 기본정보 |
|
설비번호 |
10049296 |
장비명(한글) |
 리소그래피
|
장비명(영문) |
Lithography |
제작사 |
엘리오닉스 |
모델명 |
ELS-7000 |
| 상세정보 |
|
장비사양 |
Employing a large electron current and the maximum acceleration of 100kV, the electron beam of the minimum diameter of 1.8nm is kept stable for a long interval. Even with the resists commonly available on the market, patterns finer than 8nm can be exposed. Based on the achievements of the preceding model, the ELS-7700, the ELS-7000 realized both the long-interval fine electron beam stability and the high throughput. ELS-7000 is equipped with a highly rigid stage, which is based on our long experience in developing lithography systems. The 0.31nm beam positioning resolution is realized by utilizing the 18bit DAC. And, by employing a laser interferometer whose reading resolution is 0.6nm, both the stitching accuracy and overlaying accuracy have attained 40nm. ELS-7000 can expose fine patterns across a large area. Functions for exposing essential elementary graphic patterns are included in the standard specification. The optional circle pattern generator allows generating such patterns as circumferences and arcs. By attaching the fine-step field size modulation function, ELS-7000 can also be instrumental in creating WDM diffraction gratings. |
활용분야 |
4NM급 직접노광 |
| 장비운영인력 |
|
설치장소 |
나노융합기술원 클린룸동 2층 클린룸 |
소속 |
나노융합기술원 |
성명 |
김동현 |
전화 |
054-279-0237 |
이메일 |
best820@postech.ac.kr |
| 동일/유사장비정보 |
|
장비명 |
마스크리스 레이저 리소그래피(Maskless Laser Lithography, MLA150) |
제작사 |
주식회사나우 |
모델명 |
MLA150 |
설치장소 |
|
장비명 |
레이저 리소그래피 시스템(Laser Lithography system) |
제작사 |
Heidelberg Instruments |
모델명 |
DWL-200 |
설치장소 |
|
장비명 |
극자외선 청정장치(Extreme Ultraviolet (EUV) Lithography) |
제작사 |
(주)씨엔디플러스 |
모델명 |
Track |
설치장소 |
|
| 사용정보 |
|
장비오픈여부 |
○ |
자율사용여부 |
○ |
사용료 |
400,000/h |
| 자산정보 |
|
취득금액 |
\ 2,147,483,647 |
취득일 |
2007-02-23 |
| 참조사항 |
|
첨부파일 |
|
URL |
|
| 키워드 |
|
| E-Beam, Developer, Coating, nm급 | |
