System)
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Environics
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Series 4040
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
Àåºñ¸í
±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope (Cs-corrected HR-STEM))
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JEOL
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JEM-2200FS
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³ª³ëÀ¶ÇÕ±â¼ú¿ø TEM-2200FS½Ç
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À̿¿¬¸¶±â(Ion Milling System)
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GL CORPORATION
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PIPS1 691
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Àåºñ¸í
Àú¿¡³ÊÁö À̿ ¿¬¸¶±â(Gentle Mill (Low Energy Ion Milling System))
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TechnoOrg Linda
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IV5
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³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
Á¦ÀÛ»ç
LEO Elektronrnmikroskopie GmbH
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FE-SEM
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Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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Korea Vacuum Tech
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KVE-C300160
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Àåºñ¸í
À¯±â¹° ÁõÂø±â(Organic Molecular Beam Deposition (OMBD) & Thermal Evaporator)
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alpha-plus
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OMBD & Thermal
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas))
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ATIS
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Manual Wet Station
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Àåºñ¸í
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas))
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ATIS
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Manual Wet Station
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
±Ý¼Ó À¯±â¹° È­Çбâ»óÁõÂø ½Ã½ºÅÛ(Metalorganic Chemical Vapor Deposition (MOVCD) System)
Á¦ÀÛ»ç
Jusung Eng.
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Eureka 2000
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD))
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QUROS
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Plus 200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
Á¦ÀÛ»ç
Korea Vacuum Tech
¸ðµ¨¸í
KVE-4000
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
·¹ÀÌÀú ¸®¼Ò±×·¡ÇÇ ½Ã½ºÅÛ(Laser Lithography system)
Á¦ÀÛ»ç
Heidelberg Instruments
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DWL-200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
½ºÆ®·¹½º ÃøÁ¤ ½Ã½ºÅÛ(Stress Measurement System)
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FSM
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500TC
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
ÀÓ°èÄ¡¼ö ÃøÁ¤ ÁÖ»çÀüÀÚÇö¹Ì°æ(Critical Dimension Scanning Electron Microscope (CD-SEM))
Á¦ÀÛ»ç
HITACHI
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S-9380
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
½À½Ä ¼¼Á¤ÀåÄ¡(Wet Station (Acid))
Á¦ÀÛ»ç
High Integrated Technology (HIT)
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HWC-MCP
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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SNTEK
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MSS5000
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
Àú¾Ð È­ÇÐÁõÂøÀåÄ¡(ÆÛ´Ï½º ŸÀÔ)(Low Pressure Chemical Vapor Deposition (LP-CVD; Furnace Type))
Á¦ÀÛ»ç
(ÁÖ)À¯ÁøÅ×Å©
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BJM100
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD))
Á¦ÀÛ»ç
¾ÆÅؽýºÅÛ
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UF-CVD 200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
»ó¾Ð È­Çбâ»óÁõÂø¹ý(Atmosphere Pressure Chemical Vapor Deposition (APCVD))
Á¦ÀÛ»ç
Watkins Johnson
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WJ-1000T
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
½À½Ä»êÈ­¿ë V-ÆÛ´Ï½º(Wet Oxidation V-Furnace)
Á¦ÀÛ»ç
TEL
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Alpha-808SD
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
°Ç½Ä»êÈ­¿ë V-ÆÛ´Ï½º(Dry Oxidation V-Furnace)
Á¦ÀÛ»ç
TEL
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Alpha-808DN
¼³Ä¡Àå¼Ò
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
ź¼Ò³ª³ëÆ©ºê ÇÕ¼º CVD(Carbon Nanotube (CNT) Synthesis Chemical Vapor Deposition (CVD))
Á¦ÀÛ»ç
¾ÆÅؽýºÅÛ
¸ðµ¨¸í
-
¼³Ä¡Àå¼Ò
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD))
Á¦ÀÛ»ç
BMR Technology Co.
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HiDep-SC
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
Á¦ÀÛ»ç
AMAT
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E5500
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Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
Á¦ÀÛ»ç
Korea Vacuum Tech
¸ðµ¨¸í
KVE-C300160
¼³Ä¡Àå¼Ò
³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
½Ç¸®ÄÜ °íÁ¾È¾ºñ ½Ä°¢ÀåÄ¡(Deep Reactive Ion Etcher (DRIE))
Á¦ÀÛ»ç
SPTS
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Pegasus
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
º¸È£¸·¿ë ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD) for Passivation)
Á¦ÀÛ»ç
TES
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TELIA200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
(GLOCAL)ü¼ººÐºÐ¼®±â(Whole Body Composition Analyzer)
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EchoMRI LLC
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EchoMRI-100H Analyzer
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»ý¸í°øÇе¿ A210È£
Àåºñ¸í
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM))
Á¦ÀÛ»ç
JEOL
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JEM-1011
¼³Ä¡Àå¼Ò
»ý¸í°øÇבּ¸¼¾ÅÍ 156È£
Àåºñ¸í
ÃʰíÇØ»óµµ smFRET STORM À̹Ì¡ Àåºñ(Super-resolution smFRET STORM imaging system)
Á¦ÀÛ»ç
ONI
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Oxford Nanoimager S
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»ý¸í°øÇבּ¸¼¾ÅÍ 253È£
Àåºñ¸í
·¹ÀÌÀú ¹Ì¼¼ ÇØºÎ ½Ã½ºÅÛ(Laser Microdissection Microscope System)
Á¦ÀÛ»ç
Carl Zeiss
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PALM MicroBeam
¼³Ä¡Àå¼Ò
»ý¸í°øÇבּ¸¼¾ÅÍ 341È£
Àåºñ¸í
Ź»óÇü ¸¶ÀÌÅ©·Î¾î·¹ÀÌ ½Ã½ºÅÛ(Benchtop Microarray System)
Á¦ÀÛ»ç
GENETIX
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QArray mini
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»ý¸í°øÇבּ¸¼¾ÅÍ 458È£
Àåºñ¸í
µå¶ø¼¼ÅÍ(Drop Setter for Protein Crystallization)
Á¦ÀÛ»ç
FORMULATRIX
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NT8
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»ý¸í°úÇаü 204È£
Àåºñ¸í
ÇÁ·£Ä« ¸®¼­Ä¡ 3 ·Îº¿ ½Ã½ºÅÛ(FRANKA RESEARCH 3 robot system)
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Franka Robotics
¸ðµ¨¸í
Franka Research 3
¼³Ä¡Àå¼Ò
ÀΰøÁö´É¿¬±¸¿ø 142È£
Àåºñ¸í
¸ð¼Çĸó ½Ã½ºÅÛ(Motion Capture System)
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Optitrack
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OptiTrack Motion Tracking System
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ÀΰøÁö´É¿¬±¸¿ø 142È£
Àåºñ¸í
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
Á¦ÀÛ»ç
JEOL
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JEM-2100 (HR)
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Á¦1°øÇаü 105È£
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±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope(Cs-corrected HR-STEM))
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JEOL
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JEM-2200FS (UHR)
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Á¦1°øÇаü 109È£
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Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM))
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HITACHI
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7600H
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Á¦1°øÇаü 111È£
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·¹ÀÌÀú ½Ã½ºÅÛ(Laser System)
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KIMMON KOHA
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IK3301R-G
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Á¦1°øÇаü 206È£
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¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System)
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LAMBDA PHYSIK AG
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Compex 205
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Á¦1°øÇаü 208È£
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LED ÃøÁ¤ ½Ã½ºÅÛ(Wafer-level LED Measurement System)
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WithLight
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OPI-170
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Á¦1°øÇаü 208È£
Àåºñ¸í
¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System)
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KEITHLEY Instruments
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4200-SCS
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Á¦1°øÇаü 208È£
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ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD))
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Korea Vacuum Tech
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KVPED-T0583
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Á¦1°øÇаü 210È£
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Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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GD-Tech
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KVT-2008L
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Á¦1°øÇаü 210È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚ Çö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
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PHILIPS ELECTRON OPTICS B.V.
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XL30S FEG
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Á¦1°øÇаü 306-1È£
Àåºñ¸í
Ãʰí¼Ó µðÁöÅÐ Ä«¸Þ¶ó ÀåÄ¡(High-speed Digital Camera System)
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(ÁÖ)¾ÅÅ©·Ð
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MotionPro Y7S1
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Á¦1½ÇÇ赿 314È£
Àåºñ¸í
ÀÔÀÚ ¿µ»ó À¯¼Ó°è(Particle Image Velocimetry (PIV) System)
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TSI
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MODULE4G-2DPIV
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Á¦1½ÇÇ赿 316È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Thermo Scientific
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DIONEX ICS-2100
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Á¦1½ÇÇ赿 318È£
Àåºñ¸í
¹æ»ç¼± µ¿À§¿ø¼Ò ¾×ü ¼¶±¤ °è¼ö±â(Liquid Scintillation Analyzer)
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PerkinElmer
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Tri-carb 2910TR
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Á¦1½ÇÇ赿 318È£
Àåºñ¸í
ÀúÁØÀ§ ¾×ü¼¶±¤ºÐ¼®±â(Low Activity Liquid Scintillation Analyzer)
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PerkinElmer
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Tri-Carb 5110 TR
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Á¦1½ÇÇ赿 318È£
Àåºñ¸í
Àç»ý ÁõÆø±â(Regenerative Amplifier System)
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Spectra-Physics
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Spitfire Ace
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Á¦2°øÇаü 504È£
Àåºñ¸í
Çö¹Ì°æ Stage ¹× Á¶Àý ½Ã½ºÅÛ(Microscope Stage and Controller System)
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Applied Scientific Instrumentation (ASI)
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MS-2000
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Á¦3°øÇаü 006È£
Àåºñ¸í
°íÁÖÆÄ À¯µµ °¡¿­ ¿ëÇØ·Î(High Frequency Induction Heater)
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EMWise Communications
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-
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Á¦3°øÇаü 105È£
Àåºñ¸í
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System)
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COHERENT
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COMPex Pro
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Á¦3°øÇаü 206È£
Àåºñ¸í
ÆèÅäÃÊ ÆÞ½º ·¹ÀÌÀú ½Ã½ºÅÛ(Femtosecond Pulse Laser System)
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COHERENT
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Chameleon
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Á¦3°øÇаü 502AÈ£
Àåºñ¸í
¿¢½Ã¸Ó ·¹ÀÌÀú ½Ã½ºÅÛ(Excimer Laser System)
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COHERENT
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COMPex Pro 199F
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Á¦3°øÇаü 508È£
Àåºñ¸í
´Ù¸ñÀû ¹Ú¸· Ç¥¸é±¸Á¶ ºÐ¼® ¿øÀÚ Çö¹Ì°æ Àåºñ(Muti-purpose Atomic Force Microscope (AFM) System)
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Bruker
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MultiMode 8
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Á¦3°øÇаü 529È£
Àåºñ¸í
32ä³Î ³úÆÄ ÃøÁ¤ ½Ã½ºÅÛ(32-Channel Electroencephalogram (EEG) Measurement System)
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LAXTHA
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LXE3232-RF
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Á¦4°øÇаü 005È£
Àåºñ¸í
¹«¼± ±ÙÀüµµ ½Ã½ºÅÛ(Electromyographic (EMG) and Sensor System)
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NORAXON
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TELEMYO 2400R G2
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Á¦4°øÇаü 005È£
Àåºñ¸í
¼ºÇü»çÃâ±â(Injection Machine)
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Battenfeld Kunststoffmaschinen
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Microsystem 50
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Á¦5°øÇаü 006È£
Àåºñ¸í
¼ºÇü»çÃâ±â(Injection Machine)
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SUMITOMO HEAVY INDUSTRIES, LTD
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SE50D
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Á¦5°øÇаü 006È£
Àåºñ¸í
³ª³ë½Ã½º SPM Á¶Àý ½Ã½ºÅÛ(Nanonis Scanning Probe Microscopy (SPM) Control System)
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SPECS
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SPECS Nanonis Controller
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Á¦5°øÇаü 008È£
Àåºñ¸í
Àç·á½ÃÇè±â(Nano Testing System)
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MTS
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Nano UTM Testing System
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Á¦5°øÇаü 206-1È£
Àåºñ¸í
ÆØÃ¢°è¼ö ÃøÁ¤±â(Dilatometer System)
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ERICH NETZSCH GmbH & Co. Holdi
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DIL 402C Dilatometer
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Á¦5°øÇаü 206È£
Àåºñ¸í
¸ð¼¼°üÇü°¡¿­·Î(Capillary Furnace System)
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Malvern Instruments
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Rosand RH7
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Á¦5°øÇаü 206È£
Àåºñ¸í
ÆèÅäÃÊ ·¹ÀÌÀú ½Ã½ºÅÛ(Femtosecond Laser System)
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COHERENT
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Libra
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Á¦5°øÇаü 406È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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(ÁÖ)¼¼´ÏÁ¨
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Dionex Aquion IC system
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Áö°î¿¬±¸µ¿ 228È£
Àåºñ¸í
¼±Çü À̿ Ʈ·¦ Áú·®ºÐ¼®±â(Linear Ion Trap Mass Spectrometry)
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Thermo Scientific
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VELOS PRO
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Áö°î¿¬±¸µ¿ 232È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
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Dynamic Systems
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GLEEBLE 3500
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ö°­´ëÇпø 142-4È£
Àåºñ¸í
Áý¼Ó À̿ºö(3Â÷¿ø-EBSD)(Focused Ion Beam (FIB; 3D-EBSD))
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FEI
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Quanta 3D FEG
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ö°­´ëÇпø 150-2È£
Àåºñ¸í
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM))
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Carl Zeiss
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Ultra-55
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ö°­´ëÇпø 154-6È£
Àåºñ¸í
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
Á¦ÀÛ»ç
JEOL
¸ðµ¨¸í
JSM-7100F
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 154-6È£
Àåºñ¸í
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
Á¦ÀÛ»ç
JEOL
¸ðµ¨¸í
JEM-2100F
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ö°­´ëÇпø 161È£
Àåºñ¸í
¸ÖƼ ½ºÄÉÀÏ ¹Ì¼¼±¸Á¶ ºÐ¼® ½Ã½ºÅÛ(Multi-scale Microstructure Analysis System)
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JEOL
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Neo-ARM
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ö°­´ëÇпø 161È£
Àåºñ¸í
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
Á¦ÀÛ»ç
JEOL
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JXA-8530F
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ö°­´ëÇпø 163È£
Àåºñ¸í
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
Á¦ÀÛ»ç
JEOL
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JEM-7900F
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ö°­´ëÇпø 163È£
Àåºñ¸í
¹ß±¤ºÐ±¤ºÐ¼®±â(Optical Emission Spectrometer)
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OBLF gmbh
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OBLF QSN 750
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ö°­´ëÇпø 171-3È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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Thermo Scientific
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iCAP 6500 DUO
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ö°­´ëÇпø 176È£
Àåºñ¸í
¿­Áß·®/¿­·® µ¿½Ã ºÐ¼®±â(Thermal Analyzer System)
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netzsch geraetebau gmbh
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STA 449C
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ö°­´ëÇпø 178-9È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
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Dynamic Systems
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GLEEBLE 3500
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ö°­´ëÇпø 242-4È£
Àåºñ¸í
ÆØÃ¢°è¼ö ÃøÁ¤±â(Dilatometer System)
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bahr-thermoanalyse gmbh
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DIL805A/D
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ö°­´ëÇпø 242-4È£
Àåºñ¸í
ºñƲ¸² ½ÃÇè±â(Tortion Tester)
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ACE E&C,INC.
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TRA-2K
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ö°­´ëÇпø 242-4È£
Àåºñ¸í
Ç¥¸é󸮽ýºÅÛ(Target Surfacing System)
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Leica Microsystems
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EM TXP
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ö°­´ëÇпø 250È£
Àåºñ¸í
TEM¿ë À̿¹иµ½Ã½ºÅÛ(Ion Milling System for Transmission Electron Microscope (TEM))
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¢ßÁö¿¤ÄÚÆÛ·¹À̼Ç
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Gatan model 691
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ö°­´ëÇпø 284È£
Àåºñ¸í
Àç·á½ÃÇè±â(Advanced Indentation System)
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(ÁÖ)ÇÁ·Ðƽ½º
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AIS2000
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ö°­´ëÇпø 312-4È£
Àåºñ¸í
±Ý¼Ó ÆÇÀç ÀÎÀå¾ÐÃà½ÃÇè±â(Sheet Metal Deformation Simulator)
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¢ß¾Ë¾Øºñ
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RB319
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ö°­´ëÇпø 312-4È£
Àåºñ¸í
½ºÆÛÅÍ / Áø°øÁõÂø ÀåÄ¡(Sputtering / Vacuum Deposition System)
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¾ÆÀ̾¾Æ¼
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 374È£
Àåºñ¸í
±Ý¼Ó Żź ¿­Ã³¸® ½Ã½ºÅÛ(Tube Type Furnace System)
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¢ßº£½º
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 380È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
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INSTRON
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INSTRON 8801
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ö°­´ëÇпø 416-8È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
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INSTRON
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INSTRON 8801
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 416È£
Àåºñ¸í
µ¿Àû ±â°èÀû¹°¼º ½ÃÇè±â(Dynamic Material Testing System)
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INSTRON
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INSTRON 8501
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 431-3È£
Àåºñ¸í
¹ü¿ë Àç·á ½ÃÇè±â(Universal Testing System)
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INSTRON
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INSTRON 3382
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ö°­´ëÇпø 431-3È£
Àåºñ¸í
¼ö¼Ò·® ºÐ¼® ½Ã½ºÅÛ(Total Dissolved Solids (TDS) System for Hydrogen Analysis)
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R-Dec
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HTDS-003
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ö°­´ëÇпø 435-7È£
Àåºñ¸í
¼ö¿­ÇÕ¼ºÀåºñ(500 mL Stirred Autoclave System)
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¢ßÀϽſÀÅäŬ·¹À̺ê
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 472È£
Àåºñ¸í
SOFC ´ÜÀüÁö Àå±â¼º´É Æò°¡ÀåÄ¡(Solid Oxide Fuel Cell (SOFC) Test Station)
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
°í¼ÓÁÖÁ¶ ÁÖÆí ³Ã°¢ ¹× ÀÀ°í simulator(Simulator for Solidification and Cooling of a Slab during High Speed Continuous Casting)
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¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
IET ¸ôµåÇ÷°½º ½Ã·á Á¦Á¶ ÀåÄ¡(High Frequency Induction Furnacer)
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¿¤ÅØ
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
½½·¡±×¿ëÇØ ¹× ³Ã°¢ÀåÄ¡(Slag Dissolution and Cooling System)
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¸°Å×Å©
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
¿­Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA))
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RUBOTHERM
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 546È£
Àåºñ¸í
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer)
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Malvern Instruments
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MASTERSIZER 2000
¼³Ä¡Àå¼Ò
ö°­´ëÇпø 546È£
Àåºñ¸í
°í¿Â°¡¿­·Î(Image Furnace System)
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ULVAC
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MR-39H/D
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ö°­´ëÇпø 546È£
Àåºñ¸í
¿­Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA))
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RUBOTHERM
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High Pressure TGA
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ö°­´ëÇпø 546È£
Àåºñ¸í
µµ°¡´Ï ºÎÇÏ ½Ã½ºÅÛ(1600 ¡ÆC Furnace Crucible Leading System)
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Lenton
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LTF-16/75/610
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ö°­´ëÇпø 546È£
Àåºñ¸í
À̹ÌÁö½Ã½ºÅÛ(Imaging System)
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Dantec Dynamics A/S
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Advanced Imaging System
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ö°­´ëÇпø 572È£
Àåºñ¸í
°íÁÖÆÄ À¯µµ °¡¿­ ¿ëÇØ·Î(High Frequency Induction Heater)
Á¦ÀÛ»ç
¿¤ÅØ
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 580È£
Àåºñ¸í
¿ëÇØ¿ë À¯µµ°¡¿­ ÀåÄ¡(Induction Heating System for Melting)
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PSTEK
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 584È£
Àåºñ¸í
Å©¸®ÇÁ ½ÃÇè±â(Lever Arm Type Creep Tester System)
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ats technology, Inc
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Series 2320 Lever Arm Tester
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ö°­´ëÇпø B106È£
Àåºñ¸í
¿ø½ÉÁÖÁ¶±â(Sample Preparation Equipment)
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linn high term gmbh
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Lifumat-M-2000-7.7-VAC
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
Àåºñ¸í
°íÁÖÆÄ À¯µµ °¡¿­ ¿ëÇØ·Î(Vacuum Induction Melting and Casting Furnace)
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ALD Vacuum Technologies
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VIM4
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
Àåºñ¸í
½Ç½Ã°£ X-¼± °Ë»ç±â(Realtime X-ray Inspection System)
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¢ßÀÚºñ½º
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X-Scan 7950
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
Àåºñ¸í
¸¶ÂûƯ¼º Æò°¡ÀåÄ¡(Friction Tester)
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(À¯)Á¾·Î°úÇлó»ç
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CR-FR-CH1
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
Àåºñ¸í
½ºÆÛÅ͸µ ½Ã½ºÅÛ(Sputtering System)
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¾ÆÆå½º(ÁÖ)
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EOS-310(Á¦ÀÛǰ)
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Æ÷Ç×°¡¼Ó±â¿¬±¸¼Ò ÀúÀ帵µ¿ 118È£
Àåºñ¸í
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System)
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(ÁÖ)¿ïÅØ
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URS-100
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Æ÷Ç×°¡¼Ó±â¿¬±¸¼Ò ÀúÀ帵µ¿ 118È£
Àåºñ¸í
Á¡Åº¼ºÃøÁ¤±â(Rheometer system)
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Ta Instruments
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DHR-20
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
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¸¶ÀÌÅ©·Î¹°¼º½ÃÇè±â(Micro-scale mechanical test system)
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CellScale
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MicrotesterG2
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
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3D ¹ÙÀÌ¿ÀÇÁ¸°ÅÍ(Extrusion-based 3D Bioprinter)
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CELLINK
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BIO X
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
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X-ray ÃøÁ¤½Ã½ºÅÛ(X-ray Measurement System)
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Varian A272
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dzµ¿µ¿ 108È£
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Àü±âÈ­ÇÐ ºÐ¼®±â(Electrochemical Analyzer System)
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Advanced Measurement Technology
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2101A
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Çѱ¹·Îº¿À¶ÇÕ¿¬±¸¿ø 313È£
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Àü±âºÐ¹« ÀÌ¿ÂÀ̵¿µµ ºÐ¼® - Áú·® ºÐ¼®±â(Electrospray ionization Ion mobility - Mass spectrometry)
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AGILENT
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Agilent 6560
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È­Çаü 112È£
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¸ÅÆ®¸¯½º º¸Á¶ ·¹ÀÌÀú Å»Âø ÀÌ¿ÂÈ­ Áú·®ºÐ¼®±â(Matrix Assisted Laser Desorption/Ionization Time-of-Flight (MALDI-TOF) Mass Spectrometer)
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BRUKER
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Autoflex Speed LRF
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È­Çаü 112È£
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°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¼±Çü À̿ Ʈ·¦ Áú·® ºÐ¼®±â(HPLC dual-cell linear ion trap mass spectrometer (HPLC-ESI-MS))
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Thermo Scientific
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LTQ Velos Pro
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È­Çаü 112È£
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GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Technologies
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-/5975C
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ȯ°æ°øÇе¿ 103/104È£
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À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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Thermo Scientific
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iCAP 7400
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ȯ°æ°øÇе¿ 106È£
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È­ÇÐÈíÂø·®ºÐ¼®±â(Chemisorption Analyzer)
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micromeritics
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Autochem II 2920 chemisorption analyzer
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ȯ°æ°øÇе¿ 110È£
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°í¾Ð¿ë ºÎÇÇ½Ä ÈíÂøÀåºñ ¼ö¼Ò¿¡³ÊÁö ÀúÀå·® ÃøÁ¤ ÀÚµ¿È­ Àåºñ(Volumetric Sorption Measurement System)
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Setaram
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PCT Pro
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ȯ°æ°øÇе¿ 110È£
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¿°±â¼­¿­ºÐ¼®±â(Ion Personal Genome Machine)
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Thermo Scientific
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Ion Personal Genome Machine (PGM) System
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ȯ°æ°øÇе¿ 206-1È£
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GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Technologies
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7890B/-
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ȯ°æ°øÇе¿ 207È£
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À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Metrohm
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790 Personal IC
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ȯ°æ°øÇе¿ 230È£
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À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Dionex
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ICS-2100
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ȯ°æ°øÇе¿ 302È£
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±¤ ¿¡³ÊÁö Àüȯ·ü ÃøÁ¤±â(Incident Photon-to-electron Conversion Efficiency (IPCE) System)
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NEWPORT
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Newport 74125
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·¹¿À¹ÌÅÍ(Rheometer System)
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TA Instruments
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DHR-1
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Áß°£¹°Áú È­ÇÐÁ¾ ºÐ¼®±â(Reactive Intermediate Species Analyzer)
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Global Fia
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PC-25232/Flame-T/NEOFOX-KIT-PATCH
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ȯ°æ°øÇе¿ 312È£
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LC/MS/MS ½Ã½ºÅÛ(LC/MS/MS System)
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Waters
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Acquity HPLC System/TQ Detector
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ȯ°æ°øÇе¿ 317
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¸ÅÆ®¸¯½º º¸Á¶ ·¹ÀÌÀú Å»Âø ÀÌ¿ÂÈ­ Áú·®ºÐ¼®±â(Matrix Assisted Laser Desorption/Ionization Time-of-Flight (MALDI-TOF) Mass Spectrometer)
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Bruker
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Autoflex Max LRF
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¸¶ÀÌÅ©·ÎÇ÷¹ÀÌÆ® ¸®´õ(Multi-detection Microplate Reader)
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Hidex Oy
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Hidex Sense
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TFF ½Ã½ºÅÛ(Tangential Flow Filtration (TFF) System)
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MERCK
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Cogent M1 TFF System
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ȯ°æ°øÇе¿ 331È£
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ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System)
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Thermo Scientific
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Dionex ICS-5000
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ȯ°æ°øÇе¿ 331È£
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Àڿܼ± ÆòÇ౤ Á¶»ç ½Ã½ºÅÛ(Mask Aligner and Exposure System)
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PROWIN
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M150P
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ȯ°æ°øÇе¿ 410È£
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ÀÓÇÇ´ø½º ÃøÁ¤Àåºñ(Impedance Analyzer System)
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BioLogic
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VSP-300
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ȯ°æ°øÇе¿ 412È£
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È­ÇÐÈíÂøºÐ¼®±â(Temperature Programed Reduction/Desorption (TPR/TPD) Chemisorption Analyzer)
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micromeritics
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AutoChem II
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ȯ°æ°øÇе¿ 412È£
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ÀÓÇÇ´ø½º ÃøÁ¤Àåºñ(Impedance Analyzer System)
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BioLogic
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VSP-300
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ȯ°æ°øÇе¿ 412È£
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GC/MSD ½Ã½ºÅÛ(Gas Chromatography/Mass Selective Detector (GC/MSD) System)
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Agilent Techonologies
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7890B/5977B
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ȯ°æ°øÇе¿ 412È£
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ÇÙ»ê ÃßÃâ±â(Auto Nucleic Acid Preparation System)
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Precision System Science
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Magtration System 12GC
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ȯ°æ°øÇе¿ 414È£
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À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Dionex
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ICS-1100
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ȯ°æ°øÇе¿ 417È£
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È­ÇÐÈíÂø·®ºÐ¼®±â(Chemisorption Analyzer)
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MicrotracBEL Corp.
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BELCAT ¥±
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ȯ°æ°øÇе¿ 431È£
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Reactive Ion Etching, RIE
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