XS
SM
MD
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Equipment Information
À¯±â¹° ÁõÂø±â(Organic Molecular Beam Deposition (OMBD) & Thermal Evaporator)
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Equip. Info.
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10011914
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À¯±â¹° ÁõÂø±â
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Organic Molecular Beam Deposition (OMBD) & Thermal Evaporator
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alpha-plus
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OMBD & Thermal
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Electron Beam Evaporation gun
A System Controller
Power Supply
Crucibles for the evaporation material
Materials for Evaporation
Material to be coated
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METAL DEPOSITION
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054-279-0283
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chanho@postech.ac.kr
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Áú·®ºÐ¼®±â°í¼º´É ¾×üũ·Î¸¶Åä±×·¡ÇÇ ¿ÀºñÆ®·¦Áú·®ºÐ¼®±â(High-performance Liquid Chromatography – Mass)
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Perkin Elmer
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Qsight220
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BOIC 4307È£
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¹ÙÀÌ¿ÀºÐÀÚ À̹Ì¡ ½Ã½ºÅÛ(Biomolecular Imaging System)
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GE Healthcare(Çö Cytiva)
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Amersham Imager 600
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BOIC [4307È£]
Àåºñ¸í
·¡ÇÎ&Æú¸®½Ì ½Ã½ºÅÛ(Lapping & Polishing System)
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LOGITECH
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PM6
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C5 228È£
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Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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´ëµ¿ÇÏÀÌÅØ
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DD-GT103R
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C5 329È£
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ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System)
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¿À¹æÅ×Å©³î·ÎÁö
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OBT-PC300
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C5 329È£
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ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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ÇѺû·¹ÀÌÀú
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GPPA-A377
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C5 329È£
Àåºñ¸í
¿ø·á ÁõÂø ½Ã½ºÅÛ(Materials Deposition System with Piezoelectric Inkjet Catridge)
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FUJIFILM
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Dimatix DMP-2850
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C5 329È£
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ÆÐ·²¸° ÁõÂø±â(Parylene Deposition System)
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Specialty Coating Systems (SCS) - A KISCO Company
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PDS Labcoter 2 (PDS 2010 LABCOTER)
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C5 720-1È£
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ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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TEMESCAL/BOC COATING TECH
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BDJ 1800
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LG¿¬±¸µ¿ 110È£
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¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD))
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CN1
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Atomic-Basic
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RIST1µ¿ 1139È£
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ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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Telemark
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246-28
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RIST1µ¿ 1145È£
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Áý¼Ó À̿ºö(Focused Ion Beam (FIB))
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SII
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SMI3050SE
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RIST1µ¿ 1169È£
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½ÃÂ÷¿­ºÐ¼®/½ÃÂ÷Áֻ翭·®ºÐ¼®±â(Differential Thermal Analysis (DTA)/Differential Scanning Calorimeter (DSC))
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SETARAM Instrumentation
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Labsys DTA/DSC
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RIST1µ¿ 1188È£
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À̿ ºö ¹Ð¸µ ½Ã½ºÅÛ(Triple Ion Beam Miller)
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Leica Microsystems
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EM TIC020
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RIST1µ¿ 1196È£
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¿­Å»Âø ÃøÁ¤ ½Ã½ºÅÛ(Thermal Desorption System)
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Markes International
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UNITY2
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RIST1µ¿ 1317È£
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ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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Selcos
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Cetus-E
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RIST3µ¿ 3104È£
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¿­ È­ÇÐ ±â»ó ÁõÂø ÀåÄ¡(Thermal Chemical Vapor Deposition (CVD) System)
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SNTEK
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TCS5000
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RIST3µ¿ 3104È£
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Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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TERALEADER
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TLP1001
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RIST3µ¿ 3139È£
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ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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iNFOVION
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-
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RIST3µ¿ 3147È£
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Áø°ø¹è¾ç±â(Vacuum Chamber & Frame)
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SNTEK
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SPR-5004
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RIST3µ¿ 3147È£
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ÇöóÁ ¿øÀÚÃþ ÁõÂø ½Ã½ºÅÛ(Plasma Enhanced Atomic Layer Deposition (PE-ALD) System)
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ForALL
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OZONE
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RIST3µ¿ 3223È£
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ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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HIGGSLAB
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PLD SYSTEM
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RIST3µ¿ 3263È£
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ÆÞ½º ·¹ÀÌÀú ÁõÂø ½Ã½ºÅÛ(Pulsed Laser Deposition (PLD) System)
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COHERENT
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COMPex Pro 102 F
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RIST3µ¿ 3282È£
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X-¼±±¤ÀüÀںб¤ºÐ¼®±â(XPS xonnectable Deposition system)
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ULVAC-PHI, Inc.
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PHI GENESIS Multi-tech Scanning XPS
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RIST3µ¿ 3360/3362È£
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Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Vacuum Thermal Evaporating System)
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WOOSUNG HI-VAC
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-
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RIST3µ¿ 3363È£
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Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB))
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FEI
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Nanolab G3 CX
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 105-4È£
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Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB))
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FEI
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Helios 600
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
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Áý¼ÓÀ̿ºö(Focused Ion Beam (FIB))
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FEI
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Helios 650
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 1Ãþ 104È£
Àåºñ¸í
Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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DDONG High Technologies
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Thermal Evaporator System
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³ª³ëÀ¶ÇÕ±â¼ú¿ø 311È£
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ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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Korea Vacuum Tech
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KVE-C300160
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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±Ý¼Ó À¯±â¹° È­Çбâ»óÁõÂø ½Ã½ºÅÛ(Metalorganic Chemical Vapor Deposition (MOVCD) System)
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Jusung Eng.
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Eureka 2000
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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¿øÀÚÃþ ÁõÂø±â(Atomic Layer Deposition (ALD))
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QUROS
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Plus 200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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Korea Vacuum Tech
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KVE-4000
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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Àú¾Ð È­ÇÐÁõÂøÀåÄ¡(ÆÛ´Ï½º ŸÀÔ)(Low Pressure Chemical Vapor Deposition (LP-CVD; Furnace Type))
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(ÁÖ)À¯ÁøÅ×Å©
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BJM100
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD))
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¾ÆÅؽýºÅÛ
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UF-CVD 200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
»ó¾Ð È­Çбâ»óÁõÂø¹ý(Atmosphere Pressure Chemical Vapor Deposition (APCVD))
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Watkins Johnson
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WJ-1000T
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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ź¼Ò³ª³ëÆ©ºê ÇÕ¼º CVD(Carbon Nanotube (CNT) Synthesis Chemical Vapor Deposition (CVD))
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¾ÆÅؽýºÅÛ
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-
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD))
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BMR Technology Co.
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HiDep-SC
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
ÀüÀÚºö ÁõÂø±â(E-beam Evaporating System)
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Korea Vacuum Tech
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KVE-C300160
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
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º¸È£¸·¿ë ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD) for Passivation)
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TES
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TELIA200
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³ª³ëÀ¶ÇÕ±â¼ú¿ø Ŭ¸°·ëµ¿ 2Ãþ Ŭ¸°·ë
Àåºñ¸í
ÇöóÁ È­ÇÐ ±â»ó ÁõÂø±â(Plasma Enhanced Chemical Vapor Deposition (PE-CVD))
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Korea Vacuum Tech
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KVPED-T0583
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Á¦1°øÇаü 210È£
Àåºñ¸í
Áø°ø ¿­ÁõÂø ½Ã½ºÅÛ(Thermal Evaporating System)
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GD-Tech
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KVT-2008L
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Á¦1°øÇаü 210È£
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Áý¼Ó À̿ºö(3Â÷¿ø-EBSD)(Focused Ion Beam (FIB; 3D-EBSD))
Á¦ÀÛ»ç
FEI
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Quanta 3D FEG
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ö°­´ëÇпø 150-2È£
Àåºñ¸í
¿­Áß·®/¿­·® µ¿½Ã ºÐ¼®±â(Thermal Analyzer System)
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netzsch geraetebau gmbh
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STA 449C
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ö°­´ëÇпø 178-9È£
Àåºñ¸í
¿­¿ªÇнùķ¹ÀÌÅÍ(Caster&Thermo-mechanical Simulator)
Á¦ÀÛ»ç
Fuji electronic Industrial
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FTX-103HC-01
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ö°­´ëÇпø 374È£
Àåºñ¸í
½ºÆÛÅÍ / Áø°øÁõÂø ÀåÄ¡(Sputtering / Vacuum Deposition System)
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¾ÆÀ̾¾Æ¼
¸ðµ¨¸í
Ư¼öÁ¦ÀÛ
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ö°­´ëÇпø 374È£
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ºñÇ¥¸éÀû ºÐ¼®±â(Automated Surface Area&Pore Size Analyzer)
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Chunwoo America, Inc
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NOVA 1000e
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ö°­´ëÇпø ´ëÇü½ÇÇ赿
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µî¿Â¹Ì¼¼¿­·®°è(IMC (Isothermal Microcalorimetry))
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TA Instruments Korea Unit of waters korea, Ltd
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TAM IV XL
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ģȯ°æ¼ÒÀç´ëÇпø 184, 186È£
Àåºñ¸í
³ª³ë¼¼°ø Ư¼º ¹× BET Ç¥¸éÀû ÃøÁ¤Àåºñ(Nanoporosity & Surface Area Analyzer)
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(ÁÖ)¹Ì·¡¿¡½º¾ÆÀÌ
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nanoPOROSITY (BET)
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ȯ°æ°øÇе¿ 110È£
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¹«±âź¼ÒºÐ¼®±â(Total Inorganic Carbon Analyzer)
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UIC INC.
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CM5017
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ȯ°æ°øÇе¿ 312È£
Àåºñ¸í
±â°øµµ ºÐ¼®±â(Brunauer-Emmett-Teller (BET) & Pore Analyzer)
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micromeritics
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ASAP 2020
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ȯ°æ°øÇе¿ 412È£
Àåºñ¸í
TOC ºÐ¼®±â(Total Organic Carbon (TOC) Analyzer)
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SHIMADZU
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TOC-V CSH
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ȯ°æ°øÇе¿ 417È£
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2006-08-04
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URL
https://www.komachine.com/ko/companies/alpha-plus/products/61972-OMBD-System/
Ű¿öµå
Metal, Deposition, Thin film, Thermal
XS
SM
MD
LG
77 Cheongam-ro, Nam-gu, Pohang, Gyeongbuk, Republic of Korea (37673)
+82-54-279-3653
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