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Equipment Information
Àú¿¡³ÊÁö À̿ ¿¬¸¶±â(Gentle Mill (Low Energy Ion Milling System))
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Equip. Info.
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10063135
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Àú¿¡³ÊÁö À̿ ¿¬¸¶±â
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Gentle Mill (Low Energy Ion Milling System)
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TechnoOrg Linda
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IV5
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Less than 100 ~ 2000 Volt below 5x10-6 mbar
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³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
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054-279-0323
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bkbaek@postech.ac.kr
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[±Û·ÎÄÃ] ÆÄ¿ö·¦¾¾ µðÁöÅÐ µ¥ÀÌÅÍ ¼öÁý ½Ã½ºÅÛ([Glocal] PowerLab C Digital Data Collection System)
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(ÁÖ)¶óÀÌÇÁÅØ
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PowerLab C
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206È£
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Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷))
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Merck Millipore
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Milli-Q¢ç IQ 7015
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BOIC [3307È£]
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Ãʼø¼ö Á¦Á¶ÀåÄ¡(Water purification system(2,3Â÷))
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Merck Millipore
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Milli-Q¢ç Q-POD¢ç
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BOIC [4313È£]
Àåºñ¸í
°í¼Ó ó¸®Çü±¤ ³ª³ëÀε§Å×ÀÌ¼Ç (Nanoindentation )
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OPTIC11 LIFE
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Pavone
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C5
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´ë¿ë·® Â÷¼¼´ë¿°±â¼­¿­ºÐ¼® ½Ã½ºÅÛ(Next-Generation Sequencing system)
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Illumina
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NextSeq1000
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C5
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ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System)
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¿À¹æÅ×Å©³î·ÎÁö
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OBT-PC300
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C5 329È£
Àåºñ¸í
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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ÇѺû·¹ÀÌÀú
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GPPA-A377
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C5 329È£
Àåºñ¸í
PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System)
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MUSASHI ENGINEERING, INC.
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IMAGE MASTER 350PC SMART/SHOTMASTER 300QX
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C5 329È£
Àåºñ¸í
¿ø·á ÁõÂø ½Ã½ºÅÛ(Materials Deposition System with Piezoelectric Inkjet Catridge)
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FUJIFILM
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Dimatix DMP-2850
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C5 329È£
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Áø°øÇÁ·Îºê½ºÅ×À̼Ç(Vacuum Chamber Probe Station)
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MS TECH
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M6VC
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C5 330È£
Àåºñ¸í
ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station)
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MS TECH
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MST8000
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C5 332È£
Àåºñ¸í
ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System)
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Specialty Coating Systems (SCS) - A KISCO Company
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PDS Labcoter 2 (PDS 2010 LABCOTER)
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C5 720-1È£
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ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station)
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The Micromanipulator Company
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No. 6000
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LG¿¬±¸µ¿ 110È£
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ºÐ¼®¿ë ÇÁ·Îºù ½ºÅ×À̼Ç(Analytical Probing Station)
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The Micromanipulator Company
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No. 7100
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LG¿¬±¸µ¿ 202È£
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ÇÁ·Îºê ½ºÅ×À̼Ç(Probe Station)
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UNITEK CORPORATION
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-
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LG¿¬±¸µ¿ 212È£
Àåºñ¸í
´ë±âÁ¶Àý¹è¾çÀÛ¾÷´ë(Modular Atmosphere Control Workstation System)
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Don Whitley Scientific
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Don Whitley Scientific A55
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PBC 362È£
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¹Ð¸µ ½Ã½ºÅÛ(Milling Machine)
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HWACHEON
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KANDAN-2
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RIST1µ¿ 1009È£
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¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD))
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CN1
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Atomic-Basic
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RIST1µ¿ 1139È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
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Carl Zeiss
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GeminiSEM 500
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RIST1µ¿ 1153È£
Àåºñ¸í
À̿ ¹Ð¸µ ½Ã½ºÅÛ(Cross Section Planar Ion Milling System)
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GATAN
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Ilion+II Model 697
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RIST1µ¿ 1162È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
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Carl Zeiss
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AURIGA
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RIST1µ¿ 1163È£
Àåºñ¸í
Áý¼Ó À̿ºö(Focused Ion Beam (FIB))
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SII
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SMI3050SE
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RIST1µ¿ 1169È£
Àåºñ¸í
¼öÂ÷º¸Á¤ ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs-Corrected Scanning Transmission Electron Microscope (Cs-STEM))
Á¦ÀÛ»ç
JEOL
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JEM-ARM200F
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RIST1µ¿ 1176È£
Àåºñ¸í
Àü°è¹æÃâ Çö¹Ì°æ(Field Emission Electron Microscope)
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JEOL
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JEM-2100F
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RIST1µ¿ 1188È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
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JEOL
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JSM-7600F
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RIST1µ¿ 1192È£
Àåºñ¸í
À̿ ºö ¹Ð¸µ ½Ã½ºÅÛ(Triple Ion Beam Miller)
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Leica Microsystems
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EM TIC020
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RIST1µ¿ 1196È£
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°¡½ººÎ½Ä½ÃÇè±â(Gas Corrosion Test Instrument)
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SUGA
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GT-100
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RIST1µ¿ 1272È£
Àåºñ¸í
°íºÐÇØ´É À¯µµ °áÇÕ ÇöóÁ Áú·®ºÐ¼®±â(High Resolution Inductively Coupled Plasma Mass Spectrometer (HR-ICP-MS))
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Thermo Scientific
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ELEMENT XR
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RIST1µ¿ 1304È£
Àåºñ¸í
·¹ÀÌÀú À¯µµ ÇöóÁ ºÐ±¤ºÐ¼®±â(Tandem Laser-ablation Laser-induced Breakdown Spectrometer (LA-LIBS))
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Applied Spectra
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J200
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RIST1µ¿ 1306È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
Á¦ÀÛ»ç
AMETEK
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Spectro Arcos
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RIST1µ¿ 1309È£
Àåºñ¸í
¿øÀÚ Èí¼ö ºÐ±¤±â(Atomic Absorption Spectrometer (AAS))
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Analytik Jena
¸ðµ¨¸í
contrAA 800
¼³Ä¡Àå¼Ò
RIST1µ¿ 1309È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
Á¦ÀÛ»ç
PerkinElmer
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Optima 8300
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RIST1µ¿ 1311È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
Á¦ÀÛ»ç
Thermo Scientific
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iCAP 7000 Series
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RIST1µ¿ 1311È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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AMETEK
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Spectro Arcos
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RIST1µ¿ 1311È£
Àåºñ¸í
¿­Å»Âø ÃøÁ¤ ½Ã½ºÅÛ(Thermal Desorption System)
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Markes International
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UNITY2
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RIST1µ¿ 1317È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Nittoseiko Analytech
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AQF-2100H
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RIST1µ¿ 1318È£
Àåºñ¸í
ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System)
Á¦ÀÛ»ç
Thermo Scientific
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Dionex ICS-5000
¼³Ä¡Àå¼Ò
RIST1µ¿ 1320È£
Àåºñ¸í
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer)
Á¦ÀÛ»ç
Malvern Instruments
¸ðµ¨¸í
MASTERSIZER 2000
¼³Ä¡Àå¼Ò
RIST1µ¿ 1320È£
Àåºñ¸í
¸¶ÀÌÅ©·ÎÆÄ ½Ã·á ºÐÇØ ½Ã½ºÅÛ(Advanced Microwave Digestion System)
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Milestone
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ETHOS 1
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RIST1µ¿ 1334È£
Àåºñ¸í
Áøµ¿Çü ÄŹÐ(Vibrating Cup Mill)
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FRITSCH
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Pulverisette 9
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RIST1µ¿ 1338È£
Àåºñ¸í
º¹ÇÕ ºÎ½Ä ½ÃÇè±â(Cyclic Corrosion Tester)
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Q-LAB
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Q-FOG CCT 1100
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RIST3µ¿ 3011È£
Àåºñ¸í
º¹ÇÕ »çÀÌŬ ½ÃÇè±â(Cyclic Corrosion Test Chamber)
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Ascott Analytical
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CC1000iP
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RIST3µ¿ 3016È£
Àåºñ¸í
º¹ÇÕ ºÎ½Ä ½ÃÇè±â(Cyclic Corrosion Tester)
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Q-LAB
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Q-FOG CCT 1100
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RIST3µ¿ 3016È£
Àåºñ¸í
¿­ È­ÇÐ ±â»ó ÁõÂø ÀåÄ¡(Thermal Chemical Vapor Deposition (CVD) System)
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SNTEK
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TCS5000
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RIST3µ¿ 3104È£
Àåºñ¸í
Á¤¹ÐÀÚµ¿Àý´Ü±â(Linear Precision Saw)
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BUEHLER
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ISOMET4000
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RIST3µ¿ 3132È£
Àåºñ¸í
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System)
Á¦ÀÛ»ç
Roche
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LightCycler96
¼³Ä¡Àå¼Ò
RIST3µ¿ 3153È£
Àåºñ¸í
PC Á¦¾î À̹ÌÁö ÀÎ½Ä µµÆ÷ ½Ã½ºÅÛ(PC Control Image Recognition Dispensing System)
Á¦ÀÛ»ç
MUSASHI ENGINEERING, INC.
¸ðµ¨¸í
IMAGE MASTER 350PC SMART/SHOTMASTER 300DS-S
¼³Ä¡Àå¼Ò
RIST3µ¿ 3170È£
Àåºñ¸í
3D º¯ÇüÃøÁ¤½Ã½ºÅÛ(3D Deformation Analysis System)
Á¦ÀÛ»ç
GOM international AG
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ARAMIS 12M
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RIST3µ¿ 3188È£
Àåºñ¸í
ÁÖ»ç Åõ°ú ÀüÀÚÇö¹Ì°æ(Scanning Transmission Electron Microscope (STEM))
Á¦ÀÛ»ç
COXEM
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CX-200
¼³Ä¡Àå¼Ò
RIST3µ¿ 3188È£
Àåºñ¸í
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System)
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SNTEK
¸ðµ¨¸í
-
¼³Ä¡Àå¼Ò
RIST3µ¿ 3219È£
Àåºñ¸í
ÇöóÁ ¿øÀÚÃþ ÁõÂø ½Ã½ºÅÛ(Plasma Enhanced Atomic Layer Deposition (PE-ALD) System)
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ForALL
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OZONE
¼³Ä¡Àå¼Ò
RIST3µ¿ 3223È£
Àåºñ¸í
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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HIGGSLAB
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PLD SYSTEM
¼³Ä¡Àå¼Ò
RIST3µ¿ 3263È£
Àåºñ¸í
ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
Á¦ÀÛ»ç
COHERENT
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COMPex Pro 102 F
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RIST3µ¿ 3282È£
Àåºñ¸í
GPC ½Ã½ºÅÛ(Gel Permeation Chromatography (GPC) System)
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Waters
¸ðµ¨¸í
1525/2414/410
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RIST3µ¿ 3312È£
Àåºñ¸í
¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System)
Á¦ÀÛ»ç
KEITHLEY Instruments
¸ðµ¨¸í
4200
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RIST3µ¿ 3340È£
Àåºñ¸í
X-¼±±¤ÀüÀںб¤ºÐ¼®±â(XPS xonnectable Deposition system)
Á¦ÀÛ»ç
ULVAC-PHI, Inc.
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PHI GENESIS Multi-tech Scanning XPS
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RIST3µ¿ 3360/3362È£
Àåºñ¸í
½Ç½Ã°£ PCR ½Ã½ºÅÛ(Real-time Polymerase Chain Reaction (PCR) System)
Á¦ÀÛ»ç
Roche
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LightCycler480
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°¡Å縯´ë ÀÇ»ý¸í°øÇבּ¸¼Ò
Àåºñ¸í
¹ü¿ë ¹Ð¸µ ¸Ó½Å´×¼¾ÅÍ(Universal Milling Machining Center)
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±âÈï±â°è
¸ðµ¨¸í
KMB-U5
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±â°è°øÀÛµ¿ 100È£
Àåºñ¸í
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB))
Á¦ÀÛ»ç
FEI
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Nanolab G3 CX
¼³Ä¡Àå¼Ò
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-4È£
Àåºñ¸í
ÀÌÂ÷ÀÌ¿ÂÁú·®ºÐ¼®±â(Secondary Ion Mass Spectrometry (SIMS))
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CAMECA Instruments
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IMS 6F
¼³Ä¡Àå¼Ò
³ª³ëÀ¶ÇÕ±â¼ú¿ø 105È£
Àåºñ¸í
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB))
Á¦ÀÛ»ç
FEI
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Helios 600
¼³Ä¡Àå¼Ò
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
Àåºñ¸í
Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB))
Á¦ÀÛ»ç
FEI
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Helios 650
¼³Ä¡Àå¼Ò
³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
Àåºñ¸í
°¡½º Èñ¼® ½Ã½ºÅÛ(Computerized Gas Dilution System)
Á¦ÀÛ»ç
Environics
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Series 4040
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
Àåºñ¸í
±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope (Cs-corrected HR-STEM))
Á¦ÀÛ»ç
JEOL
¸ðµ¨¸í
JEM-2200FS
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³ª³ëÀ¶ÇÕ±â¼ú¿ø TEM-2200FS½Ç
Àåºñ¸í
À̿¿¬¸¶±â(Ion Milling System)
Á¦ÀÛ»ç
GL CORPORATION
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PIPS1 691
¼³Ä¡Àå¼Ò
³ª³ëÀ¶ÇÕ±â¼ú¿ø ½ÃÆíÁغñ½Ç 312È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚÇö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
Á¦ÀÛ»ç
LEO Elektronrnmikroskopie GmbH
¸ðµ¨¸í
FE-SEM
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
À¯±â¹° ÁõÂø±â(Organic Molecular Beam Deposition (OMBD) & Thermal Evaporator)
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alpha-plus
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OMBD & Thermal
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas))
Á¦ÀÛ»ç
ATIS
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Manual Wet Station
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
¼öÀÛ¾÷ ½À½Ä ¼¼Á¤ÀåÄ¡(Air Station (Wet, Gas))
Á¦ÀÛ»ç
ATIS
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Manual Wet Station
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
±Ý¼Ó À¯±â¹° È­Çбâ»óÁõÂø ½Ã½ºÅÛ(Metalorganic Chemical Vapor Deposition (MOVCD) System)
Á¦ÀÛ»ç
Jusung Eng.
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Eureka 2000
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Àåºñ¸í
¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD))
Á¦ÀÛ»ç
QUROS
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Plus 200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
ÀÓ°èÄ¡¼ö ÃøÁ¤ ÁÖ»çÀüÀÚÇö¹Ì°æ(Critical Dimension Scanning Electron Microscope (CD-SEM))
Á¦ÀÛ»ç
HITACHI
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S-9380
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
½À½Ä ¼¼Á¤ÀåÄ¡(Wet Station (Acid))
Á¦ÀÛ»ç
High Integrated Technology (HIT)
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HWC-MCP
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Àåºñ¸í
Àú¾Ð È­ÇÐÁõÂøÀåÄ¡(ÆÛ´Ï½º ŸÀÔ)(Low Pressure Chemical Vapor Deposition (LP-CVD; Furnace Type))
Á¦ÀÛ»ç
(ÁÖ)À¯ÁøÅ×Å©
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BJM100
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ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD))
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UF-CVD 200
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»ó¾Ð È­Çбâ»óÁõÂø¹ý(Atmosphere Pressure Chemical Vapor Deposition (APCVD))
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Watkins Johnson
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WJ-1000T
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½À½Ä»êÈ­¿ë V-ÆÛ´Ï½º(Wet Oxidation V-Furnace)
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TEL
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Alpha-808SD
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°Ç½Ä»êÈ­¿ë V-ÆÛ´Ï½º(Dry Oxidation V-Furnace)
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TEL
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Alpha-808DN
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ź¼Ò³ª³ëÆ©ºê ÇÕ¼º CVD(Carbon Nanotube (CNT) Synthesis Chemical Vapor Deposition (CVD))
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¾ÆÅؽýºÅÛ
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ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD))
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BMR Technology Co.
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HiDep-SC
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½Ç¸®ÄÜ °íÁ¾È¾ºñ ½Ä°¢ÀåÄ¡(Deep Reactive Ion Etcher (DRIE))
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SPTS
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Pegasus
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º¸È£¸·¿ë ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD) for Passivation)
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TES
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TELIA200
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(GLOCAL)ü¼ººÐºÐ¼®±â(Whole Body Composition Analyzer)
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EchoMRI LLC
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EchoMRI-100H Analyzer
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Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM))
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JEOL
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JEM-1011
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»ý¸í°øÇבּ¸¼¾ÅÍ 156È£
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ÃʰíÇØ»óµµ smFRET STORM À̹Ì¡ Àåºñ(Super-resolution smFRET STORM imaging system)
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ONI
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Oxford Nanoimager S
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»ý¸í°øÇבּ¸¼¾ÅÍ 253È£
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·¹ÀÌÀú ¹Ì¼¼ ÇØºÎ ½Ã½ºÅÛ(Laser Microdissection Microscope System)
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Carl Zeiss
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PALM MicroBeam
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»ý¸í°øÇבּ¸¼¾ÅÍ 341È£
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µå¶ø¼¼ÅÍ(Drop Setter for Protein Crystallization)
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FORMULATRIX
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NT8
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»ý¸í°úÇаü 204È£
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¸ð¼Çĸó ½Ã½ºÅÛ(Motion Capture System)
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Optitrack
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OptiTrack Motion Tracking System
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ÀΰøÁö´É¿¬±¸¿ø 142È£
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Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
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JEOL
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JEM-2100 (HR)
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±¸¸é¼öÂ÷º¸Á¤ ÃʰíºÐÇØ´É ÁÖ»çÅõ°úÀüÀÚÇö¹Ì°æ(Cs Corrected High-Resolution Scanning Transmission Electron Microscope(Cs-corrected HR-STEM))
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JEOL
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JEM-2200FS (UHR)
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Á¦1°øÇаü 109È£
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Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM))
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HITACHI
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7600H
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Á¦1°øÇаü 111È£
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¹ÝµµÃ¼ Ư¼º ºÐ¼®±â(Semiconductor Characterization System)
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KEITHLEY Instruments
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4200-SCS
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Á¦1°øÇаü 208È£
Àåºñ¸í
ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD))
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Korea Vacuum Tech
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KVPED-T0583
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Á¦1°øÇаü 210È£
Àåºñ¸í
Àü°è¹æ»çÇü ÁÖ»çÀüÀÚ Çö¹Ì°æ(Field Emission Scanning Electron Microscope (FE-SEM))
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PHILIPS ELECTRON OPTICS B.V.
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XL30S FEG
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Á¦1°øÇаü 306-1È£
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À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Thermo Scientific
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DIONEX ICS-2100
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Á¦1½ÇÇ赿 318È£
Àåºñ¸í
¹æ»ç¼± µ¿À§¿ø¼Ò ¾×ü ¼¶±¤ °è¼ö±â(Liquid Scintillation Analyzer)
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PerkinElmer
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Tri-carb 2910TR
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Á¦1½ÇÇ赿 318È£
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ÀúÁØÀ§ ¾×ü¼¶±¤ºÐ¼®±â(Low Activity Liquid Scintillation Analyzer)
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PerkinElmer
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Tri-Carb 5110 TR
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Á¦1½ÇÇ赿 318È£
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¹ü¿ë ¹Ð¸µ ¸Ó½Å´×¼¾ÅÍ(Universal Milling Machining Center)
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±âÈï±â°è
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KMB-U3
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°íÁÖÆÄ À¯µµ °¡¿­ ¿ëÇØ·Î(High Frequency Induction Heater)
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EMWise Communications
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-
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Àåºñ¸í
¼ºÇü»çÃâ±â(Injection Machine)
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Battenfeld Kunststoffmaschinen
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Microsystem 50
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Á¦5°øÇаü 006È£
Àåºñ¸í
¼ºÇü»çÃâ±â(Injection Machine)
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SUMITOMO HEAVY INDUSTRIES, LTD
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SE50D
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Á¦5°øÇаü 006È£
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À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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(ÁÖ)¼¼´ÏÁ¨
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Dionex Aquion IC system
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Áö°î¿¬±¸µ¿ 228È£
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¼±Çü À̿ Ʈ·¦ Áú·®ºÐ¼®±â(Linear Ion Trap Mass Spectrometry)
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Thermo Scientific
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VELOS PRO
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Áö°î¿¬±¸µ¿ 232È£
Àåºñ¸í
Áý¼Ó À̿ºö(3Â÷¿ø-EBSD)(Focused Ion Beam (FIB; 3D-EBSD))
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FEI
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Quanta 3D FEG
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ö°­´ëÇпø 150-2È£
Àåºñ¸í
Åõ°úÀüÀÚÇö¹Ì°æ(Transmission Electron Microscope (TEM))
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Carl Zeiss
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Ultra-55
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ö°­´ëÇпø 154-6È£
Àåºñ¸í
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
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JEOL
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JSM-7100F
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ö°­´ëÇпø 154-6È£
Àåºñ¸í
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
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JEOL
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JEM-2100F
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ö°­´ëÇпø 161È£
Àåºñ¸í
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
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JEOL
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JXA-8530F
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ö°­´ëÇпø 163È£
Àåºñ¸í
Àü°è¹æ»çÇü Åõ°úÀüÀÚ Çö¹Ì°æ(Field Emission Transmission Electron Microscope (FE-TEM))
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JEOL
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JEM-7900F
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ö°­´ëÇпø 163È£
Àåºñ¸í
¹ß±¤ºÐ±¤ºÐ¼®±â(Optical Emission Spectrometer)
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OBLF gmbh
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OBLF QSN 750
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ö°­´ëÇпø 171-3È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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Thermo Scientific
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iCAP 6500 DUO
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ö°­´ëÇпø 176È£
Àåºñ¸í
ºñƲ¸² ½ÃÇè±â(Tortion Tester)
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ACE E&C,INC.
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TRA-2K
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ö°­´ëÇпø 242-4È£
Àåºñ¸í
TEM¿ë À̿¹иµ½Ã½ºÅÛ(Ion Milling System for Transmission Electron Microscope (TEM))
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¢ßÁö¿¤ÄÚÆÛ·¹À̼Ç
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Gatan model 691
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ö°­´ëÇпø 284È£
Àåºñ¸í
Àç·á½ÃÇè±â(Advanced Indentation System)
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(ÁÖ)ÇÁ·Ðƽ½º
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AIS2000
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ö°­´ëÇпø 312-4È£
Àåºñ¸í
±Ý¼Ó ÆÇÀç ÀÎÀå¾ÐÃà½ÃÇè±â(Sheet Metal Deformation Simulator)
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¢ß¾Ë¾Øºñ
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RB319
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ö°­´ëÇпø 312-4È£
Àåºñ¸í
½ºÆÛÅÍ / Áø°øÁõÂø ÀåÄ¡(Sputtering / Vacuum Deposition System)
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¾ÆÀ̾¾Æ¼
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 374È£
Àåºñ¸í
SOFC ´ÜÀüÁö Àå±â¼º´É Æò°¡ÀåÄ¡(Solid Oxide Fuel Cell (SOFC) Test Station)
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
°í¼ÓÁÖÁ¶ ÁÖÆí ³Ã°¢ ¹× ÀÀ°í simulator(Simulator for Solidification and Cooling of a Slab during High Speed Continuous Casting)
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¢ßÄÉÀÌ¿¡ÀÌ¿¥¾ÆÀÌ
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
IET ¸ôµåÇ÷°½º ½Ã·á Á¦Á¶ ÀåÄ¡(High Frequency Induction Furnacer)
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¿¤ÅØ
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
½½·¡±×¿ëÇØ ¹× ³Ã°¢ÀåÄ¡(Slag Dissolution and Cooling System)
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¸°Å×Å©
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 480È£
Àåºñ¸í
¿­Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA))
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RUBOTHERM
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 546È£
Àåºñ¸í
·¹ÀÌÀú ȸÀý ÀÔÀÚ ºÐ¼®±â(Laser Diffraction Particle Size Analyzer)
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Malvern Instruments
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MASTERSIZER 2000
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ö°­´ëÇпø 546È£
Àåºñ¸í
¿­Áß·®ºÐ¼®±â(Thermogravimetric Sorption Analyzer (TGA))
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RUBOTHERM
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High Pressure TGA
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ö°­´ëÇпø 546È£
Àåºñ¸í
°íÁÖÆÄ À¯µµ °¡¿­ ¿ëÇØ·Î(High Frequency Induction Heater)
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¿¤ÅØ
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 580È£
Àåºñ¸í
¿ëÇØ¿ë À¯µµ°¡¿­ ÀåÄ¡(Induction Heating System for Melting)
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PSTEK
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 584È£
Àåºñ¸í
¿ø½ÉÁÖÁ¶±â(Sample Preparation Equipment)
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linn high term gmbh
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Lifumat-M-2000-7.7-VAC
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Àåºñ¸í
°íÁÖÆÄ À¯µµ °¡¿­ ¿ëÇØ·Î(Vacuum Induction Melting and Casting Furnace)
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ALD Vacuum Technologies
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VIM4
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
Àåºñ¸í
½Ç½Ã°£ X-¼± °Ë»ç±â(Realtime X-ray Inspection System)
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¢ßÀÚºñ½º
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X-Scan 7950
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
Àåºñ¸í
¸¶ÂûƯ¼º Æò°¡ÀåÄ¡(Friction Tester)
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(À¯)Á¾·Î°úÇлó»ç
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CR-FR-CH1
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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Carbon Steel ¹ÚÆÇ¿ë ¾Ð¿¬±â Á¦ÀÛ(Carbon Steel Sheet Mill)
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PTW sreel solution
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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¿­°£¾Ð¿¬±â(Pilot 4Hi-Hot Rolling Mill)
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PTW sreel solution
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Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
Àåºñ¸í
RIE ½Ã½ºÅÛ(Reactive Ion Etching (RIE) System)
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(ÁÖ)¿ïÅØ
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URS-100
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Æ÷Ç×°¡¼Ó±â¿¬±¸¼Ò ÀúÀ帵µ¿ 118È£
Àåºñ¸í
3D ¹ÙÀÌ¿ÀÇÁ¸°ÅÍ(Extrusion-based 3D Bioprinter)
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CELLINK
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BIO X
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Æ÷Ç×½ÃÁö½Ä»ê¾÷¼¾ÅÍ wet-lab
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Àü±âºÐ¹« ÀÌ¿ÂÀ̵¿µµ ºÐ¼® - Áú·® ºÐ¼®±â(Electrospray ionization Ion mobility - Mass spectrometry)
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AGILENT
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Agilent 6560
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È­Çаü 112È£
Àåºñ¸í
¸ÅÆ®¸¯½º º¸Á¶ ·¹ÀÌÀú Å»Âø ÀÌ¿ÂÈ­ Áú·®ºÐ¼®±â(Matrix Assisted Laser Desorption/Ionization Time-of-Flight (MALDI-TOF) Mass Spectrometer)
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BRUKER
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Autoflex Speed LRF
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È­Çаü 112È£
Àåºñ¸í
°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¼±Çü À̿ Ʈ·¦ Áú·® ºÐ¼®±â(HPLC dual-cell linear ion trap mass spectrometer (HPLC-ESI-MS))
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Thermo Scientific
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LTQ Velos Pro
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È­Çаü 112È£
Àåºñ¸í
À¯µµ °áÇÕ ÇöóÁ ºÐ±¤ºÐ¼®±â(Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES))
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Thermo Scientific
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iCAP 7400
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ȯ°æ°øÇе¿ 106È£
Àåºñ¸í
È­ÇÐÈíÂø·®ºÐ¼®±â(Chemisorption Analyzer)
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micromeritics
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Autochem II 2920 chemisorption analyzer
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ȯ°æ°øÇе¿ 110È£
Àåºñ¸í
°í¾Ð¿ë ºÎÇÇ½Ä ÈíÂøÀåºñ ¼ö¼Ò¿¡³ÊÁö ÀúÀå·® ÃøÁ¤ ÀÚµ¿È­ Àåºñ(Volumetric Sorption Measurement System)
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Setaram
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PCT Pro
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ȯ°æ°øÇе¿ 110È£
Àåºñ¸í
¿°±â¼­¿­ºÐ¼®±â(Ion Personal Genome Machine)
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Thermo Scientific
¸ðµ¨¸í
Ion Personal Genome Machine (PGM) System
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ȯ°æ°øÇе¿ 206-1È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Metrohm
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790 Personal IC
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ȯ°æ°øÇе¿ 230È£
Àåºñ¸í
À̿ ũ·Î¸¶Åä±×·¡ÇÇ ½Ã½ºÅÛ(Ion Chromatography System)
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Dionex
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ICS-2100
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ȯ°æ°øÇе¿ 302È£
Àåºñ¸í
±¤ ¿¡³ÊÁö Àüȯ·ü ÃøÁ¤±â(Incident Photon-to-electron Conversion Efficiency (IPCE) System)
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NEWPORT
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Newport 74125
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ȯ°æ°øÇе¿ 302È£
Àåºñ¸í
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Bruker
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Autoflex Max LRF
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Àåºñ¸í
¸¶ÀÌÅ©·ÎÇ÷¹ÀÌÆ® ¸®´õ(Multi-detection Microplate Reader)
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Hidex Oy
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Hidex Sense
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ȯ°æ°øÇе¿ 327È£
Àåºñ¸í
TFF ½Ã½ºÅÛ(Tangential Flow Filtration (TFF) System)
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MERCK
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Cogent M1 TFF System
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ȯ°æ°øÇе¿ 331È£
Àåºñ¸í
ijÇÊ·¯¸® À̿ ũ·Î¸¶Åä±×·¡ÇÇ(Capillary Ion Chromatography System)
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Thermo Scientific
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Dionex ICS-5000
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